Predicted protein targets (top 19)
| gene | UniProt | supporting neighbours | confidence | |
|---|---|---|---|---|
| ▸ | NAAA | Q02083 | 1/20 | 0.57 |
| ▸ | DGKA | P23743 | 1/20 | 0.57 |
| ▸ | HTR2C | P28335 | 1/20 | 0.54 |
| ▸ | PRSS1 | P07477 | 1/20 | 0.49 |
| ▸ | PRSS2 | P07478 | 1/20 | 0.49 |
| ▸ | PRSS3 | P35030 | 1/20 | 0.49 |
| ▸ | MAPT | P10636 | 1/20 | 0.49 |
| ▸ | RAD52 | P43351 | 1/20 | 0.49 |
| ▸ | NPSR1 | Q6W5P4 | 1/20 | 0.49 |
| ▸ | FAAH | O00519 | 1/20 | 0.47 |
| ▸ | DNM1 | Q05193 | 1/20 | 0.47 |
| ▸ | LMNA | P02545 | 3/20 | 0.44 |
| ▸ | EPHX1 | P07099 | 1/20 | 0.44 |
| ▸ | NOD1 | Q9Y239 | 1/20 | 0.44 |
| ▸ | ALDH1A1 | P00352 | 1/20 | 0.43 |
| ▸ | CYP3A4 | P08684 | 1/20 | 0.43 |
| ▸ | TSHR | P16473 | 1/20 | 0.43 |
| ▸ | ATM | Q13315 | 1/20 | 0.43 |
| ▸ | TDP1 | Q9NUW8 | 1/20 | 0.43 |
Click a target to see other patent compounds predicted against it — the reverse direction, in place.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| SCHEMBL6439025 | 0.98 | NAAA (0.60) | NAAADGKAHTR2CPRSS1PRSS2 | |
| SCHEMBL889152 | 0.98 | NAAA (0.60) | NAAADGKAHTR2CPRSS1PRSS2 | |
| SCHEMBL889284 | 0.98 | NAAA (0.60) | NAAADGKAHTR2CPRSS1PRSS2 | |
| SCHEMBL889159 | 0.98 | NAAA (0.60) | NAAADGKAHTR2CPRSS1PRSS2 | |
| SCHEMBL889166 | 0.98 | NAAA (0.60) | NAAADGKAHTR2CPRSS1PRSS2 | |
| SCHEMBL889149 | 0.98 | NAAA (0.60) | NAAADGKAHTR2CPRSS1PRSS2 | |
| SCHEMBL9151467 | 0.98 | NAAA (0.60) | NAAADGKAHTR2CPRSS1PRSS2 | |
| SCHEMBL889196 | 0.98 | NAAA (0.60) | NAAADGKAHTR2CPRSS1PRSS2 | |
| SCHEMBL889135 | 0.98 | NAAA (0.60) | NAAADGKAHTR2CPRSS1PRSS2 | |
| SCHEMBL889203 | 0.98 | NAAA (0.60) | NAAADGKAHTR2CPRSS1PRSS2 |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 23 patents — showing the first 20. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| CN-110981873-B | Preparation method for synthesizing pyrroloquinoline quinone by five-step method | 江西农业大学 | 2025-01-24 | — | — | CN | claimed |
| EP-4583177-A1 | METHOD OF MANUFACTURING ELECTRODE, COMPOSITE ELECTRODE, ELECTROCHEMICAL ELEMENT, AND APPARATUS FOR MANUFACTURING ELECTRODE | Ricoh Company, Ltd. (JP) | 2025-07-09 | — | — | EP | disclosed |
| CN-110981873-B | Preparation method for synthesizing pyrroloquinoline quinone by five-step method | 江西农业大学 | 2025-01-24 | — | — | CN | disclosed |
| EP-4362128-A1 | LIQUID COMPOSITION, METHOD FOR PRODUCING LIQUID COMPOSITION, ELECTRODE, ELECTRODE PRODUCTION APPARATUS, AND METHOD FOR PRODUCING ELECTRODE | Ricoh Company, Ltd. (JP) | 2024-05-01 | — | — | EP | disclosed |
| US-11822244-B2 | Compound, resin, resist composition and method for producing resist pattern | SUMITOMO CHEMICAL COMPANY, LIMITED (JP) | 2023-11-21 | — | — | US | disclosed |
| US-20230314941-A1 | CARBOXYLATE, CARBOXYLIC ACID GENERATOR, RESIN, RESIST COMPOSITION AND METHOD FOR PRODUCING RESIST PATTERN | SUMITOMO CHEMICAL COMPANY, LIMITED (JP) | 2023-10-05 | — | — | US | disclosed |
| US-9971241-B2 | Compound, resin, resist composition and method for producing resist pattern | SUMITOMO CHEMICAL COMPANY, LIMITED (JP) | 2018-05-15 | — | — | US | disclosed |
| US-20170247323-A1 | SALT AND PHOTORESIST COMPOSITION CONTAINING THE SAME | SUMITOMO CHEMICAL COMPANY, LIMITED (JP) | 2017-08-31 | — | — | US | disclosed |
| US-9644056-B2 | Compound, resin and photoresist composition | SUMITOMO CHEMICAL COMPANY, LIMITED (JP) | 2017-05-09 | — | — | US | disclosed |
