SCHEMBL1262971

SCHEMBL1262971

C=C(C)C(=O)OCC[N+](C)(C)C.Cc1ccc(S(=O)(=O)O)cc1

nearest known ligand 0.43

Known targets — ChEMBL curated mechanism

ABL1BMXBRAFBTKCHRNA4CHRNB2CSNK1EEGFRERBB2F10FLT1FLT3FLT4IGF1RINSRITKJAK3KDRKITOPRM1PARP1PARP2PDGFRBPIK3CDRAF1RETSLC18A2TECTXKdacAdacBdacCftsImrcAmrcBmrdArplArplBrplCrplDrplErplFrplJrplKrplLrplMrplNrplOrplPrplQrplRrplSrplTrplUrplVrplWrplXrplYrpmArpmBrpmCrpmDrpmErpmFrpmGrpmHrpmIrpmJrpsArpsBrpsCrpsDrpsErpsFrpsGrpsHrpsIrpsJrpsKrpsLrpsMrpsNrpsOrpsPrpsQrpsRrpsSrpsTrpsUykgMykgO

The experimentally established mechanism targets of None. The predicted profile below is derived independently by chemical similarity — agreement is a validation signal, a miss is honest.

Predicted protein targets (top 20)

geneUniProtsupporting neighboursconfidence
CHRNB2 known ✓ P17787 1/20 0.40
CHRNA4 known ✓ P43681 1/20 0.40
CYP1A2 P05177 2/20 0.43
CYP2C9 P11712 1/20 0.43
CHRM1 P11229 5/20 0.42
CHRM3 P20309 5/20 0.42
CHRM5 P08912 3/20 0.42
CHRM2 P08172 4/20 0.40
CHRM4 P08173 4/20 0.40
SMN1; SMN2 Q16637 3/20 0.40
PGR P06401 1/20 0.40
HTR1A P08908 1/20 0.40
TBXA2R P21731 1/20 0.40
CHRNB4 P30926 1/20 0.40
CHRNA3 P32297 1/20 0.40
CHRNA7 P36544 1/20 0.40
CHRNA10 Q9GZZ6 1/20 0.40
CHRNA9 Q9UGM1 1/20 0.40
CA1 P00915 1/20 0.40
CA2 P00918 1/20 0.40

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
Ammonia Solution, Strong SCHEMBL27752712 0.99 CYP1A2 (0.43) CYP1A2CYP2C9CHRM1CHRM3CHRM5
SCHEMBL16592456 0.92 CYP1A2 (0.43) CYP1A2CYP2C9CHRM1CHRM3CHRM5
SCHEMBL11794391 0.90 CA1 (0.46) CYP1A2CYP2C9SMN1; SMN2CA1CA2
SCHEMBL895605 0.90 CHRM1 (0.40) CYP1A2CYP2C9CHRM1CHRM3CHRM5
SCHEMBL1262969 0.89 CHRM1 (0.42) CHRM1CHRM3CHRM5CHRM2CHRM4
Trimethylammonium SCHEMBL28404363 0.87 CYP1A2 (0.38) CYP1A2CYP2C9SMN1; SMN2CA1CA2
Acetylcholine SCHEMBL14840381 0.86 CHRM1 (0.58) CYP1A2CYP2C9CHRM1CHRM3CHRM5
Acetylcholine SCHEMBL28024294 0.85 CHRM1 (0.56) CYP1A2CYP2C9CHRM1CHRM3CHRM5
Trimethylammonium SCHEMBL28403993 0.83 LMNA (0.39) CYP1A2CYP2C9SMN1; SMN2CA1CA2
SCHEMBL14691490 0.83 CYP1A2 (0.45) CYP1A2CYP2C9SMN1; SMN2CA1CA2

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 67 patents — showing the first 20. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
US-7968083-B2 Methods of manufacturing deodorants, and deodorants resulting thereof THE HONG KONG POLYTECHNIC UNIVERSITY (CN) 2011-06-28 US claimed
US-20050232880-A1 Methods of manufacturing deodorants, and deodorants resulting thereof HONG KONG POLYTECHNIC UNIVERSITY, THE (CN) 2005-10-20 US claimed
US-6001549-A IMAGING ELEMENT CONTAINING ANTISTATIC AGENT EASTMAN KODAK COMPANY (US) 1999-12-14 US claimed
US-7968083-B2 Methods of manufacturing deodorants, and deodorants resulting thereof THE HONG KONG POLYTECHNIC UNIVERSITY (CN) 2011-06-28 US disclosed
US-7896485-B2 Light cure of cationic ink on acidic substrates GERBER SCIENTIFIC INTERNATIONAL, INC. (US) 2011-03-01 US disclosed
US-7878644-B2 Light cure of cationic ink on acidic substrates GERBER SCIENTIFIC INTERNATIONAL, INC. (US) 2011-02-01 US disclosed
EP-1604825-B1 Ink jet recording method FUJIFILM CORP (JP) 2010-09-22 EP disclosed
US-20100168282-A1 DISPERSION COMPRISING INORGANIC PARTICLES, WATER, AND AT LEAST ONE POLYMERIC ADDITIVE EVONIK ROEHM GMBH (DE) 2010-07-01 US disclosed
EP-1674536-B1 Inkjet ink composition FUJIFILM CORP (JP) 2009-10-21 EP disclosed
US-7441883-B2 Production process of inkjet ink composition and inkjet composition FUJIFILM CORPORATION (JP) 2008-10-28 US disclosed
EP-1512730-B1 Ink composition and inkjet recording method FUJIFILM CORP (JP) 2008-08-06 EP disclosed
EP-0201186-B1 METHOD OF TREATING PHOTOGRAPHIC WASTE SOLUTIONS AND AUTOMATIC PHOTOGRAPH PROCESSOR KONICA CORPORATION (JP) 1990-05-30 EP disclosed
EP-0201186-A1 Method of treating photographic waste solutions and automatic photograph processor KONICA CORPORATION (JP) 1986-11-12 EP disclosed
EP-0042307-B1 AN OPTICAL RECORDING ELEMENT AND A METHOD OF RECORDING INFORMATION USING THE ELEMENT EASTMAN KODAK COMPANY (a New Jersey corporation) (US) 1986-09-10 EP disclosed
US-4340655-A Thermal and mechanical barrier layers for optical recording elements EASTMAN KODAK COMPANY (US) 1982-07-20 US disclosed
EP-0042307-A2 An optical recording element and a method of recording information using the element EASTMAN KODAK COMPANY (a New Jersey corporation) (US) 1981-12-23 EP disclosed
US-4166093-A REDUCTION OF DETECTABLE SPECIES MIGRATION IN ELEMENTS FOR THE ANALYSIS OF LIQUIDS EASTMAN KODAK COMPANY (US) 1979-08-28 US disclosed
EP-0000247-A1 Water-absorbent starch copolymerisates and method for their preparation. A.E. STALEY MANUFACTURING COMPANY (US) 1979-01-10 EP disclosed
US-4133687-A Photographic elements having hydrophilic colloid layers containing compounds having activator precursors and hydrophobic developing agents uniformly loaded in latex polymer particles EASTMAN KODAK COMPANY (US) 1979-01-09 US disclosed
US-4115332-A Water-absorbent starch copolymerizates A. E. STALEY MANUFACTURING COMPANY (US) 1978-09-19 US disclosed