Isopropyl Alcohol

Isopropyl Alcohol

SCHEMBL1279486

CC(C)O.CC(C)[O-].CC(C)[O-].CC(C)[O-].CC(C)[O-].[Hf+4]

nearest known ligand 0.60

Full drug profile on Sugi Atlas →

Predicted protein targets (top 5)

geneUniProtsupporting neighboursconfidence
ALDH1A1 P00352 2/20 0.60
LMNA P02545 1/20 0.60
TSHR P16473 2/20 0.33
TDP1 Q9NUW8 1/20 0.33
TP53 P04637 1/20 0.31

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
Isopropyl Alcohol SCHEMBL28376616 0.90 ALDH1A1 (0.60) ALDH1A1LMNATSHRTDP1TP53
Isopropyl Alcohol SCHEMBL358027 0.90 ALDH1A1 (0.60) ALDH1A1LMNATSHRTDP1TP53
Isopropyl Alcohol SCHEMBL28655743 0.90 ALDH1A1 (0.60) ALDH1A1LMNATSHRTDP1TP53
Isopropyl Alcohol SCHEMBL8814180 0.90 ALDH1A1 (0.60) ALDH1A1LMNATSHRTDP1TP53
Isopropyl Alcohol SCHEMBL1807773 0.90 ALDH1A1 (0.60) ALDH1A1LMNATSHRTDP1TP53
Isopropyl Alcohol SCHEMBL6839772 0.90 ALDH1A1 (0.60) ALDH1A1LMNATSHRTDP1TP53
Isopropyl Alcohol SCHEMBL4772850 0.90
Isopropyl Alcohol SCHEMBL6031064 0.90 ALDH1A1 (0.60) ALDH1A1LMNATSHRTDP1TP53
Isopropyl Alcohol SCHEMBL4237313 0.86 ALDH1A1 (0.55) ALDH1A1LMNATSHRTDP1
Isopropyl Alcohol SCHEMBL1677605 0.86 ALDH1A1 (0.55) ALDH1A1LMNATSHRTDP1

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 119 patents — showing the first 20. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
CN-112313775-A Tunability of dopant concentration in thin hafnium oxide films 应用材料公司 2021-02-02 CN claimed
US-20140221594-A1 Polyurethanes Made Using Mixtures of Tertiary Amine Compounds and Lewis Acids as Catalysts DOW GLOBAL TECHNOLOGIES LLC 2014-08-07 US claimed
EP-2758443-A1 POLYURETHANES MADE USING MIXTURES OF TERTIARY AMINE COMPOUNDS AND LEWIS ACIDS AS CATALYSTS Dow Global Technologies LLC (US) 2014-07-30 EP claimed
WO-2013043333-A1 POLYURETHANES MADE USING MIXTURES OF TERTIARY AMINE COMPOUNDS AND LEWIS ACIDS AS CATALYSTS DOW GLOBAL TECHNOLOGIES LLC (US) 2013-03-28 WO claimed
US-20240218509-A1 MINIMIZING RADICAL RECOMBINATION USING ALD SILICON OXIDE SURFACE COATING WITH INTERMITTENT RESTORATION PLASMA LAM RES CORP (US) 2024-07-04 US disclosed
US-20240194479-A1 METHODS AND APPLICATIONS OF NOVEL AMORPHOUS HIGH-K METAL-OXIDE DIELECTRICS BY SUPER-CYCLE ATOMIC LAYER DEPOSITION APPLIED MATERIALS, INC. (US) 2024-06-13 US disclosed
WO-2024059338-A2 SELECTIVE DIRECTED ASSEMBLY-BASED PRINTING OF METAL OXIDE DIELECTRIC THIN FILMS NORTHEASTERN UNIVERSITY (US) 2024-03-21 WO disclosed
US-11920239-B2 Minimizing radical recombination using ALD silicon oxide surface coating with intermittent restoration plasma LAM RESEARCH CORPORATION (US) 2024-03-05 US disclosed
CN-117321766-A Method and application of novel amorphous high-K metal oxide dielectrics by supercritical atomic layer deposition 应用材料公司 2023-12-29 CN disclosed
US-20230363173-A1 METHOD OF FORMING FERROELECTRIC MEMORY DEVICE TAIWAN SEMICONDUCTOR MANUFACTURING COMPANY, LTD. (TW) 2023-11-09 US disclosed
WO-2023205284-A1 LATERAL GAP FILL LAM RESEARCH CORPORATION (US) 2023-10-26 WO disclosed
WO-2023200072-A1 SELECTION DEVICE, MANUFACTURING METHOD THEREFOR, AND NON-VOLATILE MEMORY DEVICE COMPRISING SELECTION DEVICE 서울과학기술대학교 산학협력단 2023-10-19 WO disclosed
US-20130207053-A1 SYNTHESIS, CAPPING AND DISPERSION OF NANOCRYSTALS U.S. BANK TRUST COMPANY, NATIONAL ASSOCIATION, AS COLLATERAL AGENT 2013-08-15 US disclosed
WO-2013043333-A1 POLYURETHANES MADE USING MIXTURES OF TERTIARY AMINE COMPOUNDS AND LEWIS ACIDS AS CATALYSTS DOW GLOBAL TECHNOLOGIES LLC (US) 2013-03-28 WO disclosed
EP-2560916-A2 SYNTHESIS, CAPPING AND DISPERSION OF NANOCRYSTALS Pixelligent Technologies, LLC (US) 2013-02-27 EP disclosed
WO-2012058271-A2 SYNTHESIS, CAPPING AND DISPERSION OF NANOCRYSTALS PIXELLIGENT TECHNOLOGIES, LLC (US) 2012-05-03 WO disclosed
US-20120088845-A1 Synthesis, capping and dispersion of nanocrystals U.S. BANK TRUST COMPANY, NATIONAL ASSOCIATION, AS COLLATERAL AGENT 2012-04-12 US disclosed
WO-2011133228-A2 SYNTHESIS, CAPPING AND DISPERSION OF NANOCRYSTALS PIXELLIGENT TECHNOLOGIES, LLC (US) 2011-10-27 WO disclosed
EP-1420024-A1 Precursor for chemical vapor deposition and thin film formation process using the same Asahi Denka Co., Ltd. (JP) 2004-05-19 EP disclosed
US-20040086643-A1 Precursor for chemical vapor deposition and thin film formation process using the same ASAHI DENKA CO., LTD. (JP) 2004-05-06 US disclosed

Patent text — is the patent's own abstract consistent with the prediction?

For each of this compound's patents that has machine-readable text (1 of them — usually the abstract, not the full specification), we ask MedCPT which protein the text reads most about, and where the chemistry-predicted target lands among 4885 human targets. A high rank means the patent's own wording is consistent with the prediction — a weak, independent signal, not proof of activity.

PatentTitleText reads most aboutPredicted target · text-rank
US-20040086643-A1 Precursor for chemical vapor deposition and thin film formation process using the same RTF1, RAP1A, TIAM1 ALDH1A1 753/4885LMNA 4335/4885TSHR 1530/4885

“Text reads most about” is the patent abstract's nearest protein in MedCPT space (background-debiased). Only ~1.4% of patents have machine-readable text, so most compounds won't have this panel.