⚠ Novel chemotype — no close known analogue (best Tanimoto < 0.3). Unexplored chemical space relative to ChEMBL.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| SCHEMBL12410229 | 0.81 | — | — | |
| SCHEMBL12376790 | 0.81 | ALDH1A1 (0.30) | — | |
| SCHEMBL10040359 | 0.77 | ALDH1A1 (0.31) | — | |
| SCHEMBL6367604 | 0.76 | EPHX2 (0.33) | — | |
| SCHEMBL12411756 | 0.75 | — | — | |
| SCHEMBL12376771 | 0.74 | HSD11B1 (0.35) | — | |
| SCHEMBL1224877 | 0.71 | CYP2C9 (0.32) | — | |
| SCHEMBL12411754 | 0.71 | — | — | |
| SCHEMBL418793 | 0.69 | HSD11B1 (0.44) | — | |
| SCHEMBL12376700 | 0.68 | ELANE (0.39) | — |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 2 patents. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| US-8691490-B2 | Sulfonium salt, polymer, method for producing the polymer, resist composition and patterning process | SHIN-ETSU CHEMICAL CO., LTD. (JP) | 2014-04-08 | — | — | US | disclosed |
| US-20110189607-A1 | NOVEL SULFONIUM SALT, POLYMER, METHOD FOR PRODUCING THE POLYMER, RESIST COMPOSITION AND PATTERNING PROCESS | SHIN-ETSU CHEMICAL CO., LTD. (JP) | 2011-08-04 | — | — | US | disclosed |