SCHEMBL12649366

SCHEMBL12649366

O=C(Oc1cc(OC(=O)c2ccccc2)cc(C(=O)Oc2ccc([N+](=O)[O-])cc2)c1)c1ccccc1

nearest known ligand 0.68

Predicted protein targets (top 20)

geneUniProtsupporting neighboursconfidence
ALOX5 P09917 2/20 0.68
KMT2A Q03164 3/20 0.62
PKM P14618 1/20 0.62
MAPT P10636 5/20 0.60
MEN1 O00255 1/20 0.56
KDM4E B2RXH2 2/20 0.56
HGFAC Q04756 1/20 0.56
GAA P10253 2/20 0.54
HPGD P15428 1/20 0.54
ALDH1A1 P00352 3/20 0.53
CES2 O00748 1/20 0.53
CES1 P23141 1/20 0.53
NR1H4 Q96RI1 1/20 0.52
SMN1; SMN2 Q16637 1/20 0.51
FFAR1 O14842 1/20 0.51
PDGFRB P09619 1/20 0.51
PDGFRA P16234 1/20 0.51
HTT P42858 1/20 0.51
RAB9A P51151 1/20 0.51
NPSR1 Q6W5P4 1/20 0.51

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL527544 0.92 KMT2A (0.71) ALOX5KMT2APKMMAPTKDM4E
SCHEMBL9333093 0.88 KMT2A (0.66) ALOX5KMT2APKMMAPTKDM4E
P-Nitrophenol SCHEMBL7158777 0.87 KMT2A (0.64) ALOX5KMT2APKMMAPTKDM4E
SCHEMBL5973956 0.86 ALOX5 (0.73) ALOX5KMT2APKMMAPTMEN1
Guanidine SCHEMBL3748808 0.85 KMT2A (0.67) ALOX5KMT2APKMMAPTKDM4E
SCHEMBL13292702 0.84 MAPT (0.67) ALOX5KMT2APKMMAPTKDM4E
SCHEMBL27971368 0.84 ALOX5 (0.77) ALOX5KMT2APKMMAPTMEN1
SCHEMBL18434657 0.84 KMT2A (0.84) ALOX5KMT2APKMMAPTHGFAC
SCHEMBL542043 0.84 KMT2A (0.84) ALOX5KMT2APKMMAPTHGFAC
SCHEMBL4951809 0.84 KMT2A (0.84) ALOX5KMT2APKMMAPTHGFAC

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 2 patents. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
US-8420287-B2 Positive photosensitive resin composition CHEIL INDUSTRIES INC. (KR) 2013-04-16 US disclosed
US-20110111346-A1 Positive Photosensitive Resin Composition CHEIL INDUSTRIES INC. (KR) 2011-05-12 US disclosed