Predicted protein targets (top 3)
| gene | UniProt | supporting neighbours | confidence | |
|---|---|---|---|---|
| ▸ | FABP3 | P05413 | 1/20 | 0.36 |
| ▸ | FABP4 | P15090 | 1/20 | 0.36 |
| ▸ | FABP5 | Q01469 | 1/20 | 0.36 |
Click a target to see other patent compounds predicted against it — the reverse direction, in place.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| SCHEMBL12569528 | 0.91 | FABP3 (0.33) | FABP3FABP4FABP5 | |
| SCHEMBL9004845 | 0.81 | ALDH1A1 (0.39) | — | |
| SCHEMBL178363 | 0.80 | FABP3 (0.49) | FABP3FABP4FABP5 | |
| SCHEMBL5388305 | 0.80 | FABP3 (0.49) | FABP3FABP4FABP5 | |
| SCHEMBL5376952 | 0.79 | FABP3 (0.47) | FABP3FABP4FABP5 | |
| SCHEMBL10087749 | 0.77 | TDP1 (0.38) | — | |
| SCHEMBL12548643 | 0.73 | TDP1 (0.38) | — | |
| SCHEMBL29083018 | 0.72 | NSD2 (0.38) | — | |
| SCHEMBL14883084 | 0.70 | FABP3 (0.43) | FABP3FABP4FABP5 | |
| SCHEMBL7821939 | 0.69 | TDP1 (0.35) | — |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 22 patents — showing the first 20. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| US-8927194-B2 | Chemical amplified photoresist composition | SUMITOMO CHEMICAL COMPANY, LIMITED (JP) | 2015-01-06 | — | — | US | disclosed |
| US-8927194-B2 | Chemical amplified photoresist composition | SUMITOMO CHEMICAL COMPANY, LIMITED (JP) | 2015-01-06 | — | — | US | disclosed |
| US-20130177851-A1 | PHOTORESIST COMPOSITION | SUMITOMO CHEMICAL COMPANY, LIMITED (JP) | 2013-07-11 | — | — | US | disclosed |
| US-20130101940-A1 | CHEMICAL AMPLIFIED PHOTORESIST COMPOSITION | SUMITOMO CHEMICAL COMPANY, LIMITED (JP) | 2013-04-25 | — | — | US | disclosed |
| US-20130101940-A1 | CHEMICAL AMPLIFIED PHOTORESIST COMPOSITION | SUMITOMO CHEMICAL COMPANY, LIMITED (JP) | 2013-04-25 | — | — | US | disclosed |
| US-8343708-B2 | Positive resist composition and pattern forming method | FUJIFILM CORPORATION (JP) | 2013-01-01 | — | — | US | disclosed |
| US-20120034564-A1 | POSITIVE RESIST COMPOSITION AND PATTERN FORMING METHOD | FUJIFILM CORPORATION (JP) | 2012-02-09 | — | — | US | disclosed |
| US-8034537-B2 | Positive resist composition and pattern forming method | FUJIFILM CORPORATION (JP) | 2011-10-11 | — | — | US | disclosed |
| US-7972763-B2 | Patterns having high resolution; used for semiconductor microfabrication employing a lithography | SUMITOMO CHEMICAL COMPANY, LIMITED (JP) | 2011-07-05 | — | — | US | disclosed |
| US-20100112477-A1 | POSITIVE RESIST COMPOSITION AND PATTERN FORMING METHOD | FUJIFILM CORPORATION (JP) | 2010-05-06 | — | — | US | disclosed |
| US-20080248421-A1 | POSITIVE RESIST COMPOSITION AND PATTERN FORMING METHOD | FUJIFILM CORPORATION (JP) | 2008-10-09 | — | — | US | disclosed |
| US-20080241746-A1 | POSITIVE RESIST COMPOSITION AND PATTERN FORMING METHOD | FUJIFILM CORPORATION (JP) | 2008-10-02 | — | — | US | disclosed |
| US-20080153036-A1 | Chemically amplified positive resist compostion | SUMITOMO CHEMICAL COMPANY, LIMITED (JP) | 2008-06-26 | — | — | US | disclosed |
| US-7220532-B2 | Chemical amplification type resist composition | SUMITOMO CHEMICAL COMPANY, LIMITED (JP) | 2007-05-22 | — | — | US | disclosed |
| US-7220532-B2 | Chemical amplification type resist composition | SUMITOMO CHEMICAL COMPANY, LIMITED (JP) | 2007-05-22 | — | — | US | disclosed |
| US-7205090-B2 | Chemical amplification type positive resist composition | SUMITOMO CHEMICAL COMPANY, LIMITED (JP) | 2007-04-17 | — | — | US | disclosed |
| US-7205090-B2 | Chemical amplification type positive resist composition | SUMITOMO CHEMICAL COMPANY, LIMITED (JP) | 2007-04-17 | — | — | US | disclosed |
| US-7175963-B2 | Chemical amplification type positive resist composition and a resin therefor | SUMITOMO CHEMICAL COMPANY, LIMITED (JP) | 2007-02-13 | — | — | US | disclosed |
| US-7135268-B2 | Using aromatic sulfonate compound | SUMITOMO CHEMICAL COMPANY, LIMITED (JP) | 2006-11-14 | — | — | US | disclosed |
| US-20040029037-A1 | Amplification type positive resist composition | SUMITOMO CHEMICAL COMPANY, LIMITED (JP) | 2004-02-12 | — | — | US | disclosed |