Predicted protein targets (top 2)
Click a target to see other patent compounds predicted against it — the reverse direction, in place.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| SCHEMBL47406 | 1.00 | ADORA3 (0.33) | ADORA3HMGCR | |
| SCHEMBL47405 | 1.00 | ADORA3 (0.33) | ADORA3HMGCR | |
| SCHEMBL11911519 | 1.00 | ADORA3 (0.33) | ADORA3HMGCR | |
| SCHEMBL98341 | 1.00 | ADORA3 (0.33) | ADORA3HMGCR | |
| SCHEMBL47494 | 0.98 | HMGCR (0.32) | ADORA3HMGCR | |
| SCHEMBL12202235 | 0.95 | HMGCR (0.32) | HMGCR | |
| SCHEMBL13607370 | 0.91 | — | — | |
| SCHEMBL9244692 | 0.88 | — | — | |
| SCHEMBL16065295 | 0.86 | — | — | |
| SCHEMBL17789342 | 0.86 | ADORA3 (0.32) | ADORA3 |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 8 patents. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| EP-1975705-B1 | Positive resist composition and pattern-forming method | FUJIFILM CORP (JP) | 2016-04-27 | — | — | EP | disclosed |
| US-8945810-B2 | Positive resist composition and pattern-forming method | FUJIFILM CORPORATION (JP) | 2015-02-03 | — | — | US | disclosed |
| US-8945810-B2 | Positive resist composition and pattern-forming method | FUJIFILM CORPORATION (JP) | 2015-02-03 | — | — | US | disclosed |
| US-7998654-B2 | Positive resist composition and pattern-forming method | FUJIFILM CORPORATION (JP) | 2011-08-16 | — | — | US | disclosed |
| US-7998654-B2 | Positive resist composition and pattern-forming method | FUJIFILM CORPORATION (JP) | 2011-08-16 | — | — | US | disclosed |
| US-20080248425-A1 | Adjust solubility of alkali developer using acid; acid generator; actinic radiation | FUJIFILM CORPORATION (JP) | 2008-10-09 | — | — | US | disclosed |
| US-20080248425-A1 | Adjust solubility of alkali developer using acid; acid generator; actinic radiation | FUJIFILM CORPORATION (JP) | 2008-10-09 | — | — | US | disclosed |
| EP-1975705-A2 | Positive resist composition and pattern-forming method | FUJIFILM Corporation (JP) | 2008-10-01 | — | — | EP | disclosed |