SCHEMBL309272

SCHEMBL309272

CO[Si](OC)(O[Si](C)(C)CCN)O[Si](C)(C)CCN

nearest known ligand 0.00

⚠ Novel chemotype — no close known analogue (best Tanimoto < 0.3). Unexplored chemical space relative to ChEMBL.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL126038 0.89
SCHEMBL9229787 0.86
SCHEMBL307804 0.84 NFKB1 (0.30)
SCHEMBL127783 0.82 DNM1 (0.33)
SCHEMBL2921445 0.81
SCHEMBL125477 0.81
SCHEMBL196567 0.78
SCHEMBL8679000 0.76
SCHEMBL13878404 0.76
SCHEMBL31093462 0.74

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 101 patents — showing the first 20. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
EP-2949719-B1 ADHESIVE COMPOSITION TORAY INDUSTRIES (JP) 2022-11-09 EP claimed
US-20240381529-A1 METHOD FOR MANUFACTURING SUBSTRATE MATERIAL FOR SEMICONDUCTOR PACKAGE, PREPREG, AND APPLICATION FOR PREPREG RESONAC CORPORATION (JP) 2024-11-14 US disclosed
US-20230331946-A1 METHOD FOR MANUFACTURING SUBSTRATE MATERIAL FOR SEMICONDUCTOR PACKAGE, PREPREG, AND SUBSTRATE MATERIAL FOR SEMICONDUCTOR PACKAGE RESONAC CORPORATION (JP) 2023-10-19 US disclosed
WO-2023042305-A1 METHOD FOR MANUFACTURING SUBSTRATE MATERIAL FOR SEMICONDUCTOR PACKAGE, PREPREG, AND APPLICATION FOR PREPREG 株式会社レゾナック 2023-03-23 WO disclosed
EP-2949719-B1 ADHESIVE COMPOSITION TORAY INDUSTRIES (JP) 2022-11-09 EP disclosed
US-20220289976-A1 THERMOSETTING RESIN COMPOSITION, THERMOSETTING RESIN SHEET, ELECTRONIC COMPONENT, AND ELECTRONIC DEVICE TORAY INDUSTRIES, INC. (JP) 2022-09-15 US disclosed
CN-114450351-A Thermosetting resin composition, thermosetting resin sheet, electronic component, and electronic device 东丽株式会社 2022-05-06 CN disclosed
WO-2022059716-A1 METHOD FOR MANUFACTURING SUBSTRATE MATERIAL FOR SEMICONDUCTOR PACKAGE, PREPREG, AND SUBSTRATE MATERIAL FOR SEMICONDUCTOR PACKAGE 昭和電工マテリアルズ株式会社 2022-03-24 WO disclosed
WO-2022059167-A1 METHOD FOR PRODUCING SUBSTRATE MATERIAL FOR SEMICONDUCTOR PACKAGES, PREPREG, AND SUBSTRATE MATERIAL FOR SEMICONDUCTOR PACKAGES 昭和電工マテリアルズ株式会社 2022-03-24 WO disclosed
US-20220019146-A1 FILM FORMING MATERIAL FOR LITHOGRAPHY, COMPOSITION FOR FILM FORMATION FOR LITHOGRAPHY, UNDERLAYER FILM FOR LITHOGRAPHY, AND METHOD FOR FORMING PATTERN MITSUBISHI GAS CHEMICAL COMPANY, INC. (JP) 2022-01-20 US disclosed
US-20070169886-A1 Heat-resistant resin laminated film, multilayer film with metal layer including same and semiconductor device TORAY INDUSTRIES, INC. (JP) 2007-07-26 US disclosed
US-20070098995-A1 Adhesive film and process for preparing the same as well as adhesive sheet and semiconductor device HITACHI CHEMICAL CO., LTD. (JP) 2007-05-03 US disclosed
EP-1721740-A1 HEAT-RESISTANT RESIN LAMINATED FILM, MULTILAYER FILM WITH METAL LAYER INCLUDING SAME, AND SEMICONDUCTOR DEVICE TORAY INDUSTRIES, INC. (JP) 2006-11-15 EP disclosed
EP-1407879-A1 HEAT-RESISTANT RESIN FILM WITH METAL LAYER AND WIRING BOARD AND METHOD FOR MANUFACTURING THEM TORAY INDUSTRIES, INC. (JP) 2004-04-14 EP disclosed
US-20030170431-A1 Heat-resistant resin film with metal layer and wiring board, and method for manufacturing them TORAY INDUSTRIES, INC. (JP) 2003-09-11 US disclosed
EP-0510638-B1 Silicon-modified polyimide film and process for producing same CHISSO CORP (JP) 1995-10-11 EP disclosed
US-5300364-A Metal-clad laminates and method for producing same CHISSO CORPORATION (JP) 1994-04-05 US disclosed
EP-0510638-A1 Silicon-modified polyimide film and process for producing same CHISSO CORPORATION (JP) 1992-10-28 EP disclosed
EP-0498898-A1 FLEXIBLE PRINTED CIRCUIT BOARD AND ITS MANUFACTURING CHISSO CORPORATION (JP) 1992-08-19 EP disclosed
EP-0496334-A1 A flexible base laminated with metal on both the surfaces and a process for producing same CHISSO CORPORATION (JP) 1992-07-29 EP disclosed