⚠ Novel chemotype — no close known analogue (best Tanimoto < 0.3). Unexplored chemical space relative to ChEMBL.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| SCHEMBL12829187 | 0.88 | PPARG (0.31) | — | |
| SCHEMBL12829189 | 0.87 | — | — | |
| SCHEMBL12753599 | 0.84 | HMGCR (0.33) | — | |
| SCHEMBL12829184 | 0.84 | — | — | |
| SCHEMBL12829191 | 0.80 | — | — | |
| SCHEMBL12832727 | 0.79 | — | — | |
| SCHEMBL12761138 | 0.78 | — | — | |
| SCHEMBL12761133 | 0.76 | — | — | |
| SCHEMBL12753783 | 0.76 | HMGCR (0.34) | — | |
| SCHEMBL17264806 | 0.73 | — | — |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 2 patents. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| US-20110076622-A1 | POSITIVE RESIST COMPOSITION FOR IMMERSION EXPOSURE AND PATTERN-FORMING METHOD USING THE SAME | FUJIFILM CORPORATION (JP) | 2011-03-31 | — | — | US | disclosed |
| US-7906268-B2 | Positive resist composition for immersion exposure and pattern-forming method using the same | FUJIFILM CORPORATION (JP) | 2011-03-15 | — | — | US | disclosed |