Hydrochloric Acid

Hydrochloric Acid

SCHEMBL126374

CCCC[N+](CCCC)(CCCC)c1ccccc1.[Cl-]

nearest known ligand 0.46

Full drug profile on Sugi Atlas →

Known targets — ChEMBL curated mechanism

ACHEBDKRB2CHRM1CHRM2CHRM3CHRNA1CHRNB1CHRNDCHRNECHRNGGUCY1A1GUCY1A2GUCY1B1GUCY1B2NAMPTPTAFRSLC10A2SLC6A2SLC6A3TACR1dacAdacBdacCftsImrcAmrcBmrdA

The experimentally established mechanism targets of Hydrochloric Acid. The predicted profile below is derived independently by chemical similarity — agreement is a validation signal, a miss is honest.

Predicted protein targets (top 20)

geneUniProtsupporting neighboursconfidence
CHRM2 known ✓ P08172 1/20 0.38
CHRM1 known ✓ P11229 1/20 0.38
CHRM3 known ✓ P20309 1/20 0.38
SLC6A2 known ✓ P23975 1/20 0.38
SLC6A3 known ✓ Q01959 1/20 0.38
SMN1; SMN2 Q16637 3/20 0.46
MEN1 O00255 2/20 0.46
KMT2A Q03164 2/20 0.46
MAPK1 P28482 2/20 0.46
TP53 P04637 1/20 0.46
HTT P42858 3/20 0.44
DNM1 Q05193 2/20 0.42
APOBEC3A P31941 1/20 0.39
APOBEC3G Q9HC16 1/20 0.39
MLNR O43193 1/20 0.38
NR1I2 O75469 1/20 0.38
ESR1 P03372 1/20 0.38
NR3C1 P04150 1/20 0.38
PGR P06401 1/20 0.38
ADRB2 P07550 1/20 0.38

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL1239685 0.98 DNM1 (0.44) SMN1; SMN2MEN1KMT2AMAPK1TP53
Iodide SCHEMBL5087257 0.95 APOBEC3A (0.44) SMN1; SMN2MEN1KMT2AMAPK1TP53
Bromide SCHEMBL5091360 0.95 DNM1 (0.46) SMN1; SMN2MEN1KMT2AMAPK1TP53
Fluoride Ion SCHEMBL27700191 0.95 DNM1 (0.42) SMN1; SMN2MEN1KMT2AMAPK1TP53
Water SCHEMBL187704 0.95 DNM1 (0.42) SMN1; SMN2MEN1KMT2AMAPK1TP53
SCHEMBL14560951 0.93 DNM1 (0.50) SMN1; SMN2MEN1KMT2AMAPK1TP53
Hydrochloric Acid SCHEMBL5091294 0.93 SMN1; SMN2 (0.53) SMN1; SMN2MEN1KMT2AMAPK1TP53
Hydrochloric Acid SCHEMBL5086812 0.91 SMN1; SMN2 (0.56) SMN1; SMN2MEN1KMT2AMAPK1TP53
Hydrochloric Acid SCHEMBL11660331 0.91 SMN1; SMN2 (0.56) SMN1; SMN2MEN1KMT2AMAPK1TP53
Hydrochloric Acid SCHEMBL11889564 0.91 SMN1; SMN2 (0.43) SMN1; SMN2MEN1KMT2AMAPK1TP53

