Predicted protein targets (top 2)
Click a target to see other patent compounds predicted against it — the reverse direction, in place.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| SCHEMBL13713663 | 0.87 | CTSS (0.35) | HTT | |
| SCHEMBL16449157 | 0.86 | SMN1; SMN2 (0.34) | — | |
| SCHEMBL13713620 | 0.84 | HTT (0.32) | EPHX2HTT | |
| SCHEMBL12832622 | 0.84 | — | — | |
| SCHEMBL14535331 | 0.74 | HTT (0.32) | HTT | |
| SCHEMBL12832743 | 0.73 | TP53 (0.32) | EPHX2 | |
| SCHEMBL9608636 | 0.73 | CA1 (0.39) | EPHX2 | |
| SCHEMBL12832561 | 0.73 | EPHX2 (0.34) | EPHX2 | |
| SCHEMBL13713604 | 0.72 | HTT (0.33) | HTT | |
| SCHEMBL13451031 | 0.72 | HTT (0.33) | HTT |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 2 patents. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| US-7906268-B2 | Positive resist composition for immersion exposure and pattern-forming method using the same | FUJIFILM CORPORATION (JP) | 2011-03-15 | — | — | US | disclosed |
| US-20070105045-A1 | Positive resist composition and pattern formation method using the positive resist composition | FUJIFILM CORPORATION | 2007-05-10 | — | — | US | disclosed |