SCHEMBL12907186

SCHEMBL12907186

CC(C)[Si](C)(C)[Si](C)(C)O

nearest known ligand 0.00

⚠ Novel chemotype — no close known analogue (best Tanimoto < 0.3). Unexplored chemical space relative to ChEMBL.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL13453130 0.70
SCHEMBL506475 0.70
SCHEMBL1727635 0.67
SCHEMBL29378875 0.65
SCHEMBL838012 0.65
SCHEMBL3482289 0.64
SCHEMBL12907188 0.63
SCHEMBL8385475 0.61
SCHEMBL29804 0.61 ALDH1A1 (0.33)
SCHEMBL838349 0.61

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 2 patents. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
US-7875408-B2 comprising photobleachable organic materials can be bleached by 193 nm light, and brought back to their original state by stimuli after exposure; to improve the aerial image effectively seen by the photoresist and thereby improve the contrast INTERNATIONAL BUSINESS MACHINES CORPORATION (US) 2011-01-25 US disclosed
US-20080182178-A1 Bleachable materials for lithography GLOBALFOUNDRIES U.S. INC. 2008-07-31 US disclosed