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 352 patents — showing the first 20. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
CN-114685274-A Esterification method for preparing 4-methyl chloroacetoacetate 江西迪赛诺制药有限公司 2022-07-01 CN claimed
CN-104447857-A Method for catalytic aqueous-phase synthesis of light blue fenitrothion TIANJIN SHINE SCIENCE & TECHNOLOGY CO LTD 2015-03-25 CN claimed
CN-101328153-B Preparation of tris(tri-bromophenoxy) triazine by nonsolvent method HANGZHOU JLS FLAME RETARDANTS CHEMICAL CO LTD 2010-07-28 CN claimed
CN-100532367-C High stack-density sheet structural melamine cyanurate and production method and application for flame-resistant material HANGZHOU JLS FLAME RETARDANTS (CN) 2009-08-26 CN claimed
CN-101328153-A Preparation of tris(tri-bromophenoxy) triazine by nonsolvent method HANGZHOU JLS FLAME RETARDANTS (CN) 2008-12-24 CN claimed
CN-101037417-A High stack-density sheet structural melamine cyanurate and production method and application for flame-resistant material HANGZHOU JLS FLAME RETARDANTS (CN) 2007-09-19 CN claimed
EP-0719572-B1 A process to remove polychloro-bi-phenyls from mineral oils ENEL SPA (IT) 1999-07-28 EP claimed
EP-0719572-A1 A process to remove polychloro-bi-phenyls from mineral oils ENEL S.p.A. (IT) 1996-07-03 EP claimed
US-12606662-B2 Photosensitive resin composition, photosensitive resin film, multilayered printed wiring board, semiconductor package, and method for producing multilayered printed wiring board RESONAC CORPORATION (JP) 2026-04-21 US disclosed
EP-3419051-B1 CURABLE RESIN COMPOSITION AND FAN OUT TYPE WAFER LEVEL PACKAGE TAIYO HOLDINGS CO LTD (JP) 2026-04-08 EP disclosed
EP-4692934-A1 PHOTOSENSITIVE RESIN COMPOSITION, PHOTOSENSITIVE RESIN FILM, PRINTED WIRING BOARD, AND SEMICONDUCTOR PACKAGE Resonac Corporation (JP) 2026-02-11 EP disclosed
EP-4694576-A1 LAYERED BODY LINTEC CORPORATION (JP) 2026-02-11 EP disclosed
US-12498636-B2 Photosensitive resin composition, photosensitive resin film, multilayered printed wiring board, semiconductor package, and method for producing multilayered printed wiring board RESONAC CORPORATION (JP) 2025-12-16 US disclosed
US-20250306465-A1 PHOTOSENSITIVE MULTILAYER RESIN FILM, PRINTED WIRING BOARD, SEMICONDUCTOR PACKAGE, AND METHOD FOR PRODUCING PRINTED WIRING BOARD RESONAC CORP (JP) 2025-10-02 US disclosed
EP-0014745-B1 CURING AGENT FOR POLYEPOXIDES, CURABLE EPOXY RESIN COMPOSITIONS, HARDENED PRODUCTS THEREFROM AND PROCESS FOR CURING A POLYEPOXIDE DIAMOND SHAMROCK CORPORATION (US) 1983-05-25 EP disclosed
US-4299989-A Preparation of ketones UOP INC. (US) 1981-11-10 US disclosed
EP-0014745-A1 Curing agent for polyepoxides, curable epoxy resin compositions, hardened products therefrom and process for curing a polyepoxide DIAMOND SHAMROCK CORPORATION (US) 1980-09-03 EP disclosed
US-4191714-A CONTAINING SILYL GROUP ON SIDE CHAIN OR POLYMER END KANEGAFUCHI KAGAKU KOGYO KABUSHIKI KAISHA (JP) 1980-03-04 US disclosed
US-4177173-A INFUSIBLE FILMS, CASTINGS OR ADHESIVES DIAMOND SHAMROCK CORPORATION (US) 1979-12-04 US disclosed
US-3953479-A Diglycidyl esters of C21 -cycloaliphatic dicarboxylic acid WESTVACO CORPORATION (US) 1976-04-27 US disclosed

Patent text — is the patent's own abstract consistent with the prediction?

For each of this compound's patents that has machine-readable text (1 of them — usually the abstract, not the full specification), we ask MedCPT which protein the text reads most about, and where the chemistry-predicted target lands among 4885 human targets. A high rank means the patent's own wording is consistent with the prediction — a weak, independent signal, not proof of activity.

PatentTitleText reads most aboutPredicted target · text-rank
US-12606662-B2 Photosensitive resin composition, photosensitive resin film, multilayered printed wiring board, semiconductor package, and method for producing multilayered printed wiring board MMAB, ELOB, RARB CHRM2 3256/4885CHRM1 1915/4885CHRM3 3794/4885

“Text reads most about” is the patent abstract's nearest protein in MedCPT space (background-debiased). Only ~1.4% of patents have machine-readable text, so most compounds won't have this panel.