| US-9638996-B2 | Resist composition and method for producing resist pattern | SUMITOMO CHEMICAL COMPANY, LIMITED (JP) | 2017-05-02 | — | — | US | disclosed |
| US-20160237190-A1 | COMPOUND, RESIN AND PHOTORESIST COMPOSITION | SUMITOMO CHEMICAL COMPANY, LIMITED (JP) | 2016-08-18 | — | — | US | disclosed |
| US-9405191-B2 | Resin, resist composition and method for producing resist pattern | SUMITOMO CHEMICAL COMPANY, LIMITED (JP) | 2016-08-02 | — | — | US | disclosed |
| US-20160139508-A1 | COMPOUND, RESIN, RESIST COMPOSITION AND METHOD FOR PRODUCING RESIST PATTERN | SUMITOMO CHEMICAL COMPANY, LIMITED (JP) | 2016-05-19 | — | — | US | disclosed |
| US-20160077433-A1 | RESIN, RESIST COMPOSITION AND METHOD FOR PRODUCING RESIST PATTERN | SUMITOMO CHEMICAL COMPANY, LIMITED (JP) | 2016-03-17 | — | — | US | disclosed |
| US-20160062234-A1 | RESIST COMPOSITION AND METHOD FOR PRODUCING RESIST PATTERN | SUMITOMO CHEMICAL COMPANY, LIMITED (JP) | 2016-03-03 | — | — | US | disclosed |
| US-9134607-B2 | Photoresist composition and method for producing photoresist pattern | SUMITOMO CHEMICAL COMPANY, LIMITED (JP) | 2015-09-15 | — | — | US | disclosed |
| US-20150241769-A1 | PHOTORESIST COMPOSITION, COMPOUND AND PROCESS OF PRODUCING PHOTORESIST PATTERN | SUMITOMO CHEMICAL COMPANY, LIMITED (JP) | 2015-08-27 | — | — | US | disclosed |
| US-20150212408-A1 | SALT AND PHOTORESIST COMPOSITION COMPRISING THE SAME | SUMITOMO CHEMICAL COMPANY, LIMITED (JP) | 2015-07-30 | — | — | US | disclosed |
| US-20140023971-A1 | PHOTORESIST COMPOSITION AND METHOD FOR PRODUCING PHOTORESIST PATTERN | SUMITOMO CHEMICAL COMPANY, LIMITED (JP) | 2014-01-23 | — | — | US | disclosed |
| US-20130122424-A1 | PHOTORESIST COMPOSITION | SUMITOMO CHEMICAL COMPANY, LIMITED (JP) | 2013-05-16 | — | — | US | disclosed |
Patent text — is the patent's own abstract consistent with the prediction?
For each of this compound's patents that has machine-readable text (5 of them — usually the abstract, not the full specification), we ask MedCPT which protein the text reads most about, and where the chemistry-predicted target lands among 4885 human targets. A high rank means the patent's own wording is consistent with the prediction — a weak, independent signal, not proof of activity.
| Patent | Title | Text reads most about | Predicted target · text-rank |
|---|---|---|---|
| US-20160237190-A1 | COMPOUND, RESIN AND PHOTORESIST COMPOSITION | HAX1, F11, RXRA | NAAA 3481/4885DGKA 4021/4885HTR2C 1165/4885 |
| US-20150241769-A1 | PHOTORESIST COMPOSITION, COMPOUND AND PROCESS OF PRODUCING PHOTORESIST PATTERN | PSMB10, PUF60, RARA | NAAA 942/4885DGKA 1535/4885HTR2C 4232/4885 |
| US-11822244-B2 | Compound, resin, resist composition and method for producing resist pattern | RER1, AFF1, AFF4 | NAAA 2282/4885DGKA 3584/4885HTR2C 2945/4885 |
| US-20170247323-A1 | SALT AND PHOTORESIST COMPOSITION CONTAINING THE SAME | CRY1, ACOX3, ACOX1 | NAAA 2758/4885DGKA 2853/4885HTR2C 2631/4885 |
| US-20160139508-A1 | COMPOUND, RESIN, RESIST COMPOSITION AND METHOD FOR PRODUCING RESIST PATTERN | AFF1, AFF2, AFF4 | NAAA 3161/4885DGKA 3214/4885HTR2C 1471/4885 |
“Text reads most about” is the patent abstract's nearest protein in MedCPT space (background-debiased). Only ~1.4% of patents have machine-readable text, so most compounds won't have this panel.