Predicted protein targets (top 20)
| gene | UniProt | supporting neighbours | confidence | |
|---|---|---|---|---|
| ▸ | NPC1 | O15118 | 4/20 | 0.60 |
| ▸ | RAB9A | P51151 | 3/20 | 0.60 |
| ▸ | TP53 | P04637 | 2/20 | 0.54 |
| ▸ | USP2 | O75604 | 1/20 | 0.54 |
| ▸ | HIF1A | Q16665 | 2/20 | 0.53 |
| ▸ | KDM4E | B2RXH2 | 2/20 | 0.53 |
| ▸ | KMT2A | Q03164 | 3/20 | 0.51 |
| ▸ | MEN1 | O00255 | 2/20 | 0.51 |
| ▸ | ALDH1A1 | P00352 | 2/20 | 0.51 |
| ▸ | HPGD | P15428 | 2/20 | 0.50 |
| ▸ | SLC6A12 | P48065 | 1/20 | 0.50 |
| ▸ | GLA | P06280 | 1/20 | 0.50 |
| ▸ | LMNA | P02545 | 2/20 | 0.49 |
| ▸ | PDE4D | Q08499 | 2/20 | 0.49 |
| ▸ | MAPK1 | P28482 | 1/20 | 0.49 |
| ▸ | SMN1; SMN2 | Q16637 | 1/20 | 0.49 |
| ▸ | GAA | P10253 | 1/20 | 0.48 |
| ▸ | ATM | Q13315 | 1/20 | 0.48 |
| ▸ | L3MBTL1 | Q9Y468 | 1/20 | 0.48 |
| ▸ | POLB | P06746 | 1/20 | 0.48 |
Click a target to see other patent compounds predicted against it — the reverse direction, in place.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| SCHEMBL3282912 | 0.87 | NPC1 (0.63) | NPC1RAB9ATP53USP2KMT2A | |
| SCHEMBL29861033 | 0.87 | NPC1 (0.63) | NPC1RAB9ATP53USP2KMT2A | |
| SCHEMBL17838555 | 0.85 | HIF1A (0.58) | NPC1RAB9ATP53USP2HIF1A | |
| SCHEMBL8800692 | 0.83 | USP2 (0.52) | NPC1RAB9ATP53USP2HIF1A | |
| SCHEMBL4684698 | 0.82 | MAPT (0.62) | NPC1RAB9ATP53USP2HIF1A | |
| SCHEMBL28924750 | 0.81 | NPC1 (0.56) | NPC1RAB9ATP53USP2KDM4E | |
| SCHEMBL5617204 | 0.80 | HPGD (0.54) | NPC1RAB9ATP53KDM4EKMT2A | |
| SCHEMBL27598682 | 0.80 | CA12 (0.58) | NPC1RAB9ATP53USP2KMT2A | |
| SCHEMBL3661643 | 0.80 | HPGD (0.54) | NPC1RAB9ATP53KDM4EKMT2A | |
| SCHEMBL8318992 | 0.80 | ALDH1A1 (0.49) | NPC1RAB9ATP53USP2HIF1A |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 134 patents — showing the first 20. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| WO-2017174545-A1 | PHOTOCURABLE POLYMERS, PHOTOCURABLE POLYMER COMPOSITIONS AND LITHOGRAPHIC PROCESSES INCLUDING THE SAME | SOLVAY SPECIALTY POLYMERS USA, LLC (US) | 2017-10-12 | — | — | WO | claimed |
| US-7354698-B2 | Imprint lithography | ASML NETHERLANDS B.V. (NL) | 2008-04-08 | — | — | US | claimed |
| US-20060154179-A1 | Imprint lithography | ASML NETHERLANDS B. V. (NL) | 2006-07-13 | — | — | US | claimed |
| WO-1997000736-A1 | METHOD OF REINFORCING FOOTWEAR UPPER MATERIALS | HENKEL CORPORATION (US) | 1997-01-09 | — | — | WO | claimed |
| EP-3847220-B1 | UV-CURABLE HOT MELT ADHESIVE COMPOSITIONS FOR FLOORING APPLICATIONS | BASF SE (DE) | 2025-03-05 | — | — | EP | disclosed |
| CN-118994491-A | Photocurable composition for stereolithography, stereolithography method using the same, polymer assembly formed by the stereolithography method, and device comprising the polymer assembly | 罗杰斯公司 | 2024-11-22 | — | — | CN | disclosed |
| CN-113906066-B | Photocurable composition for stereolithography, stereolithography method using the same, polymer assembly formed by the stereolithography method, and device comprising the polymer assembly | 罗杰斯公司 | 2024-10-01 | — | — | CN | disclosed |
| EP-4302170-A1 | SYSTEMS FOR THERMAL MANAGEMENT AND METHODS THEREOF | Holo, Inc. (US) | 2024-01-10 | — | — | EP | disclosed |
| WO-2023164445-A1 | CONDUCTIVE ARTICLES AND METHODS FOR ADDITIVE MANUFACTURING THEREOF | PPG INDUSTRIES OHIO, INC. (US) | 2023-08-31 | — | — | WO | disclosed |
| EP-4217435-A1 | CURABLE SILICONE-(METH)ACRYLATE COMPOSITION AND METHODS FOR ITS PREPARATION AND USE | Dow Silicones Corporation (US) | 2023-08-02 | — | — | EP | disclosed |
| CN-114667466-A | Optical laminate and flexible display device | 住友化学株式会社 | 2022-06-24 | — | — | CN | disclosed |
| EP-3924320-A1 | METHODS AND SYSTEMS FOR THREE-DIMENSIONAL PRINTING | Holo, Inc. (US) | 2021-12-22 | — | — | EP | disclosed |
| EP-0868223-A1 | RADIATION-CURED EDGE-MASKING PROCESS FOR HIGH SPEED ELECTROGALVANIZING | USX ENGINEERS AND CONSULTANTS, INC. (US) | 1998-10-07 | — | — | EP | disclosed |
| WO-1998001778-A1 | RADIATION CURABLE RESIN COMPOSITION | DSM N.V. (NL) | 1998-01-15 | — | — | WO | disclosed |
| WO-1997047671-A1 | RADIATION CURABLE RESIN COMPOSITION | DSM N.V. (NL) | 1997-12-18 | — | — | WO | disclosed |
| WO-1997022418-A1 | RADIATION-CURED EDGE-MASKING PROCESS FOR HIGH SPEED ELECTROGALVANIZING | USX ENGINEERS AND CONSULTANTS, INC. (US) | 1997-06-26 | — | — | WO | disclosed |
| EP-0418870-A2 | Radiation sensitive polymer composition | TORAY INDUSTRIES, INC. (JP) | 1991-03-27 | — | — | EP | disclosed |
| US-4954269-A | TREATING TEXTILES TO INCREASE THE WATER ABSORPTIVITY | DOW CORNING CORPORATION (US) | 1990-09-04 | — | — | US | disclosed |
| US-4518472-A | COMPOUND CONTAINING AT LEAST THREE (METH)ACRYLOYLOXY GROUPS, PHOTOSENSITIZER, EMULSION-TYPE CROSSLINKED POLYMER | MITSUBISHI RAYON COMPANY LTD. (JP) | 1985-05-21 | — | — | US | disclosed |
| US-4478876-A | BLEND OF ACRYLATE MONOMER, COLLOIDAL SILICA, ACRYLOXY FUNCTIONAL SILANE, AND PHOTOINITIATORS | GENERAL ELECTRIC COMPANY (US) | 1984-10-23 | — | — | US | disclosed |