Predicted protein targets (top 18)
| gene | UniProt | supporting neighbours | confidence | |
|---|---|---|---|---|
| ▸ | DGKA | P23743 | 1/20 | 0.53 |
| ▸ | NAAA | Q02083 | 1/20 | 0.48 |
| ▸ | ALDH1A1 | P00352 | 2/20 | 0.48 |
| ▸ | HTR2C | P28335 | 1/20 | 0.47 |
| ▸ | MAPT | P10636 | 1/20 | 0.46 |
| ▸ | ATM | Q13315 | 2/20 | 0.45 |
| ▸ | TSHR | P16473 | 2/20 | 0.44 |
| ▸ | DNM1 | Q05193 | 1/20 | 0.44 |
| ▸ | CYP3A4 | P08684 | 1/20 | 0.44 |
| ▸ | TDP1 | Q9NUW8 | 1/20 | 0.44 |
| ▸ | PRSS1 | P07477 | 1/20 | 0.42 |
| ▸ | PRSS2 | P07478 | 1/20 | 0.42 |
| ▸ | PRSS3 | P35030 | 1/20 | 0.42 |
| ▸ | HPGD | P15428 | 1/20 | 0.42 |
| ▸ | RAD52 | P43351 | 1/20 | 0.42 |
| ▸ | NPSR1 | Q6W5P4 | 1/20 | 0.42 |
| ▸ | LMNA | P02545 | 2/20 | 0.41 |
| ▸ | MAPK1 | P28482 | 1/20 | 0.41 |
Click a target to see other patent compounds predicted against it — the reverse direction, in place.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| SCHEMBL14944485 | 0.94 | NAAA (0.57) | DGKANAAAALDH1A1HTR2CMAPT | |
| SCHEMBL889152 | 0.92 | NAAA (0.60) | DGKANAAAALDH1A1HTR2CMAPT | |
| SCHEMBL889284 | 0.92 | NAAA (0.60) | DGKANAAAALDH1A1HTR2CMAPT | |
| SCHEMBL889159 | 0.92 | NAAA (0.60) | DGKANAAAALDH1A1HTR2CMAPT | |
| SCHEMBL889166 | 0.92 | NAAA (0.60) | DGKANAAAALDH1A1HTR2CMAPT | |
| SCHEMBL889149 | 0.92 | NAAA (0.60) | DGKANAAAALDH1A1HTR2CMAPT | |
| SCHEMBL9151467 | 0.92 | NAAA (0.60) | DGKANAAAALDH1A1HTR2CMAPT | |
| SCHEMBL889196 | 0.92 | NAAA (0.60) | DGKANAAAALDH1A1HTR2CMAPT | |
| SCHEMBL889135 | 0.92 | NAAA (0.60) | DGKANAAAALDH1A1HTR2CMAPT | |
| SCHEMBL6439025 | 0.92 | NAAA (0.60) | DGKANAAAALDH1A1HTR2CMAPT |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 49 patents — showing the first 20. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| CN-110981873-B | Preparation method for synthesizing pyrroloquinoline quinone by five-step method | 江西农业大学 | 2025-01-24 | — | — | CN | claimed |
| US-4657883-A | UNSUPPORTED TITANIUM HALIDE COORDINATION CATALYST; POLYMER PRETREATMENT | AMOCO CORPORATION (US) | 1987-04-14 | — | — | US | claimed |
| EP-4583177-A1 | METHOD OF MANUFACTURING ELECTRODE, COMPOSITE ELECTRODE, ELECTROCHEMICAL ELEMENT, AND APPARATUS FOR MANUFACTURING ELECTRODE | Ricoh Company, Ltd. (JP) | 2025-07-09 | — | — | EP | disclosed |
| CN-110981873-B | Preparation method for synthesizing pyrroloquinoline quinone by five-step method | 江西农业大学 | 2025-01-24 | — | — | CN | disclosed |
| EP-4362128-A1 | LIQUID COMPOSITION, METHOD FOR PRODUCING LIQUID COMPOSITION, ELECTRODE, ELECTRODE PRODUCTION APPARATUS, AND METHOD FOR PRODUCING ELECTRODE | Ricoh Company, Ltd. (JP) | 2024-05-01 | — | — | EP | disclosed |
| US-11822244-B2 | Compound, resin, resist composition and method for producing resist pattern | SUMITOMO CHEMICAL COMPANY, LIMITED (JP) | 2023-11-21 | — | — | US | disclosed |
| US-11822243-B2 | Negative-type photosensitive resin composition, cured film, element and display device provided with cured film, and production method therefor | TORAY INDUSTRIES, INC. (JP) | 2023-11-21 | — | — | US | disclosed |
| US-20230314941-A1 | CARBOXYLATE, CARBOXYLIC ACID GENERATOR, RESIN, RESIST COMPOSITION AND METHOD FOR PRODUCING RESIST PATTERN | SUMITOMO CHEMICAL COMPANY, LIMITED (JP) | 2023-10-05 | — | — | US | disclosed |
