Predicted protein targets (top 12)
| gene | UniProt | supporting neighbours | confidence | |
|---|---|---|---|---|
| ▸ | KMT2A | Q03164 | 1/20 | 0.33 |
| ▸ | MAPT | P10636 | 2/20 | 0.32 |
| ▸ | TP53 | P04637 | 1/20 | 0.32 |
| ▸ | THRB | P10828 | 1/20 | 0.32 |
| ▸ | EPHX2 | P34913 | 1/20 | 0.31 |
| ▸ | HTT | P42858 | 2/20 | 0.30 |
| ▸ | NPSR1 | Q6W5P4 | 2/20 | 0.30 |
| ▸ | ALDH1A1 | P00352 | 1/20 | 0.30 |
| ▸ | LMNA | P02545 | 1/20 | 0.30 |
| ▸ | SMN1; SMN2 | Q16637 | 1/20 | 0.30 |
| ▸ | POLB | P06746 | 1/20 | 0.30 |
| ▸ | GAA | P10253 | 1/20 | 0.30 |
Click a target to see other patent compounds predicted against it — the reverse direction, in place.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| SCHEMBL12832743 | 0.88 | TP53 (0.32) | MAPTTP53THRBEPHX2 | |
| SCHEMBL13713602 | 0.88 | CA1 (0.31) | MAPTTP53THRBPOLB | |
| SCHEMBL13713665 | 0.88 | CA1 (0.31) | MAPTTP53THRBPOLB | |
| SCHEMBL13713638 | 0.88 | CA1 (0.31) | MAPTTP53THRBPOLB | |
| SCHEMBL13713614 | 0.86 | — | — | |
| SCHEMBL13713668 | 0.86 | SMN1; SMN2 (0.40) | KMT2AMAPTTP53EPHX2HTT | |
| SCHEMBL12832561 | 0.83 | EPHX2 (0.34) | KMT2AEPHX2ALDH1A1LMNAPOLB | |
| SCHEMBL13713666 | 0.76 | ACHE (0.37) | POLB | |
| SCHEMBL12832622 | 0.75 | — | — | |
| SCHEMBL13713603 | 0.73 | SMN1; SMN2 (0.36) | ALDH1A1LMNASMN1; SMN2POLB |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 2 patents. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| US-7906268-B2 | Positive resist composition for immersion exposure and pattern-forming method using the same | FUJIFILM CORPORATION (JP) | 2011-03-15 | — | — | US | disclosed |
| US-7592126-B2 | Positive resist composition and pattern forming method using the resist composition | FUJIFILM CORPORATION (JP) | 2009-09-22 | — | — | US | disclosed |