SCHEMBL1271103

SCHEMBL1271103

C=C[Si](CCl)(c1ccccc1)c1ccccc1

nearest known ligand 0.33

Predicted protein targets (top 2)

geneUniProtsupporting neighboursconfidence
ALDH1A1 P00352 1/20 0.33
TSHR P16473 1/20 0.33

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL1271193 0.81 ALDH1A1 (0.36) ALDH1A1TSHR
SCHEMBL9513099 0.79
SCHEMBL10604103 0.78 BCL2A1 (0.31)
SCHEMBL1271104 0.77 ALDH1A1 (0.33) ALDH1A1TSHR
SCHEMBL14955207 0.77 ALDH1A1 (0.33) ALDH1A1TSHR
SCHEMBL1493187 0.77 ALDH1A1 (0.33) ALDH1A1TSHR
SCHEMBL1271110 0.76 ALDH1A1 (0.32) ALDH1A1TSHR
SCHEMBL11316901 0.74 MAPT (0.38) ALDH1A1TSHR
SCHEMBL24278424 0.72 MAPT (0.41) ALDH1A1TSHR
SCHEMBL11320711 0.70 ALDH1A1 (0.31) ALDH1A1TSHR

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 7 patents. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
US-20110042789-A1 MATERIAL FOR CHEMICAL VAPOR DEPOSITION, SILICON-CONTAINING INSULATING FILM AND METHOD FOR PRODUCTION OF THE SILICON-CONTAINING INSULATING FILM JSR CORPORATION (JP) 2011-02-24 US disclosed
CN-101939465-A Material for chemical vapor deposition, silicon-containing insulating film and process for production thereof JSR CORP 2011-01-05 CN disclosed
EP-2264219-A1 MATERIAL FOR CHEMICAL VAPOR DEPOSITION, SILICON-CONTAINING INSULATING FILM AND PROCESS FOR PRODUCTION THEREOF JSR Corporation (JP) 2010-12-22 EP disclosed
US-4275184-A HYDROSILATION OF POLYDIMETHYL SILOXANE RHONE-POULENC INDUSTRIES (FR) 1981-06-23 US disclosed
US-4213914-A ADDITION-CONDENSATION COPOLYMERS RHONE-POULENC INDUSTRIES (FR) 1980-07-22 US disclosed
US-4147711-A Ethylenic silicon compounds and thermoplastic elastomers obtained therefrom RHONE-POULENC INDUSTRIES (FR) 1979-04-03 US disclosed
US-4088670-A P-(DIMETHYLVINYLSILYL-METHOXY)-BENZOYL CHLORIDE FROM DIMETHYLVINYL-CHLOROMETHYLSILANE AND A P-HYDROXYBENZOIC ACID RHONE-POULENC INDUSTRIES (FR) 1978-05-09 US disclosed

Patent text — is the patent's own abstract consistent with the prediction?

For each of this compound's patents that has machine-readable text (1 of them — usually the abstract, not the full specification), we ask MedCPT which protein the text reads most about, and where the chemistry-predicted target lands among 4885 human targets. A high rank means the patent's own wording is consistent with the prediction — a weak, independent signal, not proof of activity.

PatentTitleText reads most aboutPredicted target · text-rank
US-20110042789-A1 MATERIAL FOR CHEMICAL VAPOR DEPOSITION, SILICON-CONTAINING INSULATING FILM AND METHOD FOR PRODUCTION OF THE SILICON-CONTAINING INSULATING FILM SAT1, SUV39H2, SUV39H1 ALDH1A1 600/4885TSHR 4123/4885

“Text reads most about” is the patent abstract's nearest protein in MedCPT space (background-debiased). Only ~1.4% of patents have machine-readable text, so most compounds won't have this panel.