SCHEMBL12477948

SCHEMBL12477948

Cc1cc2ccccc2c(C)c1S(=O)(=O)NS(=O)(=O)c1c(C)cc2ccccc2c1C

nearest known ligand 0.41

Predicted protein targets (top 20)

geneUniProtsupporting neighboursconfidence
CYP1A2 P05177 3/20 0.41
CYP2A6 P11509 3/20 0.41
TSHR P16473 1/20 0.41
NR3C1 P04150 1/20 0.39
PGR P06401 1/20 0.39
NR3C2 P08235 1/20 0.39
L3MBTL1 Q9Y468 2/20 0.39
EDNRB P24530 1/20 0.38
EDNRA P25101 1/20 0.38
MEN1 O00255 2/20 0.36
KMT2A Q03164 2/20 0.36
SMN1; SMN2 Q16637 2/20 0.36
ALDH1A1 P00352 3/20 0.36
GAA P10253 2/20 0.36
HPGD P15428 1/20 0.36
HSD17B10 Q99714 1/20 0.36
KDM4E B2RXH2 1/20 0.36
MAPT P10636 3/20 0.36
HTT P42858 1/20 0.36
NPSR1 Q6W5P4 1/20 0.36

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
Potassium Ion SCHEMBL7711503 0.79 CYP1A2 (0.41) CYP1A2CYP2A6TSHRNR3C1PGR
SCHEMBL31339530 0.71 CYP2D6 (0.53) CYP1A2CYP2A6MEN1KMT2AALDH1A1
SCHEMBL153710 0.71 CYP2D6 (0.53) CYP1A2CYP2A6MEN1KMT2AALDH1A1
SCHEMBL459684 0.71 CYP1A2 (0.56) CYP1A2CYP2A6TSHRL3MBTL1ALDH1A1
SCHEMBL12478878 0.71 L3MBTL1 (0.43) L3MBTL1MEN1KMT2ASMN1; SMN2ALDH1A1
SCHEMBL11139259 0.70 CYP2D6 (0.47) CYP1A2CYP2A6TSHRALDH1A1GAA
SCHEMBL8415193 0.70 CA2 (0.43) CYP1A2CYP2A6TSHRALDH1A1GAA
SCHEMBL10744779 0.70 CYP1A2 (0.41) CYP1A2CYP2A6TSHRL3MBTL1MEN1
SCHEMBL437289 0.70 CYP2D6 (0.51) CYP1A2CYP2A6TSHRMEN1KMT2A
SCHEMBL31214950 0.70 CYP2D6 (0.51) CYP1A2CYP2A6MEN1KMT2AALDH1A1

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 6 patents. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
US-8927194-B2 Chemical amplified photoresist composition SUMITOMO CHEMICAL COMPANY, LIMITED (JP) 2015-01-06 US disclosed
US-20130177851-A1 PHOTORESIST COMPOSITION SUMITOMO CHEMICAL COMPANY, LIMITED (JP) 2013-07-11 US disclosed
US-20130101940-A1 CHEMICAL AMPLIFIED PHOTORESIST COMPOSITION SUMITOMO CHEMICAL COMPANY, LIMITED (JP) 2013-04-25 US disclosed
US-7972763-B2 Patterns having high resolution; used for semiconductor microfabrication employing a lithography SUMITOMO CHEMICAL COMPANY, LIMITED (JP) 2011-07-05 US disclosed
US-20080153036-A1 Chemically amplified positive resist compostion SUMITOMO CHEMICAL COMPANY, LIMITED (JP) 2008-06-26 US disclosed
US-7205090-B2 Chemical amplification type positive resist composition SUMITOMO CHEMICAL COMPANY, LIMITED (JP) 2007-04-17 US disclosed