SCHEMBL12804318

SCHEMBL12804318

C=COCCOCCOCCOCCOCCOC(=O)C(=C)C

nearest known ligand 0.61

Predicted protein targets (top 12)

geneUniProtsupporting neighboursconfidence
THRB P10828 2/20 0.61
TSHR P16473 6/20 0.46
ALDH1A1 P00352 5/20 0.44
TP53 P04637 2/20 0.44
HIF1A Q16665 2/20 0.44
HSD17B10 Q99714 1/20 0.44
POLB P06746 1/20 0.36
APEX1 P27695 1/20 0.36
HTT P42858 1/20 0.36
TDP1 Q9NUW8 1/20 0.36
CA1 P00915 1/20 0.34
CA2 P00918 1/20 0.34

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL12805165 1.00 THRB (0.61) THRBTSHRALDH1A1TP53HIF1A
SCHEMBL36623 1.00 THRB (0.61) THRBTSHRALDH1A1TP53HIF1A
SCHEMBL2831369 1.00 THRB (0.61) THRBTSHRALDH1A1TP53HIF1A
Methacrylic Acid SCHEMBL30912178 0.95 THRB (0.56) THRBTSHRALDH1A1TP53HIF1A
Methacrylic Acid SCHEMBL29216884 0.95 THRB (0.56) THRBTSHRALDH1A1TP53HIF1A
SCHEMBL125047 0.94 THRB (0.57) THRBTSHRALDH1A1TP53HIF1A
SCHEMBL2880688 0.94 THRB (0.57) THRBTSHRALDH1A1TP53HIF1A
SCHEMBL23045278 0.93 THRB (0.54) THRBTSHRALDH1A1TP53HIF1A
Tetraethylene Glycol SCHEMBL11224926 0.93 THRB (0.54) THRBTSHRALDH1A1TP53HIF1A
SCHEMBL19479969 0.91 THRB (0.56) THRBTSHRALDH1A1TP53HIF1A

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 11 patents. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
US-11987715-B2 Radiation curable ink jet composition and ink jet method SEIKO EPSON CORPORATION (JP) 2024-05-21 US disclosed
US-20240052185-A1 Radiation Curable Ink Jet Composition And Ink Jet Method SEIKO EPSON CORP (JP) 2024-02-15 US disclosed
US-11884828-B2 Radiation curable ink jet composition and ink jet method SEIKO EPSON CORPORATION 2024-01-30 US disclosed
EP-3885413-B1 RADIATION CURABLE INK JET COMPOSITION AND INK JET METHOD SEIKO EPSON CORP (JP) 2023-09-27 EP disclosed
US-20210301158-A1 Radiation Curable Ink Jet Composition And Ink Jet Method SEIKO EPSON CORPORATION (JP) 2021-09-30 US disclosed
US-20210301162-A1 Radiation Curable Ink Jet Composition And Ink Jet Method SEIKO EPSON CORPORATION (JP) 2021-09-30 US disclosed
EP-3885413-A1 RADIATION CURABLE INK JET COMPOSITION AND INK JET METHOD Seiko Epson Corporation (JP) 2021-09-29 EP disclosed
US-20200262205-A1 RECORDING DEVICE AND MAINTENANCE METHOD FOR RECORDING DEVICE SEIKO EPSON CORPORATION (JP) 2020-08-20 US disclosed
US-20150087741-A1 PHOTO-CURING AND STRIPPABLE ADHESIVE COMPOSITION AND USES THEREOF CHI MEI CORPORATION (TW) 2015-03-26 US disclosed
US-8876274-B2 Pattern forming method SEIKO EPSON CORPORATION (JP) 2014-11-04 US disclosed
US-20120249664-A1 PATTERN FORMING METHOD SEIKO EPSON CORPORATION (JP) 2012-10-04 US disclosed