Predicted protein targets (top 10)
| gene | UniProt | supporting neighbours | confidence | |
|---|---|---|---|---|
| ▸ | LIPG | Q9Y5X9 | 1/20 | 0.35 |
| ▸ | CYP3A4 | P08684 | 1/20 | 0.33 |
| ▸ | CYP2D6 | P10635 | 1/20 | 0.33 |
| ▸ | CYP2C9 | P11712 | 1/20 | 0.33 |
| ▸ | TYR | P14679 | 1/20 | 0.33 |
| ▸ | TLR8 | Q9NR97 | 1/20 | 0.31 |
| ▸ | CYSLTR2 | Q9NS75 | 2/20 | 0.30 |
| ▸ | CYSLTR1 | Q9Y271 | 2/20 | 0.30 |
| ▸ | NR1H2 | P55055 | 1/20 | 0.30 |
| ▸ | NR1H3 | Q13133 | 1/20 | 0.30 |
Click a target to see other patent compounds predicted against it — the reverse direction, in place.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| SCHEMBL129269 | 0.94 | LIPG (0.43) | LIPGCYP3A4TYRCYSLTR2CYSLTR1 | |
| SCHEMBL29362662 | 0.94 | LIPG (0.43) | LIPGCYP3A4TYRCYSLTR2CYSLTR1 | |
| Ammonia Solution, Strong SCHEMBL30387130 | 0.85 | LIPG (0.40) | LIPGCYP3A4CYP2D6CYP2C9TYR | |
| SCHEMBL3912339 | 0.80 | LIPG (0.38) | LIPGCYP3A4CYP2D6CYP2C9TLR8 | |
| SCHEMBL6065827 | 0.79 | LIPG (0.33) | LIPGCYP3A4CYP2D6CYP2C9TYR | |
| SCHEMBL29584401 | 0.78 | LIPG (0.50) | LIPGCYP3A4TYRCYSLTR2CYSLTR1 | |
| SCHEMBL5413206 | 0.78 | LIPG (0.50) | LIPGCYP3A4TYRCYSLTR2CYSLTR1 | |
| SCHEMBL132626 | 0.78 | LIPG (0.50) | LIPGCYP3A4TYRCYSLTR2CYSLTR1 | |
| SCHEMBL6065263 | 0.77 | LIPG (0.32) | LIPGCYP3A4CYP2D6CYP2C9 | |
| SCHEMBL9282660 | 0.77 | GABRA1 (0.37) | — |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 1 patent. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| WO-2008036170-A1 | NEGATIVE-WORKING RADIATION-SENSITIVE COMPOSITIONS AND IMAGEABLE MATERIALS | EASTMAN KODAK COMPANY (US) | 2008-03-27 | — | — | WO | disclosed |