Predicted protein targets (top 11)
| gene | UniProt | supporting neighbours | confidence | |
|---|---|---|---|---|
| ▸ | RAB9A | P51151 | 2/20 | 0.48 |
| ▸ | NPC1 | O15118 | 1/20 | 0.48 |
| ▸ | NAAA | Q02083 | 6/20 | 0.47 |
| ▸ | MAPT | P10636 | 2/20 | 0.47 |
| ▸ | ALDH1A1 | P00352 | 1/20 | 0.46 |
| ▸ | MEN1 | O00255 | 2/20 | 0.45 |
| ▸ | KMT2A | Q03164 | 2/20 | 0.45 |
| ▸ | TP53 | P04637 | 1/20 | 0.45 |
| ▸ | HPGD | P15428 | 1/20 | 0.45 |
| ▸ | SMN1; SMN2 | Q16637 | 1/20 | 0.45 |
| ▸ | EPHX1 | P07099 | 1/20 | 0.45 |
Click a target to see other patent compounds predicted against it — the reverse direction, in place.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| SCHEMBL116845 | 0.90 | ALDH1A1 (0.56) | RAB9ANPC1MAPTALDH1A1MEN1 | |
| SCHEMBL12445029 | 0.90 | ALDH1A1 (0.42) | RAB9ANPC1NAAAMAPTALDH1A1 | |
| SCHEMBL12733146 | 0.83 | ALDH1A1 (0.44) | RAB9ANPC1NAAAMAPTALDH1A1 | |
| SCHEMBL2742136 | 0.83 | MEN1 (0.50) | ALDH1A1MEN1KMT2A | |
| SCHEMBL10159813 | 0.82 | PPARG (0.44) | RAB9ANPC1ALDH1A1MEN1KMT2A | |
| SCHEMBL12116550 | 0.82 | HPGD (0.46) | RAB9ANPC1NAAAMAPTALDH1A1 | |
| SCHEMBL27652957 | 0.82 | ALDH1A1 (0.47) | ALDH1A1MEN1KMT2ASMN1; SMN2 | |
| SCHEMBL13926411 | 0.82 | ENPP2 (0.37) | RAB9ANPC1NAAAMAPTALDH1A1 | |
| SCHEMBL14178034 | 0.81 | PTPRC (0.53) | RAB9AMAPTALDH1A1MEN1KMT2A | |
| SCHEMBL19420321 | 0.81 | ALDH1A1 (0.37) | RAB9ANPC1ALDH1A1MEN1KMT2A |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 6 patents. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| US-9417528-B2 | Pattern forming method, multi-layered resist pattern, multi-layered film for organic solvent development, resist composition, method for manufacturing electronic device, and electronic device | FUJIFILM CORPORATION (JP) | 2016-08-16 | — | — | US | disclosed |
| US-20150248056-A1 | PATTERN FORMING METHOD, MULTI-LAYERED RESIST PATTERN, MULTI-LAYERED FILM FOR ORGANIC SOLVENT DEVELOPMENT, RESIST COMPOSITION, METHOD FOR MANUFACTURING ELECTRONIC DEVICE, AND ELECTRONIC DEVICE | FUJIFILM CORPORATION (JP) | 2015-09-03 | — | — | US | disclosed |
| US-9075310-B2 | Pattern forming method, multi-layered resist pattern, multi-layered film for organic solvent development, resist composition, method for manufacturing electronic device, and electronic device | FUJIFILM CORPORATION (JP) | 2015-07-07 | — | — | US | disclosed |
| US-20140234761-A1 | PATTERN FORMING METHOD, MULTI-LAYERED RESIST PATTERN, MULTI-LAYERED FILM FOR ORGANIC SOLVENT DEVELOPMENT, RESIST COMPOSITION, METHOD FOR MANUFACTURING ELECTRONIC DEVICE, AND ELECTRONIC DEVICE | FUJIFILM CORPORATION (JP) | 2014-08-21 | — | — | US | disclosed |
| US-8349535-B2 | Actinic ray-sensitive or radiation-sensitive resin composition and method of forming pattern therewith | FUJIFILM CORPORATION (JP) | 2013-01-08 | — | — | US | disclosed |
| US-20110081612-A1 | ACTINIC RAY-SENSITIVE OR RADIATION-SENSITIVE RESIN COMPOSITION AND METHOD OF FORMING PATTERN THEREWITH | FUJIFILM CORPORATION (JP) | 2011-04-07 | — | — | US | disclosed |