SCHEMBL12376911

SCHEMBL12376911

C=C(C)C(=O)OCCOc1ccc([S+](c2ccc(C)cc2)c2ccc(C)cc2)cc1

nearest known ligand 0.53

Predicted protein targets (top 16)

geneUniProtsupporting neighboursconfidence
HTT P42858 2/20 0.53
TDP1 Q9NUW8 2/20 0.53
POLB P06746 1/20 0.53
APEX1 P27695 1/20 0.53
L3MBTL1 Q9Y468 3/20 0.46
MAPT P10636 1/20 0.44
CA1 P00915 1/20 0.44
CA2 P00918 1/20 0.44
KMT2A Q03164 2/20 0.43
MEN1 O00255 1/20 0.43
THRB P10828 1/20 0.41
NPC1 O15118 2/20 0.41
HPGD P15428 1/20 0.40
ATM Q13315 1/20 0.39
MAOB P27338 1/20 0.39
SMN1; SMN2 Q16637 1/20 0.39

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL649098 0.93 HTT (0.60) HTTTDP1POLBAPEX1L3MBTL1
SCHEMBL795295 0.89 POLB (0.57) HTTTDP1POLBAPEX1L3MBTL1
SCHEMBL11997927 0.88 HTT (0.56) HTTTDP1POLBAPEX1L3MBTL1
SCHEMBL2286970 0.87 HTT (0.46) HTTTDP1POLBAPEX1L3MBTL1
SCHEMBL454606 0.86 POLB (0.67) HTTTDP1POLBAPEX1L3MBTL1
SCHEMBL10050684 0.86 TDP1 (0.60) HTTTDP1POLBAPEX1L3MBTL1
SCHEMBL13899686 0.85 HTT (0.71) HTTTDP1POLBAPEX1L3MBTL1
SCHEMBL4191440 0.85 HTT (0.67) HTTTDP1POLBAPEX1L3MBTL1
SCHEMBL12376906 0.85 POLB (0.50) HTTTDP1POLBAPEX1KMT2A
SCHEMBL20577655 0.84 POLB (0.55) HTTTDP1POLBAPEX1L3MBTL1

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 2 patents. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
US-8691490-B2 Sulfonium salt, polymer, method for producing the polymer, resist composition and patterning process SHIN-ETSU CHEMICAL CO., LTD. (JP) 2014-04-08 US disclosed
US-20110189607-A1 NOVEL SULFONIUM SALT, POLYMER, METHOD FOR PRODUCING THE POLYMER, RESIST COMPOSITION AND PATTERNING PROCESS SHIN-ETSU CHEMICAL CO., LTD. (JP) 2011-08-04 US disclosed

Patent text — is the patent's own abstract consistent with the prediction?

For each of this compound's patents that has machine-readable text (1 of them — usually the abstract, not the full specification), we ask MedCPT which protein the text reads most about, and where the chemistry-predicted target lands among 4885 human targets. A high rank means the patent's own wording is consistent with the prediction — a weak, independent signal, not proof of activity.

PatentTitleText reads most aboutPredicted target · text-rank
US-20110189607-A1 NOVEL SULFONIUM SALT, POLYMER, METHOD FOR PRODUCING THE POLYMER, RESIST COMPOSITION AND PATTERNING PROCESS RPS4Y1, ETV6, RPS4X HTT 2417/4885TDP1 3710/4885POLB 1380/4885

“Text reads most about” is the patent abstract's nearest protein in MedCPT space (background-debiased). Only ~1.4% of patents have machine-readable text, so most compounds won't have this panel.