SCHEMBL12398373

SCHEMBL12398373

CCc1ccc2cc(OS(=O)(=O)C(F)(F)C(F)(F)C(F)(F)S(=O)(=O)O)ccc2c1

nearest known ligand 0.38

Predicted protein targets (top 20)

geneUniProtsupporting neighboursconfidence
CYP1A2 P05177 2/20 0.38
CYP2A6 P11509 1/20 0.38
SLC2A1 P11166 1/20 0.38
AKR1C3 P42330 2/20 0.36
AKR1C2 P52895 2/20 0.36
PTGS2 P35354 2/20 0.36
CA1 P00915 3/20 0.36
CA2 P00918 3/20 0.36
PTGS1 P23219 2/20 0.35
HSD11B1 P28845 1/20 0.34
GAA P10253 1/20 0.34
MAPK1 P28482 1/20 0.34
TDP1 Q9NUW8 1/20 0.34
L3MBTL1 Q9Y468 1/20 0.34
KDM4E B2RXH2 1/20 0.33
NPC1 O15118 1/20 0.33
LMNA P02545 1/20 0.33
TP53 P04637 1/20 0.33
CYP3A4 P08684 1/20 0.33
MAPT P10636 1/20 0.33

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL12440972 0.85 MAPK1 (0.38) GAAMAPK1TDP1L3MBTL1KDM4E
SCHEMBL10183035 0.81 ABCB11 (0.41) CYP1A2AKR1C3AKR1C2PTGS2PTGS1
SCHEMBL12040145 0.79 ELANE (0.35) CA1CA2HSD11B1GAAMAPK1
SCHEMBL2742192 0.77 ELANE (0.38) AKR1C3CA1CA2HSD11B1CA9
SCHEMBL15427986 0.77 CA2 (0.38) PTGS2CA1CA2MMP13PTPN1
SCHEMBL10183109 0.77 CYP17A1 (0.39) AKR1C3AKR1C2L3MBTL1NPC1CYP3A4
SCHEMBL2742167 0.76 CA1 (0.36) PTGS2CA1CA2PTGS1HSD11B1
SCHEMBL9966117 0.74 CA1 (0.46) CA1CA2LMNATP53CYP3A4
SCHEMBL9963744 0.73 CNR1 (0.36) L3MBTL1KDM4E
SCHEMBL2742173 0.73 PTPRZ1 (0.36) CA1CA2GAATDP1NPC1

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 4 patents. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
US-9005870-B2 Actinic-ray- or radiation-sensitive resin composition and method of forming pattern using the composition FUJIFILM CORPORATION (JP) 2015-04-14 US disclosed
US-9005870-B2 Actinic-ray- or radiation-sensitive resin composition and method of forming pattern using the composition FUJIFILM CORPORATION (JP) 2015-04-14 US disclosed
US-20110183263-A1 ACTINIC-RAY- OR RADIATION-SENSITIVE RESIN COMPOSITION AND METHOD OF FORMING PATTERN USING THE COMPOSITION FUJIFILM CORPORATION (JP) 2011-07-28 US disclosed
US-20110183263-A1 ACTINIC-RAY- OR RADIATION-SENSITIVE RESIN COMPOSITION AND METHOD OF FORMING PATTERN USING THE COMPOSITION FUJIFILM CORPORATION (JP) 2011-07-28 US disclosed