SCHEMBL12429786

SCHEMBL12429786

CC(C)COC(C)OC(=O)C1C2CC(C(C)C2C)C1C(=O)OC12CC3CC(CC(C3)C1)C2

nearest known ligand 0.31

Predicted protein targets (top 3)

geneUniProtsupporting neighboursconfidence
CYP17A1 P05093 1/20 0.31
CYP19A1 P11511 1/20 0.31
NAAA Q02083 1/20 0.30

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL12429846 0.84
SCHEMBL12429754 0.81 NPC1 (0.30)
SCHEMBL12429795 0.76 NAAA (0.37) CYP17A1CYP19A1NAAA
SCHEMBL12429815 0.75
SCHEMBL12429840 0.74 HSD11B1 (0.34)
SCHEMBL12429798 0.74 NAAA (0.33) CYP17A1CYP19A1NAAA
SCHEMBL12429782 0.73 CYP19A1 (0.37) CYP17A1CYP19A1NAAA
SCHEMBL12429847 0.73 ALDH1A1 (0.31)
SCHEMBL12429783 0.72 EPHX2 (0.36) CYP19A1NAAA
SCHEMBL12429797 0.71 EPHX2 (0.38) NAAA

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 8 patents. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
US-7977029-B2 Positive photosensitive composition FUJIFILM CORPORATION (JP) 2011-07-12 US disclosed
US-7514201-B2 Positive photosensitive composition FUJIFILM CORPORATION (JP) 2009-04-07 US disclosed
US-20080318159-A1 POSITIVE PHOTOSENSITIVE COMPOSITION FUJIFILM CORPORATION (JP) 2008-12-25 US disclosed
US-7255971-B2 Positive resist composition FUJIFILM CORPORATION (JP) 2007-08-14 US disclosed
US-7235341-B2 Positive resist composition FUJIFILM CORPORATION (JP) 2007-06-26 US disclosed
US-20070141513-A1 Positive photosensitive composition FUJI PHOTO FILM CO., LTD. 2007-06-21 US disclosed
US-7214465-B2 Positive photosensitive composition FUJIFILM CORPORATION (JP) 2007-05-08 US disclosed
US-7192681-B2 Positive photosensitive composition FUJI PHOTO FILM CO., LTD. (JP) 2007-03-20 US disclosed