SCHEMBL124444

SCHEMBL124444

CCO/C(CC)=C(/Oc1ccccc1)C(=O)O

nearest known ligand 0.48

Predicted protein targets (top 20)

geneUniProtsupporting neighboursconfidence
MAPT P10636 2/20 0.48
RAB9A P51151 4/20 0.42
NPC1 O15118 4/20 0.42
HPGD P15428 2/20 0.42
CRHBP P24387 1/20 0.42
CRHR2 Q13324 1/20 0.42
TDP1 Q9NUW8 1/20 0.42
TSHR P16473 2/20 0.42
ELANE P08246 1/20 0.41
MEN1 O00255 2/20 0.40
KMT2A Q03164 2/20 0.40
CYP1A2 P05177 1/20 0.40
CYP2D6 P10635 1/20 0.40
CYP2C9 P11712 1/20 0.40
ALOX15 P16050 1/20 0.40
MAPK1 P28482 1/20 0.40
CYP2C19 P33261 1/20 0.40
CASP3 P42574 1/20 0.40
SENP8 Q96LD8 1/20 0.40
HSD17B10 Q99714 1/20 0.40

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL11449884 0.88 ELANE (0.45) MAPTRAB9ANPC1HPGDTDP1
SCHEMBL10892648 0.80 LMNA (0.43) MAPTRAB9ANPC1HPGDCRHBP
SCHEMBL9487571 0.79 MAPT (0.50) MAPTRAB9ANPC1HPGDCRHBP
SCHEMBL16893834 0.77 ELANE (0.45) MAPTRAB9ANPC1HPGDTDP1
SCHEMBL18422859 0.77 LMNA (0.40) MAPTRAB9ANPC1HPGDCRHBP
SCHEMBL6204942 0.76 ESR1 (0.51) ELANEKMT2ASMN1; SMN2
SCHEMBL79925 0.76 SOAT1 (0.44) MAPTTSHRCYP1A2CYP2D6ALOX15
SCHEMBL28398584 0.76 SOAT1 (0.44) MAPTTSHRCYP1A2CYP2D6ALOX15
SCHEMBL25434364 0.75 MAPT (0.47) MAPTRAB9ANPC1HPGDCRHBP
SCHEMBL37520 0.74 MAPT (0.56) MAPTRAB9ANPC1HPGDCRHBP

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 138 patents — showing the first 20. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
US-20190240958-A1 LAMINATE STRUCTURES WITH ENHANCED DAMPING PROPERTIES CORNING INC (US) 2019-08-08 US claimed
US-10350861-B2 Laminate structures with enhanced damping properties CORNING INCORPORATED (US) 2019-07-16 US claimed
EP-3328644-A2 LAMINATE STRUCTURES WITH ENHANCED DAMPING PROPERTIES Corning Incorporated (US) 2018-06-06 EP claimed
US-20170028687-A1 LAMINATE STRUCTURES WITH ENHANCED DAMPING PROPERTIES CORNING INCORPORATED 2017-02-02 US claimed
EP-0735062-B1 ACTINIC-RADIATION-CURABLE COMPOSITION AND LENS SHEET MITSUBISHI RAYON CO (JP) 2002-01-30 EP claimed
US-12122860-B2 Photocurable support material composition for inkjet 3D printers, ink for inkjet 3D printers, cartridge for inkjet 3D printers, method for producing support material and method for producing optically shaped article NIPPON SHOKUBAI CO., LTD. (JP) 2024-10-22 US disclosed
US-11981824-B2 Photocurable composition for support materials for inkjet 3D printers, ink, cartridge, method for producing support material, and method for producing optically shaped article NIPPON SHOKUBAI CO., LTD. (JP) 2024-05-14 US disclosed
EP-3760413-B1 PHOTOCURABLE COMPOSITION FOR SUPPORT MATERIALS FOR INKJET 3D PRINTERS, INK, CARTRIDGE, METHOD FOR PRODUCING SUPPORT MATERIAL, AND METHOD FOR PRODUCING OPTICALLY SHAPED ARTICLE NIPPON CATALYTIC CHEM IND (JP) 2023-09-27 EP disclosed
WO-2023156482-A1 THERMOSTABLE PHOTOPOLYMERS IN THE VISIBLE SPECTRAL RANGE AND PHOTOPOLYMER COMPOSITIONS CONTAINING SAME COVESTRO DEUTSCHLAND AG (DE) 2023-08-24 WO disclosed
WO-2023156484-A1 PHOTOPOLYMER COMPOSITIONS FOR THERMOSTABLE PHOTOPOLYMERS IN THE VISIBLE SPECTRAL RANGE COVESTRO DEUTSCHLAND AG (DE) 2023-08-24 WO disclosed
WO-2023156485-A1 TRIARYLALKYL BORATE SALTS AS COINITIATORS IN NIR PHOTOPOLYMER COMPOSITIONS COVESTRO DEUTSCHLAND AG (DE) 2023-08-24 WO disclosed
EP-3508335-B1 PHOTOCURABLE SUPPORT MATERIAL COMPOSITION FOR INKJET 3D PRINTERS, INK FOR INKJET 3D PRINTERS, CARTRIDGE FOR INKJET 3D PRINTERS, METHOD FOR PRODUCING SUPPORT MATERIAL AND METHOD FOR PRODUCING OPTICALLY SHAPED ARTICLE NIPPON CATALYTIC CHEM IND (JP) 2023-02-01 EP disclosed
EP-2172504-A1 Photopolymer formulations with low interlacing density Bayer MaterialScience AG (DE) 2010-04-07 EP disclosed
EP-0472852-B1 Preparation of a shock resistant polyacrylic ester-polyvinylchloride graft polymer VESTOLIT GMBH (DE) 1995-12-13 EP disclosed
EP-0222320-B1 PHOTOPOLYMERIZABLE COMPOSITION, REGISTRATION MATERIAL PREPARED THEREOF, AND PROCESS FOR THE PRODUCTION OF RELIEF IMAGES HOECHST AKTIENGESELLSCHAFT (DE) 1992-10-28 EP disclosed
EP-0472852-A2 Preparation of a shock resistant polyacrylic ester-polyvinylchloride graft polymer VESTOLIT GmbH (DE) 1992-03-04 EP disclosed
EP-0222320-A2 Photopolymerizable composition, registration material prepared thereof, and process for the production of relief images HOECHST AKTIENGESELLSCHAFT (DE) 1987-05-20 EP disclosed
EP-0195942-A2 Process for the preparation of free-flowing polyvinyl chloride with a high amount of acrylate rubber HÜLS AKTIENGESELLSCHAFT (DE) 1986-10-01 EP disclosed
EP-0124700-B1 TRANSPARENT IMPACT-RESISTANT POLYVINYL CHLORIDE-BASED MOULDING MASSES HÜLS AKTIENGESELLSCHAFT (DE) 1986-07-30 EP disclosed
EP-0124700-A1 Transparent impact-resistant polyvinyl chloride-based moulding masses HÜLS AKTIENGESELLSCHAFT (DE) 1984-11-14 EP disclosed