Predicted protein targets (top 16)
| gene | UniProt | supporting neighbours | confidence | |
|---|---|---|---|---|
| ▸ | TAAR1 | Q96RJ0 | 1/20 | 0.44 |
| ▸ | KCNN4 | O15554 | 4/20 | 0.43 |
| ▸ | MAPK1 | P28482 | 1/20 | 0.42 |
| ▸ | CYP2C19 | P33261 | 1/20 | 0.40 |
| ▸ | HIF1A | Q16665 | 1/20 | 0.40 |
| ▸ | ALDH1A1 | P00352 | 2/20 | 0.39 |
| ▸ | ALOX15 | P16050 | 1/20 | 0.39 |
| ▸ | LMNA | P02545 | 1/20 | 0.39 |
| ▸ | ESR1 | P03372 | 2/20 | 0.38 |
| ▸ | ESR2 | Q92731 | 2/20 | 0.38 |
| ▸ | CYP3A4 | P08684 | 1/20 | 0.38 |
| ▸ | MAPT | P10636 | 1/20 | 0.37 |
| ▸ | KMT2A | Q03164 | 1/20 | 0.37 |
| ▸ | NR3C2 | P08235 | 1/20 | 0.36 |
| ▸ | TP53 | P04637 | 1/20 | 0.36 |
| ▸ | TSHR | P16473 | 1/20 | 0.36 |
Click a target to see other patent compounds predicted against it — the reverse direction, in place.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| Phenol SCHEMBL616489 | 0.83 | ESR1 (0.53) | ALDH1A1LMNAESR1ESR2CYP3A4 | |
| SCHEMBL1538270 | 0.82 | TAAR1 (0.46) | TAAR1KCNN4MAPK1CYP2C19HIF1A | |
| SCHEMBL6160241 | 0.80 | TAAR1 (0.44) | TAAR1KCNN4MAPK1CYP2C19HIF1A | |
| SCHEMBL3698483 | 0.80 | TAAR1 (0.44) | TAAR1KCNN4MAPK1CYP2C19HIF1A | |
| SCHEMBL29291135 | 0.79 | ALDH1A1 (0.49) | ALDH1A1LMNAKMT2A | |
| SCHEMBL19954685 | 0.78 | TAAR1 (0.48) | TAAR1KCNN4MAPK1CYP2C19HIF1A | |
| SCHEMBL11903610 | 0.78 | TAAR1 (0.43) | TAAR1KCNN4MAPK1CYP2C19HIF1A | |
| SCHEMBL9579241 | 0.78 | TAAR1 (0.43) | TAAR1KCNN4MAPK1CYP2C19HIF1A | |
| SCHEMBL96177 | 0.78 | MAPK1 (0.55) | TAAR1KCNN4MAPK1CYP2C19HIF1A | |
| SCHEMBL22824871 | 0.76 | LMNA (0.53) | TAAR1KCNN4MAPK1CYP2C19HIF1A |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 39 patents — showing the first 20. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| CN-107667415-B | Conformal peelable carbon films for advanced patterning with reduced line edge roughness | 应用材料公司 | 2021-10-26 | — | — | CN | claimed |
| WO-2014149281-A1 | LAYER-BY-LAYER DEPOSITION OF CARBON-DOPED OXIDE FILMS | APPLIED MATERIALS, INC. (US) | 2014-09-25 | — | — | WO | claimed |
| CN-112219259-B | In situ high power implantation for stress relief of thin films | 应用材料公司 | 2025-04-11 | — | — | CN | disclosed |
| CN-119234292-A | Method for forming thermally stable carbon film | 应用材料公司 | 2024-12-31 | — | — | CN | disclosed |
| US-20240363332-A1 | AMORPHOUS CARBON FOR GAP FILL | APPLIED MATERIALS, INC. (US) | 2024-10-31 | — | — | US | disclosed |
| US-12062536-B2 | Amorphous carbon for gap fill | APPLIED MATERIALS, INC. (US) | 2024-08-13 | — | — | US | disclosed |
| CN-117941029-A | Self-aligned high-order patterning based on anti-spacer | 杰米纳蒂奥公司 | 2024-04-26 | — | — | CN | disclosed |
| CN-117524848-A | High density low Wen Tanmo for hard mask and other patterning applications | 应用材料公司 | 2024-02-06 | — | — | CN | disclosed |
| CN-110622280-B | High density low Wen Tanmo for hard mask and other patterning applications | 应用材料公司 | 2023-11-24 | — | — | CN | disclosed |
| WO-2023200697-A1 | METHODS OF FORMING THERMALLY STABLE CARBON FILM | APPLIED MATERIALS, INC. (US) | 2023-10-19 | — | — | WO | disclosed |
| CN-116457495-A | Amorphous carbon for gap filling | 应用材料公司 | 2023-07-18 | — | — | CN | disclosed |
| WO-2013106171-A1 | METHOD FOR SEASONING UV CHAMBER OPTICAL COMPONENTS TO AVOID DEGRADATION | APPLIED MATERIALS, INC. (US) | 2013-07-18 | — | — | WO | disclosed |
| WO-2012047742-A2 | ULTRA HIGH SELECTIVITY DOPED AMORPHOUS CARBON STRIPPABLE HARDMASK DEVELOPMENT AND INTEGRATION | APPLIED MATERIALS, INC. (US) | 2012-04-12 | — | — | WO | disclosed |
| WO-2011137059-A2 | AMORPHOUS CARBON DEPOSITION METHOD FOR IMPROVED STACK DEFECTIVITY | APPLIED MATERIALS, INC. (US) | 2011-11-03 | — | — | WO | disclosed |
| WO-2010045153-A2 | METHOD FOR DEPOSITING CONFORMAL AMORPHOUS CARBON FILM BY PLASMA-ENHANCED CHEMICAL VAPOR DEPOSITION (PECVD) | APPLIED MATERIALS, INC. (US) | 2010-04-22 | — | — | WO | disclosed |
| WO-2009111395-A2 | METHOD FOR DEPOSITING AN AMORPHOUS CARBON FILM WITH IMPROVED DENSITY AND STEP COVERAGE | APPLIED MATERIALS, INC. (US) | 2009-09-11 | — | — | WO | disclosed |
| WO-2008094792-A1 | NOVEL AIR GAP INTEGRATION SCHEME | APPLIED MATERIALS, INC. (US) | 2008-08-07 | — | — | WO | disclosed |
| WO-2005087974-A2 | CVD PROCESSES FOR THE DEPOSITION OF AMORPHOUS CARBON FILMS | APPLIED MATERIALS, INC. (US) | 2005-09-22 | — | — | WO | disclosed |
| EP-1021391-A1 | METHOD FOR C-ALKYLATING HYDROXYLATED AROMATIC COMPOUNDS | RHODIA CHIMIE (FR) | 2000-07-26 | — | — | EP | disclosed |
| WO-1997016402-A1 | METHOD FOR C-ALKYLATING HYDROXYLATED AROMATIC COMPOUNDS | RHODIA CHIMIE (FR) | 1997-05-09 | — | — | WO | disclosed |