Predicted protein targets (top 20)
| gene | UniProt | supporting neighbours | confidence | |
|---|---|---|---|---|
| ▸ | LIPG | Q9Y5X9 | 1/20 | 0.43 |
| ▸ | NR1H2 | P55055 | 1/20 | 0.37 |
| ▸ | NR1H3 | Q13133 | 1/20 | 0.37 |
| ▸ | CYSLTR2 | Q9NS75 | 6/20 | 0.36 |
| ▸ | CYSLTR1 | Q9Y271 | 6/20 | 0.36 |
| ▸ | ALOX5 | P09917 | 2/20 | 0.36 |
| ▸ | MEN1 | O00255 | 1/20 | 0.36 |
| ▸ | TP53 | P04637 | 1/20 | 0.36 |
| ▸ | CYP3A4 | P08684 | 1/20 | 0.36 |
| ▸ | MAPT | P10636 | 1/20 | 0.36 |
| ▸ | TYR | P14679 | 1/20 | 0.36 |
| ▸ | ALOX15 | P16050 | 1/20 | 0.36 |
| ▸ | TSHR | P16473 | 1/20 | 0.36 |
| ▸ | HTT | P42858 | 1/20 | 0.36 |
| ▸ | KMT2A | Q03164 | 1/20 | 0.36 |
| ▸ | TDP1 | Q9NUW8 | 1/20 | 0.36 |
| ▸ | BID | P55957 | 3/20 | 0.35 |
| ▸ | MCL1 | Q07820 | 3/20 | 0.35 |
| ▸ | BCL2L1 | Q07817 | 2/20 | 0.35 |
| ▸ | BAK1 | Q16611 | 2/20 | 0.35 |
Click a target to see other patent compounds predicted against it — the reverse direction, in place.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| SCHEMBL29362662 | 1.00 | LIPG (0.43) | LIPGNR1H2NR1H3CYSLTR2CYSLTR1 | |
| SCHEMBL4730366 | 0.94 | LIPG (0.35) | LIPGNR1H2NR1H3CYSLTR2CYSLTR1 | |
| SCHEMBL29584401 | 0.85 | LIPG (0.50) | LIPGNR1H2NR1H3CYSLTR2CYSLTR1 | |
| SCHEMBL132626 | 0.85 | LIPG (0.50) | LIPGNR1H2NR1H3CYSLTR2CYSLTR1 | |
| SCHEMBL5413206 | 0.85 | LIPG (0.50) | LIPGNR1H2NR1H3CYSLTR2CYSLTR1 | |
| SCHEMBL123866 | 0.84 | LIPG (0.56) | LIPGNR1H2NR1H3CYSLTR2CYSLTR1 | |
| SCHEMBL11149596 | 0.84 | LIPG (0.56) | LIPGNR1H2NR1H3CYSLTR2CYSLTR1 | |
| SCHEMBL29470133 | 0.84 | LIPG (0.56) | LIPGNR1H2NR1H3CYSLTR2CYSLTR1 | |
| SCHEMBL5027433 | 0.84 | LIPG (0.56) | LIPGNR1H2NR1H3CYSLTR2CYSLTR1 | |
| Hydrochloric Acid SCHEMBL8180220 | 0.83 | LIPG (0.55) | LIPGNR1H2NR1H3CYSLTR2CYSLTR1 |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 579 patents — showing the first 20. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| EP-2513722-B1 | LED CURABLE LIQUID RESIN COMPOSITIONS FOR ADDITIVE FABRICATION, PROCESS FOR MAKING A THREE-DIMENSIONAL OBJECT USING THE SAME | DSM IP ASSETS BV (NL) | 2017-01-25 | — | — | EP | claimed |
| WO-2014170799-A1 | CROSSLINKABLE VARNISH AND METHOD FOR APPLYING SAME | COMMISSARIAT A L'ENERGIE ATOMIQUE ET AUX ENERGIES ALTERNATIVES (FR) | 2014-10-23 | — | — | WO | claimed |
| US-8415081-B2 | Photosensitive resin composition having a high refractive index | CORNELL RESEARCH FOUNDATION, INC. (US) | 2013-04-09 | — | — | US | claimed |
| EP-2513722-A1 | LED CURABLE LIQUID RESIN COMPOSITIONS FOR ADDITIVE FABRICATION | DSM IP Assets B.V. (NL) | 2012-10-24 | — | — | EP | claimed |
| US-20120259031-A1 | LED CURABLE LIQUID RESIN COMPOSITIONS FOR ADDITIVE FABRICATION | DSM IP ASSETS, B.V. (NL) | 2012-10-11 | — | — | US | claimed |
| WO-2011075555-A1 | LED CURABLE LIQUID RESIN COMPOSITIONS FOR ADDITIVE FABRICATION | DSM IP ASSETS, B.V. (NL) | 2011-06-23 | — | — | WO | claimed |
| US-20110003123-A1 | SENSITIZER/INITIATOR COMBINATION FOR NEGATIVE-WORKING THERMAL-SENSITIVE COMPOSITIONS USABLE FOR LITHOGRAPHIC PLATES | KODAK GRAPHIC COMMUNICATIONS, GMBH (DE) | 2011-01-06 | — | — | US | claimed |
