Predicted protein targets (top 14)
| gene | UniProt | supporting neighbours | confidence | |
|---|---|---|---|---|
| ▸ | SMN1; SMN2 | Q16637 | 4/20 | 0.34 |
| ▸ | CA12 | O43570 | 1/20 | 0.33 |
| ▸ | CA7 | P43166 | 1/20 | 0.33 |
| ▸ | CA14 | Q9ULX7 | 1/20 | 0.33 |
| ▸ | ALDH1A1 | P00352 | 4/20 | 0.33 |
| ▸ | CNR2 | P34972 | 4/20 | 0.31 |
| ▸ | CNR1 | P21554 | 1/20 | 0.31 |
| ▸ | TSHR | P16473 | 2/20 | 0.30 |
| ▸ | ACHE | P22303 | 1/20 | 0.30 |
| ▸ | L3MBTL1 | Q9Y468 | 1/20 | 0.30 |
| ▸ | ABCC9 | O60706 | 1/20 | 0.30 |
| ▸ | ABCC8 | Q09428 | 1/20 | 0.30 |
| ▸ | KCNJ11 | Q14654 | 1/20 | 0.30 |
| ▸ | KCNJ8 | Q15842 | 1/20 | 0.30 |
Click a target to see other patent compounds predicted against it — the reverse direction, in place.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| SCHEMBL12833002 | 0.86 | EPHX2 (0.31) | — | |
| SCHEMBL13713663 | 0.79 | CTSS (0.35) | SMN1; SMN2ALDH1A1TSHR | |
| SCHEMBL17682403 | 0.73 | CA12 (0.34) | SMN1; SMN2CA12CA7CA14ALDH1A1 | |
| SCHEMBL14114285 | 0.73 | CA12 (0.34) | SMN1; SMN2CA12CA7CA14ALDH1A1 | |
| SCHEMBL14048328 | 0.73 | SMN1; SMN2 (0.33) | SMN1; SMN2CA12CA7CA14ALDH1A1 | |
| SCHEMBL13713668 | 0.72 | SMN1; SMN2 (0.40) | SMN1; SMN2CA12CA7CA14ALDH1A1 | |
| SCHEMBL18132896 | 0.72 | CA12 (0.38) | SMN1; SMN2CA12CA7CA14ALDH1A1 | |
| SCHEMBL12832622 | 0.70 | — | — | |
| SCHEMBL13713620 | 0.70 | HTT (0.32) | CNR2CNR1 | |
| SCHEMBL14241616 | 0.69 | CNR2 (0.33) | SMN1; SMN2CA12CA7CA14ALDH1A1 |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 1 patent. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| US-8951718-B2 | Pattern forming method, resist composition for multiple development used in the pattern forming method, developer for negative development used in the pattern forming method, and rinsing solution for negative development used in the pattern forming method | FUJIFILM CORPORATION (JP) | 2015-02-10 | — | — | US | disclosed |