Predicted protein targets (top 12)
| gene | UniProt | supporting neighbours | confidence | |
|---|---|---|---|---|
| ▸ | TSHR | P16473 | 2/20 | 0.38 |
| ▸ | MEN1 | O00255 | 1/20 | 0.38 |
| ▸ | KMT2A | Q03164 | 1/20 | 0.38 |
| ▸ | ALDH1A1 | P00352 | 1/20 | 0.33 |
| ▸ | ATM | Q13315 | 1/20 | 0.31 |
| ▸ | CHRM2 | P08172 | 1/20 | 0.31 |
| ▸ | CHRM4 | P08173 | 1/20 | 0.31 |
| ▸ | CHRM1 | P11229 | 1/20 | 0.31 |
| ▸ | CHRM3 | P20309 | 1/20 | 0.31 |
| ▸ | ACHE | P22303 | 1/20 | 0.31 |
| ▸ | NAAA | Q02083 | 1/20 | 0.31 |
| ▸ | DPP4 | P27487 | 1/20 | 0.30 |
Click a target to see other patent compounds predicted against it — the reverse direction, in place.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| SCHEMBL19881228 | 0.93 | NAAA (0.36) | TSHRMEN1KMT2AACHENAAA | |
| SCHEMBL10033495 | 0.90 | MEN1 (0.39) | TSHRMEN1KMT2AALDH1A1DPP4 | |
| SCHEMBL10176903 | 0.90 | MEN1 (0.39) | TSHRMEN1KMT2AALDH1A1DPP4 | |
| SCHEMBL10011875 | 0.85 | TSHR (0.34) | TSHRMEN1KMT2ADPP4 | |
| SCHEMBL10012313 | 0.85 | TSHR (0.39) | TSHRMEN1KMT2ADPP4 | |
| SCHEMBL10012054 | 0.85 | TSHR (0.34) | TSHRMEN1KMT2ADPP4 | |
| SCHEMBL19116949 | 0.82 | TSHR (0.39) | TSHRMEN1KMT2AALDH1A1ATM | |
| SCHEMBL19117261 | 0.82 | MEN1 (0.37) | TSHRMEN1KMT2AALDH1A1ATM | |
| SCHEMBL19116960 | 0.81 | MEN1 (0.36) | TSHRMEN1KMT2AALDH1A1CHRM2 | |
| SCHEMBL13541256 | 0.79 | ALDH1A1 (0.54) | TSHRALDH1A1ATMACHENAAA |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 5 patents. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| US-8293846-B2 | Composition for forming layer to be plated, method of producing metal pattern material, metal pattern material | FUJIFILM CORPORATION (JP) | 2012-10-23 | — | — | US | disclosed |
| US-7977029-B2 | Positive photosensitive composition | FUJIFILM CORPORATION (JP) | 2011-07-12 | — | — | US | disclosed |
| US-20110104454-A1 | COMPOSITION FOR FORMING LAYER TO BE PLATED, METHOD OF PRODUCING METAL PATTERN MATERIAL, AND METAL PATTERN MATERIAL | FUJIFILM CORPORATION (JP) | 2011-05-05 | — | — | US | disclosed |
| US-20100080964-A1 | COMPOSITION FOR FORMING LAYER TO BE PLATED, METHOD OF PRODUCING METAL PATTERN MATERIAL, METAL PATTERN MATERIAL | FUJIFILM CORPORATION (JP) | 2010-04-01 | — | — | US | disclosed |
| US-20080318159-A1 | POSITIVE PHOTOSENSITIVE COMPOSITION | FUJIFILM CORPORATION (JP) | 2008-12-25 | — | — | US | disclosed |