⚠ Novel chemotype — no close known analogue (best Tanimoto < 0.3). Unexplored chemical space relative to ChEMBL.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| SCHEMBL13453130 | 0.80 | — | — | |
| SCHEMBL1727635 | 0.76 | — | — | |
| SCHEMBL838012 | 0.74 | — | — | |
| SCHEMBL18056701 | 0.73 | — | — | |
| SCHEMBL3482289 | 0.73 | — | — | |
| SCHEMBL26668772 | 0.73 | — | — | |
| SCHEMBL12907186 | 0.70 | — | — | |
| SCHEMBL29804 | 0.70 | ALDH1A1 (0.33) | — | |
| SCHEMBL838349 | 0.70 | — | — | |
| SCHEMBL1107768 | 0.67 | — | — |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 188 patents — showing the first 20. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| CN-112368292-B | Phosphoramidite compound, preparation method and application thereof | 深圳华大生命科学研究院 | 2024-05-17 | — | — | CN | claimed |
| CN-112368292-A | Phosphoramidite compound, preparation method and application thereof | 深圳华大生命科学研究院 | 2021-02-12 | — | — | CN | claimed |
| WO-2020010560-A1 | PHOSPHORAMIDITE COMPOUND, PREPARATION METHOD THEREFOR AND USE THEREOF | 深圳华大生命科学研究院 | 2020-01-16 | — | — | WO | claimed |
| US-9593192-B2 | Method for producing modified polymer and hydrogenated product thereof | JSR CORPORATION (JP) | 2017-03-14 | — | — | US | claimed |
| EP-2789633-B1 | METHOD FOR MANUFACTURING MODIFIED POLYMER AND HYDROGEN ADDUCT THEREOF | JSR CORP (JP) | 2016-05-25 | — | — | EP | claimed |
| CN-103958549-B | The manufacture method of polymer-modified and hydrogenation thing | JSR CORP. (JP) | 2015-09-09 | — | — | CN | claimed |
| EP-2789633-A1 | METHOD FOR MANUFACTURING MODIFIED POLYMER AND HYDROGEN ADDUCT THEREOF | JSR Corporation (JP) | 2014-10-15 | — | — | EP | claimed |
| US-20140275422-A1 | METHOD FOR PRODUCING MODIFIED POLYMER AND HYDROGENATED PRODUCT THEREOF | JSR CORPORATION (JP) | 2014-09-18 | — | — | US | claimed |
| US-20120029226-A1 | METHOD FOR THE SYNTHESIS OF CHIRAL ALPHA-ARYL PROPIONIC ACID DERIVATIVES | DSM IP ASSETS B.V. (NL) | 2012-02-02 | — | — | US | claimed |
| EP-2049689-B1 | NUCLEIC ACID AMPLIFICATION USING A REVERSIBLY MODIFIED OLIGONUCLEOTIDE | BI WANLI (US) | 2011-12-21 | — | — | EP | claimed |
| EP-1149086-B1 | NOVEL PROCESS FOR THE REMOVAL OF A SILYLOXY PROTECTING GROUP FROM 4-SILYLOXY-TETRAHYDRO-PYRAN-2-ONES | LEK TOVARNA FARMACEVTSKIH (SI) | 2004-05-12 | — | — | EP | claimed |
| US-6509479-B1 | To produce simvastatin | LEK PHARMACEUTICALS D.D. (SI) | 2003-01-21 | — | — | US | claimed |
| EP-1149086-A1 | NOVEL PROCESS FOR THE REMOVAL OF A SILYLOXY PROTECTING GROUP FROM 4-SILYLOXY-TETRAHYDRO-PYRAN-2-ONES | Lek Pharmaceutical and Chemical Co. D.D. (SI) | 2001-10-31 | — | — | EP | claimed |
| WO-2000046217-A1 | NOVEL PROCESS FOR THE REMOVAL OF A SILYLOXY PROTECTING GROUP FROM 4-SILYLOXY-TETRAHYDRO-PYRAN-2-ONES | LEK PHARMACEUTICALS AND CHEMICAL COMPANY D.D. (SI) | 2000-08-10 | — | — | WO | claimed |
| US-5650523-A | REACTION IN SOLVENTS TO FORM HYDROXY GROUPS | MERCK & CO., INC. (US) | 1997-07-22 | — | — | US | claimed |
| EP-0315954-B1 | Pattern-forming material and pattern formation method | TORAY SILICONE CO (JP) | 1995-11-22 | — | — | EP | claimed |
| EP-0444888-B1 | Process for the desilylation of a 4-silyloxy-tetrahydro-pyran-2-one | MERCK & CO INC (US) | 1995-02-08 | — | — | EP | claimed |
| EP-0444888-A1 | Process for the desilylation of a 4-silyloxy-tetrahydro-pyran-2-one | MERCK & CO. INC. (US) | 1991-09-04 | — | — | EP | claimed |
| US-4985342-A | Semiconductors, Integrated Circuits | TORAY SILICONE COMPANY, LTD. (JP) | 1991-01-15 | — | — | US | claimed |
| EP-0315954-A2 | Pattern-forming material and pattern formation method | TORAY SILICONE COMPANY, LIMITED (JP) | 1989-05-17 | — | — | EP | claimed |