⚠ Novel chemotype — no close known analogue (best Tanimoto < 0.3). Unexplored chemical space relative to ChEMBL.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| SCHEMBL12855817 | 0.86 | ESR1 (0.31) | — | |
| SCHEMBL12855818 | 0.76 | ALDH1A1 (0.33) | — | |
| SCHEMBL14183322 | 0.66 | HTR1A (0.31) | — | |
| SCHEMBL10329382 | 0.66 | ACACB (0.43) | — | |
| SCHEMBL13651823 | 0.65 | MAPT (0.39) | — | |
| SCHEMBL14590568 | 0.65 | MAPT (0.33) | — | |
| SCHEMBL10022959 | 0.65 | PSMB1 (0.40) | — | |
| SCHEMBL5358838 | 0.65 | MEN1 (0.36) | — | |
| SCHEMBL13183274 | 0.64 | NQO1 (0.47) | — | |
| SCHEMBL5346745 | 0.63 | SMN1; SMN2 (0.37) | — |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 4 patents. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| US-7888401-B2 | Ink composition and inkjet ink, and image-forming method and recorded material using the same, and oxetane compound | FUJIFILM CORPORATION (JP) | 2011-02-15 | — | — | US | disclosed |
| US-7888401-B2 | Ink composition and inkjet ink, and image-forming method and recorded material using the same, and oxetane compound | FUJIFILM CORPORATION (JP) | 2011-02-15 | — | — | US | disclosed |
| US-20080033072-A1 | Ink composition and inkjet ink, and image-forming method and recorded material using the same, and oxetane compound | FUJIFILM CORPORATION (JP) | 2008-02-07 | — | — | US | disclosed |
| US-20080033072-A1 | Ink composition and inkjet ink, and image-forming method and recorded material using the same, and oxetane compound | FUJIFILM CORPORATION (JP) | 2008-02-07 | — | — | US | disclosed |