SCHEMBL12602016

SCHEMBL12602016

C=C1C(=O)OC(=O)/C1=C/C

nearest known ligand 0.00

⚠ Novel chemotype — no close known analogue (best Tanimoto < 0.3). Unexplored chemical space relative to ChEMBL.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL18458101 0.81 ALOX15 (0.32)
SCHEMBL14231679 0.78
SCHEMBL16558594 0.73
SCHEMBL21338631 0.72
SCHEMBL18461351 0.71
SCHEMBL13809026 0.67
SCHEMBL12658266 0.67 TRPA1 (0.32)
SCHEMBL19204429 0.67 ALDH1A1 (0.38)
SCHEMBL18800935 0.67 TRPA1 (0.32)
SCHEMBL253699 0.67 ALDH1A1 (0.38)

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 5 patents. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
US-20230192592-A1 MONOMER AND POLYMER, COMPENSATION FILM, OPTICAL FILM, AND DISPLAY DEVICE SAMSUNG ELECTRONICS CO LTD (KR) 2023-06-22 US disclosed
WO-2017066660-A1 METHODS OF MANUFACTURE OF THERMOPLASTIC POLYMERS SABIC GLOBAL TECHNOLOGIES B.V. (NL) 2017-04-20 WO disclosed
EP-2090598-B1 Polymer, resist composition, and patterning process SHINETSU CHEMICAL CO (JP) 2011-06-29 EP disclosed
EP-2090598-A1 Polymer, resist composition, and patterning process Shin-Etsu Chemical Co., Ltd. (JP) 2009-08-19 EP disclosed
US-7335454-B2 Positive resist composition FUJIFILM CORPORATION (JP) 2008-02-26 US disclosed