SCHEMBL125477

SCHEMBL125477

C[Si](C)(CCN)O[Si](C)(C)CCN

nearest known ligand 0.00

⚠ Novel chemotype — no close known analogue (best Tanimoto < 0.3). Unexplored chemical space relative to ChEMBL.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL17019512 0.89
SCHEMBL13878404 0.88
SCHEMBL8679000 0.88
SCHEMBL31093462 0.85
SCHEMBL126890 0.81 NFKB1 (0.33)
SCHEMBL309272 0.81
Ammonia Solution, Strong SCHEMBL23577300 0.79 NFKB1 (0.32)
Putrescine SCHEMBL6283577 0.79 NFKB1 (0.39)
SCHEMBL202975 0.79 NFKB1 (0.39)
Hydrochloric Acid SCHEMBL8406945 0.79 DNM1 (0.33)

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 137 patents — showing the first 20. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
EP-2949719-B1 ADHESIVE COMPOSITION TORAY INDUSTRIES (JP) 2022-11-09 EP claimed
US-12319814-B2 Polyamideimide resin, resin composition, and semiconductor device RESONAC CORPORATION (JP) 2025-06-03 US disclosed
US-20240381529-A1 METHOD FOR MANUFACTURING SUBSTRATE MATERIAL FOR SEMICONDUCTOR PACKAGE, PREPREG, AND APPLICATION FOR PREPREG RESONAC CORPORATION (JP) 2024-11-14 US disclosed
EP-4365237-A1 RESIN COMPOSITION AND METHOD FOR PRODUCING SEMICONDUCTOR DEVICE Resonac Corporation (JP) 2024-05-08 EP disclosed
EP-4303250-A1 POLY(AMIDE-IMIDE) RESIN, RESIN COMPOSITION, AND SEMICONDUCTOR DEVICE Resonac Corporation (JP) 2024-01-10 EP disclosed
EP-4026867-B1 POLYAMIDEIMIDE RESIN, RESIN COMPOSITION, AND SEMICONDUCTOR DEVICE RESONAC CORP (JP) 2023-12-06 EP disclosed
US-20230331946-A1 METHOD FOR MANUFACTURING SUBSTRATE MATERIAL FOR SEMICONDUCTOR PACKAGE, PREPREG, AND SUBSTRATE MATERIAL FOR SEMICONDUCTOR PACKAGE RESONAC CORPORATION (JP) 2023-10-19 US disclosed
WO-2023042305-A1 METHOD FOR MANUFACTURING SUBSTRATE MATERIAL FOR SEMICONDUCTOR PACKAGE, PREPREG, AND APPLICATION FOR PREPREG 株式会社レゾナック 2023-03-23 WO disclosed
WO-2023277134-A1 RESIN COMPOSITION AND METHOD FOR PRODUCING SEMICONDUCTOR DEVICE 昭和電工マテリアルズ株式会社 2023-01-05 WO disclosed
WO-2023276093-A1 RESIN COMPOSITION AND METHOD FOR PRODUCING SEMICONDUCTOR DEVICE 昭和電工マテリアルズ株式会社 2023-01-05 WO disclosed
US-5605942-A POLYIMIDE HAVING EXCELLENT TRANSPARENCY, OXYGEN PERMEABILITY, HEAT RESISTANCE, ULTRAVIOLET LIGHT ABSORPTION MENICON CO., LTD. (JP) 1997-02-25 US disclosed
US-5578697-A DIELECTRIC POLYMERS FOR ELECTRONICS KABUSHIKI KAISHA TOSHIBA (JP) 1996-11-26 US disclosed
EP-0725284-A2 Ocular lens material Menicon Co., Ltd. (JP) 1996-08-07 EP disclosed
US-5543442-A POLYIMIDESILOXANE COPOLYMER MENICON CO., LTD. (JP) 1996-08-06 US disclosed
EP-0510638-B1 Silicon-modified polyimide film and process for producing same CHISSO CORP (JP) 1995-10-11 EP disclosed
EP-0634673-A1 Ocular lens material Menicon Co., Ltd. (JP) 1995-01-18 EP disclosed
US-5300364-A Metal-clad laminates and method for producing same CHISSO CORPORATION (JP) 1994-04-05 US disclosed
EP-0510638-A1 Silicon-modified polyimide film and process for producing same CHISSO CORPORATION (JP) 1992-10-28 EP disclosed
EP-0498898-A1 FLEXIBLE PRINTED CIRCUIT BOARD AND ITS MANUFACTURING CHISSO CORPORATION (JP) 1992-08-19 EP disclosed
EP-0496334-A1 A flexible base laminated with metal on both the surfaces and a process for producing same CHISSO CORPORATION (JP) 1992-07-29 EP disclosed