SCHEMBL12376906

SCHEMBL12376906

C=C(C)C(=O)OCCOc1ccc([S+](c2ccc(C(C)(C)C)cc2)c2ccc(C(C)(C)C)cc2)cc1

nearest known ligand 0.50

Predicted protein targets (top 20)

geneUniProtsupporting neighboursconfidence
POLB P06746 3/20 0.50
APEX1 P27695 1/20 0.50
HTT P42858 1/20 0.50
TDP1 Q9NUW8 1/20 0.50
SMN1; SMN2 Q16637 2/20 0.46
KMT2A Q03164 3/20 0.41
RAB9A P51151 2/20 0.40
NPC1 O15118 1/20 0.40
CASP3 P42574 1/20 0.40
SENP7 Q9BQF6 1/20 0.40
KDM4E B2RXH2 3/20 0.40
ALDH1A1 P00352 2/20 0.40
NR4A2 P43354 1/20 0.40
MITF O75030 1/20 0.40
GAA P10253 1/20 0.40
RXRA P19793 1/20 0.40
RXRB P28702 1/20 0.40
MEN1 O00255 2/20 0.39
LMNA P02545 1/20 0.39
THRB P10828 1/20 0.39

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL12618074 0.93 POLB (0.56) POLBAPEX1HTTTDP1SMN1; SMN2
SCHEMBL11997926 0.89 POLB (0.52) POLBAPEX1HTTTDP1SMN1; SMN2
SCHEMBL795295 0.85 POLB (0.57) POLBAPEX1HTTTDP1SMN1; SMN2
SCHEMBL12376911 0.85 HTT (0.53) POLBAPEX1HTTTDP1SMN1; SMN2
SCHEMBL59813 0.85 POLB (0.56) POLBAPEX1HTTTDP1SMN1; SMN2
SCHEMBL14173142 0.85 POLB (0.56) POLBAPEX1HTTTDP1SMN1; SMN2
SCHEMBL2831138 0.85 POLB (0.56) POLBAPEX1HTTTDP1SMN1; SMN2
SCHEMBL8669012 0.85 ALDH1A1 (0.57) POLBAPEX1HTTTDP1SMN1; SMN2
SCHEMBL454606 0.83 POLB (0.67) POLBAPEX1HTTTDP1KMT2A
Propane SCHEMBL9476274 0.82 HTT (0.53) POLBAPEX1HTTTDP1SMN1; SMN2

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 3 patents. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
US-20220127225-A1 ONIUM SALT, CHEMICALLY AMPLIFIED RESIST COMPOSITION AND PATTERNING PROCESS SHIN-ETSU CHEMICAL CO., LTD. (JP) 2022-04-28 US disclosed
US-8691490-B2 Sulfonium salt, polymer, method for producing the polymer, resist composition and patterning process SHIN-ETSU CHEMICAL CO., LTD. (JP) 2014-04-08 US disclosed
US-20110189607-A1 NOVEL SULFONIUM SALT, POLYMER, METHOD FOR PRODUCING THE POLYMER, RESIST COMPOSITION AND PATTERNING PROCESS SHIN-ETSU CHEMICAL CO., LTD. (JP) 2011-08-04 US disclosed

Patent text — is the patent's own abstract consistent with the prediction?

For each of this compound's patents that has machine-readable text (2 of them — usually the abstract, not the full specification), we ask MedCPT which protein the text reads most about, and where the chemistry-predicted target lands among 4885 human targets. A high rank means the patent's own wording is consistent with the prediction — a weak, independent signal, not proof of activity.

PatentTitleText reads most aboutPredicted target · text-rank
US-20220127225-A1 ONIUM SALT, CHEMICALLY AMPLIFIED RESIST COMPOSITION AND PATTERNING PROCESS CACNA1F, SLC6A5, IDUA POLB 83/4885APEX1 2066/4885HTT 3870/4885
US-20110189607-A1 NOVEL SULFONIUM SALT, POLYMER, METHOD FOR PRODUCING THE POLYMER, RESIST COMPOSITION AND PATTERNING PROCESS RPS4Y1, ETV6, RPS4X POLB 1380/4885APEX1 1814/4885HTT 2417/4885

“Text reads most about” is the patent abstract's nearest protein in MedCPT space (background-debiased). Only ~1.4% of patents have machine-readable text, so most compounds won't have this panel.