Predicted protein targets (top 13)
| gene | UniProt | supporting neighbours | confidence | |
|---|---|---|---|---|
| ▸ | IDO1 | P14902 | 2/20 | 0.44 |
| ▸ | FFAR1 | O14842 | 1/20 | 0.43 |
| ▸ | RIPK1 | Q13546 | 2/20 | 0.42 |
| ▸ | CTSV | O60911 | 1/20 | 0.42 |
| ▸ | CTSL | P07711 | 1/20 | 0.42 |
| ▸ | CTSS | P25774 | 1/20 | 0.42 |
| ▸ | CTSK | P43235 | 1/20 | 0.42 |
| ▸ | KDM4E | B2RXH2 | 2/20 | 0.42 |
| ▸ | MAPK1 | P28482 | 1/20 | 0.40 |
| ▸ | MAPK14 | Q16539 | 1/20 | 0.40 |
| ▸ | HTT | P42858 | 3/20 | 0.40 |
| ▸ | ALDH1A1 | P00352 | 5/20 | 0.40 |
| ▸ | XBP1 | P17861 | 1/20 | 0.39 |
Click a target to see other patent compounds predicted against it — the reverse direction, in place.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| SCHEMBL12416519 | 0.99 | IDO1 (0.43) | IDO1FFAR1RIPK1CTSVCTSL | |
| SCHEMBL2740636 | 0.96 | IDO1 (0.49) | IDO1FFAR1RIPK1CTSVCTSL | |
| SCHEMBL2740661 | 0.91 | IDO1 (0.46) | IDO1FFAR1RIPK1CTSVCTSL | |
| SCHEMBL19335512 | 0.88 | IDO1 (0.50) | IDO1FFAR1CTSVCTSLCTSS | |
| SCHEMBL20306474 | 0.87 | IDO1 (0.49) | IDO1FFAR1CTSVCTSLCTSS | |
| SCHEMBL14258831 | 0.82 | RIPK1 (0.36) | FFAR1RIPK1CTSVCTSLCTSS | |
| SCHEMBL16706580 | 0.82 | RIPK1 (0.40) | RIPK1MAPK1ALDH1A1 | |
| SCHEMBL92314 | 0.81 | IDO1 (0.45) | IDO1FFAR1RIPK1CTSVCTSL | |
| SCHEMBL15945491 | 0.80 | LMNA (0.35) | FFAR1RIPK1CTSVCTSLCTSS | |
| SCHEMBL2740675 | 0.78 | TAS1R3 (0.44) | KDM4EALDH1A1 |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 11 patents. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| US-9360753-B2 | Resist composition and patterning process | SHIN-ETSU CHEMICAL CO., LTD. (JP) | 2016-06-07 | — | — | US | disclosed |
| US-9250517-B2 | Polymer, positive resist composition and patterning process | SHIN-ETSU CHEMICAL CO., LTD. (JP) | 2016-02-02 | — | — | US | disclosed |
| US-9063413-B2 | Resist composition, patterning process, monomer, and copolymer | SHIN-ETSU CHEMICAL CO., LTD. (JP) | 2015-06-23 | — | — | US | disclosed |
| US-9052593-B2 | Resist composition and patterning process | SHIN-ETSU CHEMICAL CO., LTD. (JP) | 2015-06-09 | — | — | US | disclosed |
| US-8735046-B2 | Positive resist composition and patterning process | SHIN-ETSU CHEMICAL CO., LTD. (JP) | 2014-05-27 | — | — | US | disclosed |
| US-20130309606-A1 | RESIST COMPOSITION, PATTERNING PROCESS, MONOMER, AND COPOLYMER | SHIN-ETSU CHEMICAL CO., LTD. (JP) | 2013-11-21 | — | — | US | disclosed |
| US-8501384-B2 | Positive resist composition and patterning process | SHIN-ETSU CHEMICAL CO., LTD. (JP) | 2013-08-06 | — | — | US | disclosed |
| US-20130029270-A1 | RESIST COMPOSITION AND PATTERNING PROCESS | SHIN-ETSU CHEMICAL CO., LTD. (JP) | 2013-01-31 | — | — | US | disclosed |
| US-20120202153-A1 | RESIST COMPOSITION AND PATTERNING PROCESS | SHIN-ETSU CHEMICAL CO., LTD. (JP) | 2012-08-09 | — | — | US | disclosed |
| US-20120135349-A1 | POSITIVE RESIST COMPOSITION AND PATTERNING PROCESS | SHIN-ETSU CHEMICAL CO., LTD. (JP) | 2012-05-31 | — | — | US | disclosed |
| US-20110171580-A1 | POSITIVE RESIST COMPOSITION AND PATTERNING PROCESS | SHIN-ETSU CHEMICAL CO., LTD. (JP) | 2011-07-14 | — | — | US | disclosed |
Patent text — is the patent's own abstract consistent with the prediction?
For each of this compound's patents that has machine-readable text (1 of them — usually the abstract, not the full specification), we ask MedCPT which protein the text reads most about, and where the chemistry-predicted target lands among 4885 human targets. A high rank means the patent's own wording is consistent with the prediction — a weak, independent signal, not proof of activity.
| Patent | Title | Text reads most about | Predicted target · text-rank |
|---|---|---|---|
| US-20130309606-A1 | RESIST COMPOSITION, PATTERNING PROCESS, MONOMER, AND COPOLYMER | RER1, SEM1, REV1 | IDO1 4385/4885FFAR1 238/4885RIPK1 2399/4885 |
“Text reads most about” is the patent abstract's nearest protein in MedCPT space (background-debiased). Only ~1.4% of patents have machine-readable text, so most compounds won't have this panel.