Predicted protein targets (top 19)
| gene | UniProt | supporting neighbours | confidence | |
|---|---|---|---|---|
| ▸ | RIPK1 | Q13546 | 8/20 | 0.38 |
| ▸ | TAS1R3 | Q7RTX0 | 2/20 | 0.36 |
| ▸ | TAS1R1 | Q7RTX1 | 2/20 | 0.36 |
| ▸ | TAS1R2 | Q8TE23 | 2/20 | 0.36 |
| ▸ | MLNR | O43193 | 1/20 | 0.33 |
| ▸ | CHRM2 | P08172 | 1/20 | 0.33 |
| ▸ | CHRM1 | P11229 | 1/20 | 0.33 |
| ▸ | CHRM3 | P20309 | 1/20 | 0.33 |
| ▸ | HTR2A | P28223 | 1/20 | 0.33 |
| ▸ | HTR2C | P28335 | 1/20 | 0.33 |
| ▸ | HRH1 | P35367 | 1/20 | 0.33 |
| ▸ | OPRM1 | P35372 | 1/20 | 0.33 |
| ▸ | DRD3 | P35462 | 1/20 | 0.33 |
| ▸ | OPRK1 | P41145 | 1/20 | 0.33 |
| ▸ | HTR2B | P41595 | 1/20 | 0.33 |
| ▸ | SLC6A3 | Q01959 | 1/20 | 0.33 |
| ▸ | KCNH2 | Q12809 | 1/20 | 0.33 |
| ▸ | CACNA1C | Q13936 | 1/20 | 0.33 |
| ▸ | FKBP1A | P62942 | 3/20 | 0.33 |
Click a target to see other patent compounds predicted against it — the reverse direction, in place.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| SCHEMBL20306561 | 0.85 | TAS1R3 (0.36) | RIPK1TAS1R3TAS1R1TAS1R2CHRM3 | |
| SCHEMBL2740661 | 0.81 | IDO1 (0.46) | RIPK1HTR2COPRM1DRD3OPRK1 | |
| SCHEMBL2740636 | 0.78 | IDO1 (0.49) | RIPK1 | |
| SCHEMBL2740802 | 0.77 | SSTR4 (0.41) | RIPK1HTR2AHTR2B | |
| SCHEMBL9610702 | 0.77 | IDO1 (0.44) | RIPK1 | |
| SCHEMBL16706580 | 0.77 | RIPK1 (0.40) | RIPK1MLNRCHRM2CHRM1CHRM3 | |
| SCHEMBL12416519 | 0.76 | IDO1 (0.43) | RIPK1OPRM1 | |
| SCHEMBL26419677 | 0.75 | TAS1R3 (0.39) | TAS1R3TAS1R1TAS1R2SLC6A3 | |
| SCHEMBL15113859 | 0.74 | HTR2B (0.40) | RIPK1HTR2B | |
| SCHEMBL15113858 | 0.74 | RIPK1 (0.42) | RIPK1HTR2C |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 2 patents. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| US-8501384-B2 | Positive resist composition and patterning process | SHIN-ETSU CHEMICAL CO., LTD. (JP) | 2013-08-06 | — | — | US | disclosed |
| US-20110171580-A1 | POSITIVE RESIST COMPOSITION AND PATTERNING PROCESS | SHIN-ETSU CHEMICAL CO., LTD. (JP) | 2011-07-14 | — | — | US | disclosed |