SCHEMBL1246651

SCHEMBL1246651

[O]C(=O)c1ccc(N(c2ccccc2)c2ccccc2)cc1

nearest known ligand 0.48

Predicted protein targets (top 20)

geneUniProtsupporting neighboursconfidence
ALDH1A1 P00352 4/20 0.48
L3MBTL1 Q9Y468 2/20 0.48
KDM4E B2RXH2 1/20 0.48
CYP1A2 P05177 1/20 0.48
CYP3A4 P08684 1/20 0.48
CYP2D6 P10635 1/20 0.48
MAPT P10636 1/20 0.48
CYP2C9 P11712 1/20 0.48
CYP2C19 P33261 1/20 0.48
TDP1 Q9NUW8 1/20 0.48
RAB9A P51151 2/20 0.45
MEN1 O00255 2/20 0.45
KMT2A Q03164 2/20 0.45
NPC1 O15118 1/20 0.45
HPGD P15428 1/20 0.45
CRHBP P24387 1/20 0.45
ATM Q13315 1/20 0.45
CRHR2 Q13324 1/20 0.45
TLR9 Q9NR96 1/20 0.45
NPSR1 Q6W5P4 1/20 0.44

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
Bicarbonate SCHEMBL6732703 0.85 NPSR1 (0.57) ALDH1A1L3MBTL1KDM4ECYP1A2CYP3A4
SCHEMBL2596293 0.84 TSHR (0.59) ALDH1A1L3MBTL1KDM4ECYP1A2CYP3A4
SCHEMBL3755778 0.84 CES2 (0.64) ALDH1A1L3MBTL1KDM4ECYP1A2CYP3A4
SCHEMBL1246652 0.84 TSHR (0.59) ALDH1A1L3MBTL1KDM4ECYP1A2CYP3A4
SCHEMBL329666 0.84 RAB9A (0.63) ALDH1A1L3MBTL1KDM4ECYP1A2CYP3A4
SCHEMBL329499 0.82 RAB9A (0.67) ALDH1A1L3MBTL1KDM4ECYP1A2CYP3A4
SCHEMBL14982120 0.82 CES2 (0.68) ALDH1A1L3MBTL1KDM4ECYP1A2CYP3A4
SCHEMBL8684872 0.82 RAB9A (0.67) ALDH1A1L3MBTL1KDM4ECYP1A2CYP3A4
Terephthalic Acid SCHEMBL10615446 0.81 TSHR (0.62) ALDH1A1L3MBTL1KDM4ECYP1A2CYP3A4
SCHEMBL7050772 0.80 MAPT (0.59) ALDH1A1L3MBTL1KDM4ECYP1A2CYP3A4

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 57 patents — showing the first 20. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
CN-115079317-A Goggles with hydrophilic antifogging film layer and film coating method 江苏菲沃泰纳米科技股份有限公司 2022-09-20 CN disclosed
US-7879535-B2 A fine conductive metal pattern superior in heat resistance, adhesion property to a base surface and durability on a polyimide surface; simplification; grafting an acylic monomer on polyimide to interact with electroless plating catalyst; reduction of metal salt in defined pattern; printed circuit FUJIFILM CORPORATION (JP) 2011-02-01 US disclosed
US-7438950-B2 Metallic pattern forming method and conductive pattern material FUJIFILM CORPORATION (JP) 2008-10-21 US disclosed
EP-1508453-B1 Method of forming metal fine particle pattern and method of forming electroconductive pattern FUJIFILM CORP (JP) 2008-03-26 EP disclosed
US-7306895-B2 Pattern forming method, image forming method, fine particle adsorption pattern forming method, conductive pattern forming method, pattern forming material and planographic printing plate FUJIFILM CORPORATION (JP) 2007-12-11 US disclosed
EP-0903224-B1 Radiation-sensitive planographic plate precursor and planographic plate FUJIFILM CORP (JP) 2007-11-14 EP disclosed
US-7279195-B2 Method of forming metal fine particle pattern and method of forming electroconductive pattern FUJIFILM CORPORATION (JP) 2007-10-09 US disclosed
US-7157193-B2 Image forming material, color filter master plate, and color filter FUJI PHOTO FILM CO., LTD. (JP) 2007-01-02 US disclosed
US-7056642-B2 First forming a polymerization initiating layer, which is immobilized on a PET support by a crosslinking reaction, then bonding an acrylate monomer by irradiating; making a printing plate with pattern, photolithography FUJI PHOTO FILM CO., LTD. (JP) 2006-06-06 US disclosed
EP-1400544-B1 A method of graft polymerization and variety of materials utilizing the same as well as producing method thereof FUJI PHOTO FILM CO LTD (JP) 2005-12-28 EP disclosed
US-6114083-A CAN BE DIRECTLY PRODUCED WITH IRRADIATION BY VARIOUS KINDS OF LASERS BASED ON DIGITAL SIGNALS, CAN BE DEVELOPED WITH WATER, OR IS SUITABLE FOR PRODUCING A PROCESSING-FREE PRINTING PLATE CAPABLE OF PRINTING BY MOUNTING ON A PRINTING MACHINE AS IS FUJI PHOTO FILM CO., LTD. (JP) 2000-09-05 US disclosed
EP-1031412-A1 Heat-sensitive lithographic printing plate FUJI PHOTO FILM CO., LTD. (JP) 2000-08-30 EP disclosed
US-6017677-A SUBSTRATE HAVING RCORDING LAYER CONTAINING PHOTO ACID-GENERATING AGENT AND A POLYMER HAVING SULFONIC ACID-GENERATING MOIETIES ON SIDE CHAINS FUJI PHOTO FILM CO., LTD. (JP) 2000-01-25 US disclosed
EP-0950515-A2 Heat-hardenable composition and planographic form plate using the composition FUJI PHOTO FILM CO., LTD (JP) 1999-10-20 EP disclosed
EP-0941839-A2 Radiant ray-sensitive lithographic printing plate precursor FUJI PHOTO FILM CO., LTD. (JP) 1999-09-15 EP disclosed
EP-0903224-A2 Radiation-sensitive planographic plate FUJI PHOTO FILM CO., LTD. (JP) 1999-03-24 EP disclosed
EP-0855267-A2 Planographic printing plate FUJI PHOTO FILM CO., LTD. (JP) 1998-07-29 EP disclosed
US-5731123-A SULFONIMIDE AND ACID GENERATING COMPOUNDS FUJI PHOTO FILM CO., LTD. (JP) 1998-03-24 US disclosed
EP-0814381-A1 Positive image forming composition FUJI PHOTO FILM CO., LTD. (JP) 1997-12-29 EP disclosed
US-5698369-A PHOTODECOMPOSABLE FUJI PHOTO FILM CO., LTD. (JP) 1997-12-16 US disclosed