| WO-2009109579-A1 | SENSITIZER/INITIATOR COMBINATION FOR NEGATIVE-WORKING THERMAL-SENSITIVE COMPOSITIONS USABLE FOR LITHOGRAPHIC PLATES | EASTMAN KODAK COMPANY (US) | 2009-09-11 | — | — | WO | claimed |
| EP-2098367-A1 | Sensitizer/Initiator Combination for Negative-Working Thermal-Sensitive Compositions Usable for Lithographic Plates | EASTMAN KODAK COMPANY (US) | 2009-09-09 | — | — | EP | claimed |
| EP-2021873-A1 | NEGATIVE-WORKING RADIATION-SENSITIVE COMPOSITIONS AND IMAGEABLE MATERIALS | EASTMAN KODAK COMPANY (US) | 2009-02-11 | — | — | EP | claimed |
| US-20080038665-A1 | Photosensitive Resin Composition Having a High Refractive Index | HITACHI CHEMICAL CO., LTD. (JP) | 2008-02-14 | — | — | US | claimed |
| JP-2008502938-A | — | — | 2008-01-31 | — | — | JP | claimed |
| WO-2007139687-A1 | NEGATIVE-WORKING RADIATION-SENSITIVE COMPOSITIONS AND IMAGEABLE MATERIALS | EASTMAN KODAK COMPANY (US) | 2007-12-06 | — | — | WO | claimed |
| US-20070275322-A1 | Negative-working radiation-sensitive compositions and imageable materials | EASTMAN KODAK COMPANY | 2007-11-29 | — | — | US | claimed |
| WO-2006009526-A1 | PHOTOSENSITIVE RESIN COMPOSITION HAVING A HIGH REFRACTIVE INDEX | CORNELL RESEARCH FOUNDATION, INC. (US) | 2006-01-26 | — | — | WO | claimed |
| US-6204350-B1 | POLYMER HAVING REACTIVE END GROUPS | 3M INNOVATIVE PROPERTIES COMPANY | 2001-03-20 | — | — | US | claimed |
| EP-0966503-A1 | CURE-ON-DEMAND, MOISTURE-CURABLE COMPOSITIONS HAVING REACTIVE SILANE FUNCTIONALITY | MINNESOTA MINING AND MANUFACTURING COMPANY (US) | 1999-12-29 | — | — | EP | claimed |
| WO-1998040439-A1 | CURE-ON-DEMAND, MOISTURE-CURABLE COMPOSITIONS HAVING REACTIVE SILANE FUNCTIONALITY | MINNESOTA MINING AND MANUFACTURING COMPANY (US) | 1998-09-17 | — | — | WO | claimed |
| US-20260062548-A1 | RUBBER-BONDED CELLULOSE FIBERS AND MANUFACTURING METHOD THEREFOR, RESIN COMPOSITION AND MANUFACTURING METHOD THEREFOR, AND CURABLE RESIN COMPOSITION | KUREHA CORPORATION (JP) | 2026-03-05 | — | — | US | disclosed |
| US-5340898-A | A mixtures comprising an ionic onium borate photoinitiators; nontoxic | RHONE-POULENC CHIMIE (FR) | 1994-08-23 | — | — | US | disclosed |
Patent text — is the patent's own abstract consistent with the prediction?
For each of this compound's patents that has machine-readable text (1 of them — usually the abstract, not the full specification), we ask MedCPT which protein the text reads most about, and where the chemistry-predicted target lands among 4885 human targets. A high rank means the patent's own wording is consistent with the prediction — a weak, independent signal, not proof of activity.
| Patent | Title | Text reads most about | Predicted target · text-rank |
|---|---|---|---|
| US-20260062548-A1 | RUBBER-BONDED CELLULOSE FIBERS AND MANUFACTURING METHOD THEREFOR, RESIN COMPOSITION AND MANUFACTURING METHOD THEREFOR, AND CURABLE RESIN COMPOSITION | CROCC, WASF2, DCXR | LIPG 2603/4885NR1H2 2063/4885NR1H3 2157/4885 |
“Text reads most about” is the patent abstract's nearest protein in MedCPT space (background-debiased). Only ~1.4% of patents have machine-readable text, so most compounds won't have this panel.