SCHEMBL12548643

SCHEMBL12548643

Cc1c(C(C)C)c(C)c(C(C)C)c([N+](=O)[O-])c1C(C)C

nearest known ligand 0.38

Predicted protein targets (top 20)

geneUniProtsupporting neighboursconfidence
TDP1 Q9NUW8 3/20 0.38
ALDH1A1 P00352 3/20 0.38
TSHR P16473 6/20 0.34
SMN1; SMN2 Q16637 1/20 0.34
NPC1 O15118 1/20 0.32
MAPT P10636 1/20 0.32
MAPK1 P28482 1/20 0.32
CASP3 P42574 1/20 0.32
RAB9A P51151 1/20 0.32
SENP7 Q9BQF6 1/20 0.32
SENP6 Q9GZR1 1/20 0.32
PKM P14618 1/20 0.31
CYP3A4 P08684 1/20 0.31
GRIN2D O15399 1/20 0.31
GRIN3B O60391 1/20 0.31
GRIN1 Q05586 1/20 0.31
GRIN2A Q12879 1/20 0.31
GRIN2B Q13224 1/20 0.31
GRIN2C Q14957 1/20 0.31
GRIN3A Q8TCU5 1/20 0.31

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL10087749 0.95 TDP1 (0.38) TDP1ALDH1A1TSHRSMN1; SMN2NPC1
SCHEMBL9004845 0.85 ALDH1A1 (0.39) TDP1ALDH1A1TSHRSMN1; SMN2NPC1
SCHEMBL12569528 0.81 FABP3 (0.33)
SCHEMBL107210 0.76 ALDH1A1 (0.35) TDP1ALDH1A1TSHRGRIN2DGRIN3B
SCHEMBL9004731 0.75 ALDH1A1 (0.36) TDP1ALDH1A1TSHRNPC1MAPT
SCHEMBL5862368 0.73 FABP3 (0.36)
SCHEMBL27727673 0.73 GPR35 (0.34) TDP1ALDH1A1TSHRGRIN2DGRIN3B
SCHEMBL26382436 0.73 ALDH1A1 (0.32) TDP1ALDH1A1NPC1MAPTMAPK1
SCHEMBL15957606 0.70 TDP1 (0.50) TDP1ALDH1A1TSHRSMN1; SMN2PKM
SCHEMBL7592620 0.70 TDP1 (0.50) TDP1ALDH1A1TSHRSMN1; SMN2PKM

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 2 patents. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
US-8932794-B2 Positive photosensitive composition and pattern forming method using the same FUJIFILM CORPORATION (JP) 2015-01-13 US disclosed
US-20110136062-A1 POSITIVE PHOTOSENSITIVE COMPOSITION AND PATTERN FORMING METHOD USING THE SAME FUJIFILM CORPORATION (JP) 2011-06-09 US disclosed