SCHEMBL12587771

SCHEMBL12587771

COc1ccc(C(=O)c2ccccc2)c(CO)c1OC

nearest known ligand 0.57

Predicted protein targets (top 20)

geneUniProtsupporting neighboursconfidence
MAPT P10636 10/20 0.57
KDM4E B2RXH2 3/20 0.57
HSD17B10 Q99714 3/20 0.57
MAPK1 P28482 3/20 0.57
ALOX15 P16050 1/20 0.57
LMNA P02545 8/20 0.54
HTT P42858 3/20 0.54
NPSR1 Q6W5P4 2/20 0.54
SMN1; SMN2 Q16637 1/20 0.54
HPGD P15428 5/20 0.49
CYP3A4 P08684 2/20 0.49
RECQL P46063 2/20 0.49
L3MBTL1 Q9Y468 2/20 0.47
TDP1 Q9NUW8 2/20 0.46
KMT2A Q03164 2/20 0.46
ALDH1A1 P00352 3/20 0.46
CYP1A2 P05177 2/20 0.46
CYP2D6 P10635 2/20 0.46
CYP2C19 P33261 2/20 0.46
PGR P06401 1/20 0.46

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL28349799 0.88 MAPT (0.57) MAPTKDM4EHSD17B10MAPK1ALOX15
SCHEMBL12587770 0.87 MAPK1 (0.46) MAPTKDM4EHSD17B10MAPK1ALOX15
SCHEMBL15889633 0.85 MAPT (0.47) MAPTKDM4EHSD17B10MAPK1ALOX15
SCHEMBL7947089 0.83 MAPT (0.62) MAPTKDM4EHSD17B10MAPK1ALOX15
SCHEMBL2446110 0.83 MAPT (0.66) MAPTKDM4EHSD17B10MAPK1ALOX15
SCHEMBL30023422 0.83 MAPT (0.66) MAPTKDM4EHSD17B10MAPK1ALOX15
SCHEMBL28401771 0.81 MAPT (0.64) MAPTKDM4EHSD17B10MAPK1ALOX15
SCHEMBL6444260 0.80 MAPT (0.77) MAPTKDM4EHSD17B10MAPK1ALOX15
Fumaric Acid SCHEMBL11220538 0.80 MAPT (0.62) MAPTKDM4EHSD17B10MAPK1ALOX15
SCHEMBL9442995 0.79 MAPT (0.60) MAPTKDM4EHSD17B10MAPK1ALOX15

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 11 patents. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
US-20170174807-A1 POLYMER, PHOTOSENSITIVE RESIN COMPOSITION, AND ELECTRONIC DEVICE SUMITOMO BAKELITE CO., LTD. (JP) 2017-06-22 US disclosed
US-20170088672-A1 POLYMER, PHOTOSENSITIVE RESIN COMPOSITION, AND ELECTRONIC DEVICE SUMITOMO BAKELITE CO., LTD. (JP) 2017-03-30 US disclosed
US-9527943-B2 Polymer, photosensitive resin composition and electronic device SUMITOMO BAKELITE CO., LTD. (JP) 2016-12-27 US disclosed
US-9366956-B2 Self-imageable layer forming polymer and compositions thereof PROMERUS, LLC (US) 2016-06-14 US disclosed
US-20150252132-A1 POLYMER, PHOTOSENSITIVE RESIN COMPOSITION AND ELECTRONIC DEVICE SUMITOMO BAKELITE CO., LTD. (JP) 2015-09-10 US disclosed
US-20140205948-A1 SELF-IMAGEABLE LAYER FORMING POLYMER AND COMPOSITIONS THEREOF SUMITOMO BAKELITE CO., LTD. (JP) 2014-07-24 US disclosed
US-8715900-B2 Self-imageable layer forming polymer and compositions thereof PROMERUS, LLC (US) 2014-05-06 US disclosed
US-20130280654-A1 POSITIVE-TYPE PHOTOSENSITIVE RESIN COMPOSITION, CURED FILM, PROTECTIVE FILM, INSULATING FILM, AND SEMICONDUCTOR DEVICE AND DISPLAY DEVICE INCLUDING THE CURED FILM SUMITOMO BAKELITE CO (JP) 2013-10-24 US disclosed
US-8492469-B2 Positive-type photosensitive resin composition, cured film, protective film, insulating film, and semiconductor device and display device including the cured film SUMITOMO BAKELITE CO., LTD. (JP) 2013-07-23 US disclosed
US-20130017488-A1 Self-Imageable Layer Forming Polymer and Compositions Thereof PROMERUS LLC (US) 2013-01-17 US disclosed
US-20110136952-A1 POSITIVE-TYPE PHOTOSENSITIVE RESIN COMPOSITION, CURED FILM, PROTECTIVE FILM, INSULATING FILM, AND SEMICONDUCTOR DEVICE AND DISPLAY DEVICE INCLUDING THE CURED FILM SUMITOMO BAKELITE CO., LTD. (JP) 2011-06-09 US disclosed