SCHEMBL2831369

SCHEMBL2831369

C=COCCOCCOCCOC(=O)C(=C)C

nearest known ligand 0.61

Predicted protein targets (top 12)

geneUniProtsupporting neighboursconfidence
THRB P10828 2/20 0.61
TSHR P16473 6/20 0.46
ALDH1A1 P00352 5/20 0.44
TP53 P04637 2/20 0.44
HIF1A Q16665 2/20 0.44
HSD17B10 Q99714 1/20 0.44
POLB P06746 1/20 0.36
APEX1 P27695 1/20 0.36
HTT P42858 1/20 0.36
TDP1 Q9NUW8 1/20 0.36
CA1 P00915 1/20 0.34
CA2 P00918 1/20 0.34

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL12805165 1.00 THRB (0.61) THRBTSHRALDH1A1TP53HIF1A
SCHEMBL12804318 1.00 THRB (0.61) THRBTSHRALDH1A1TP53HIF1A
SCHEMBL36623 1.00 THRB (0.61) THRBTSHRALDH1A1TP53HIF1A
Methacrylic Acid SCHEMBL30912178 0.95 THRB (0.56) THRBTSHRALDH1A1TP53HIF1A
Methacrylic Acid SCHEMBL29216884 0.95 THRB (0.56) THRBTSHRALDH1A1TP53HIF1A
SCHEMBL125047 0.94 THRB (0.57) THRBTSHRALDH1A1TP53HIF1A
SCHEMBL2880688 0.94 THRB (0.57) THRBTSHRALDH1A1TP53HIF1A
SCHEMBL23045278 0.93 THRB (0.54) THRBTSHRALDH1A1TP53HIF1A
Tetraethylene Glycol SCHEMBL11224926 0.93 THRB (0.54) THRBTSHRALDH1A1TP53HIF1A
SCHEMBL19479969 0.91 THRB (0.56) THRBTSHRALDH1A1TP53HIF1A

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 35 patents — showing the first 20. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
US-11987715-B2 Radiation curable ink jet composition and ink jet method SEIKO EPSON CORPORATION (JP) 2024-05-21 US disclosed
US-20240052185-A1 Radiation Curable Ink Jet Composition And Ink Jet Method SEIKO EPSON CORP (JP) 2024-02-15 US disclosed
US-11884828-B2 Radiation curable ink jet composition and ink jet method SEIKO EPSON CORPORATION 2024-01-30 US disclosed
EP-3885413-B1 RADIATION CURABLE INK JET COMPOSITION AND INK JET METHOD SEIKO EPSON CORP (JP) 2023-09-27 EP disclosed
CN-109789078-B (meth) acrylate-based resin binder composition 赢创有限公司 2022-10-04 CN disclosed
CN-108697587-B Dental composition 登特斯普伊德特雷有限公司 2022-06-17 CN disclosed
CN-114075345-A Production of polyurethane foams 赢创运营有限公司 2022-02-22 CN disclosed
US-20210301162-A1 Radiation Curable Ink Jet Composition And Ink Jet Method SEIKO EPSON CORPORATION (JP) 2021-09-30 US disclosed
US-20210301158-A1 Radiation Curable Ink Jet Composition And Ink Jet Method SEIKO EPSON CORPORATION (JP) 2021-09-30 US disclosed
EP-3885413-A1 RADIATION CURABLE INK JET COMPOSITION AND INK JET METHOD Seiko Epson Corporation (JP) 2021-09-29 EP disclosed
US-20100113264-A1 CONDUCTIVE SUBSTANCE-ADSORBING RESIN FILM, METHOD FOR PRODUCING CONDUCTIVE SUBSTANCE-ADSORBING RESIN FILM, METAL LAYER-COATED RESIN FILM USING THE SAME, AND METHOD FOR PRODUCING METAL LAYER-COATED RESIN FILM FUJIFILM CORPORATION (JP) 2010-05-06 US disclosed
US-20100003533-A1 METAL-FILM-COATED MATERIAL AND PROCESS FOR PRODUCING THE SAME, METALLIC-PATTERN-BEARING MATERIAL AND PROCESS FOR PRODUCING THE SAME, COMPOSITION FOR POLYMER LAYER FORMATION, NITRILE GROUP-CONTAINING POLYMER AND METHOD OF SYNTHESIZING THE SAME, COMPOSITION CONTAINING NITRILE GROUP-CONTAINING POLYMER, AND LAMINATE FUJIFILM CORPORATION (JP) 2010-01-07 US disclosed
EP-2133200-A1 CONDUCTIVE-SUBSTANCE-ADSORBING RESIN FILM, PROCESS FOR PRODUCING CONDUCTIVE-SUBSTANCE-ADSORBING RESIN FILM, METAL-LAYER-COATED RESIN FILM MADE FROM THE SAME, AND PROCESS FOR PRODUCING METAL-LAYER-COATED RESIN FILM Fujifilm Corporation (JP) 2009-12-16 EP disclosed
US-20090269599-A1 MULTILAYER FILM FOR PLATING, METHOD OF MANUFACTURING METAL FILM-COATED MATERIAL AND METAL FILM-COATED MATERIAL FUJIFILM CORPORATION (JP) 2009-10-29 US disclosed
EP-2105451-A2 Nitrile group-containing polymer and method of synthesizing the same, composition containing nitrile group-containing polymer, and laminate Fujifilm Corporation (JP) 2009-09-30 EP disclosed
US-20090214876-A1 METAL-FILM-COATED MATERIAL AND PROCESS FOR PRODUCING THE SAME, METALLIC-PATTERN-BEARING MATERIAL AND PROCESS FOR PRODUCING THE SAME, COMPOSITION FOR POLYMER LAYER FORMATION, NITRILE GROUP-CONTAINING POLYMER AND METHOD OF SYNTHESIZING THE SAME, COMPOSITION CONTAINING NITRILE GROUP-CONTAINING POLYMER, AND LAMINATE FUJIFILM CORPORATION (JP) 2009-08-27 US disclosed
EP-2078607-A1 METAL-FILM-COATED MATERIAL AND PROCESS FOR PRODUCING THE SAME, METALLIC-PATTERN-BEARING MATERIAL AND PROCESS FOR PRODUCING THE SAME, COMPOSITION FOR POLYMER LAYER FORMATION, NITRILE POLYMER AND METHOD OF SYNTHESIZING THE SAME, COMPOSITION CONTAINING NITRILE POLYMER, AND LAYERED PRODUCT FUJIFILM Corporation (JP) 2009-07-15 EP disclosed
US-20090155553-A1 Method of manufacturing surface metal film material, surface metal film material, method of manufacturing patterned metal material, patterned metal material, and polymer layer-forming composition FUJIFILM CORPORATION (JP) 2009-06-18 US disclosed
US-7132462-B2 Two-component dental materials having a low setting temperature 3M ESPE AG (DE) 2006-11-07 US disclosed
US-20030158288-A1 Two-component dental materials having a low setting temperature 3M DEUTSCHLAND GMBH (DE) 2003-08-21 US disclosed