SCHEMBL13713638

SCHEMBL13713638

CCC(C(F)(F)C(CC)S(=O)(=O)N1CCCCCC1)S(=O)(=O)O

nearest known ligand 0.31

Predicted protein targets (top 6)

geneUniProtsupporting neighboursconfidence
CA1 P00915 2/20 0.31
CA2 P00918 2/20 0.31
POLB P06746 1/20 0.31
TP53 P04637 1/20 0.30
MAPT P10636 1/20 0.30
THRB P10828 1/20 0.30

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL13713602 1.00 CA1 (0.31) CA1CA2POLBTP53MAPT
SCHEMBL13713665 1.00 CA1 (0.31) CA1CA2POLBTP53MAPT
SCHEMBL13713614 0.98
SCHEMBL12832743 0.88 TP53 (0.32) TP53MAPTTHRB
SCHEMBL12833003 0.88 KMT2A (0.33) POLBTP53MAPTTHRB
SCHEMBL13713603 0.85 SMN1; SMN2 (0.36) POLB
SCHEMBL12832622 0.78
SCHEMBL13713664 0.76 MAPT (0.30) MAPT
SCHEMBL13713644 0.75 HTT (0.32)
SCHEMBL13713608 0.75 HTT (0.32)

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 1 patent. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
US-7592126-B2 Positive resist composition and pattern forming method using the resist composition FUJIFILM CORPORATION (JP) 2009-09-22 US disclosed