SCHEMBL13713620

SCHEMBL13713620

CCC(C)(C(F)(F)C(C)S(=O)(=O)N1CCCCC1)S(=O)(=O)O

nearest known ligand 0.32

Predicted protein targets (top 4)

geneUniProtsupporting neighboursconfidence
HTT P42858 1/20 0.32
CNR1 P21554 4/20 0.30
CNR2 P34972 4/20 0.30
EPHX2 P34913 1/20 0.30

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL12833002 0.84 EPHX2 (0.31) HTTEPHX2
SCHEMBL13713640 0.81 HTT (0.35) HTTCNR1CNR2
SCHEMBL18594459 0.75 HTT (0.38) HTTCNR1CNR2
SCHEMBL12832743 0.72 TP53 (0.32) EPHX2
SCHEMBL9608636 0.72 CA1 (0.39) EPHX2
SCHEMBL12832561 0.72 EPHX2 (0.34) EPHX2
SCHEMBL13713663 0.72 CTSS (0.35) HTT
SCHEMBL13713644 0.71 HTT (0.32) HTTCNR1CNR2
SCHEMBL13451001 0.71 HTT (0.32) HTTCNR1CNR2
SCHEMBL13713608 0.71 HTT (0.32) HTTCNR1CNR2

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 1 patent. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
US-7592126-B2 Positive resist composition and pattern forming method using the resist composition FUJIFILM CORPORATION (JP) 2009-09-22 US disclosed