| US-10983436-B2 | Negative-type photosensitive resin composition, cured film, display device provided with cured film, and production method therefor | TORAY INDUSTRIES, INC. (JP) | 2021-04-20 | — | — | US | disclosed |
| US-20190258164-A1 | NEGATIVE-TYPE PHOTOSENSITIVE RESIN COMPOSITION, CURED FILM, ELEMENT AND DISPLAY DEVICE PROVIDED WITH CURED FILM, AND PRODUCTION METHOD THEREFOR | TORAY INDUSTRIES, INC. (JP) | 2019-08-22 | — | — | US | disclosed |
| US-20190072851-A1 | NEGATIVE-TYPE PHOTOSENSITIVE RESIN COMPOSITION, CURED FILM, DISPLAY DEVICE PROVIDED WITH CURED FILM, AND PRODUCTION METHOD THEREFOR | TORAY INDUSTRIES, INC. (JP) | 2019-03-07 | — | — | US | disclosed |
| EP-0717053-B1 | Catalyst for olefin polymerization and process for producing polyolefin using the same | JAPAN POLYOLEFINS CO LTD (JP) | 2001-03-14 | — | — | EP | disclosed |
| US-6096844-A | COMPRISING A TITANIUM COMPOUND, A MAGNESIUM COMPOUND, AND A HALOGEN COMPOUND, AN ORGANOALUMINUM COMPOUND, AN ORGANOSILICON COMPOUND | JAPAN POLYOLEFINS CO., LTD. (JP) | 2000-08-01 | — | — | US | disclosed |
| US-5849654-A | Catalyst for olefin polymerization and process for producing polyolefin using the same | JAPAN POLYOLEFINS CO., LTD. (JP) | 1998-12-15 | — | — | US | disclosed |
| EP-0578473-B1 | Catalyst for polymerization of olefin and process for producing olefin polymer | SHOWA DENKO KK (JP) | 1997-11-19 | — | — | EP | disclosed |
| EP-0717053-A2 | Catalyst for olefin polymerization and process for producing polyolefin using the same | JAPAN POLYOLEFINS CO., LTD. (JP) | 1996-06-19 | — | — | EP | disclosed |
| US-5476825-A | Consists of magnesium, titanium and halogen compounds, an organoaluminum compound, a reaction product of organoaluminum or organoboron compound with organosilicon compound | SHOWA DENKO K.K. (JP) | 1995-12-19 | — | — | US | disclosed |
| EP-0578473-A1 | Catalyst for polymerization of olefin and process for producing olefin polymer | SHOWA DENKO KABUSHIKI KAISHA (JP) | 1994-01-12 | — | — | EP | disclosed |
| EP-0252736-A2 | Process for preparing fluorine-containing carboxylic acid ester | SAGAMI CHEMICAL RESEARCH CENTER (JP) | 1988-01-13 | — | — | EP | disclosed |
| US-4657883-A | UNSUPPORTED TITANIUM HALIDE COORDINATION CATALYST; POLYMER PRETREATMENT | AMOCO CORPORATION (US) | 1987-04-14 | — | — | US | disclosed |
Patent text — is the patent's own abstract consistent with the prediction?
For each of this compound's patents that has machine-readable text (1 of them — usually the abstract, not the full specification), we ask MedCPT which protein the text reads most about, and where the chemistry-predicted target lands among 4885 human targets. A high rank means the patent's own wording is consistent with the prediction — a weak, independent signal, not proof of activity.
| Patent | Title | Text reads most about | Predicted target · text-rank |
|---|---|---|---|
| US-11822244-B2 | Compound, resin, resist composition and method for producing resist pattern | RER1, AFF1, AFF4 | DGKA 3584/4885NAAA 2282/4885ALDH1A1 2890/4885 |
“Text reads most about” is the patent abstract's nearest protein in MedCPT space (background-debiased). Only ~1.4% of patents have machine-readable text, so most compounds won't have this panel.