SCHEMBL12936765

SCHEMBL12936765

OCC1CCC(CN2CCSCC2)CC1

nearest known ligand 0.40

Predicted protein targets (top 13)

geneUniProtsupporting neighboursconfidence
CHRM5 P08912 1/20 0.40
ADRA2C P18825 1/20 0.40
ALDH1A1 P00352 1/20 0.36
ACHE P22303 1/20 0.35
GBA1 P04062 3/20 0.33
SMN1; SMN2 Q16637 1/20 0.33
DRD2 P14416 2/20 0.32
HTR2A P28223 2/20 0.32
HTR2C P28335 2/20 0.32
HTR2B P41595 2/20 0.32
SIGMAR1 Q99720 2/20 0.32
GAA P10253 2/20 0.31
NPSR1 Q6W5P4 1/20 0.31

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL12936764 0.84 CHRM5 (0.38) CHRM5ADRA2CALDH1A1ACHEGBA1
SCHEMBL12936759 0.83 CHRM5 (0.40) CHRM5ADRA2CALDH1A1ACHESMN1; SMN2
SCHEMBL7361155 0.82 CHRM5 (0.46) CHRM5ADRA2CACHESMN1; SMN2DRD2
SCHEMBL12936775 0.80 CACNA1I (0.33) DRD2HTR2A
SCHEMBL18944398 0.79 GBA1 (0.42) CHRM5ADRA2CALDH1A1ACHEGBA1
SCHEMBL4382654 0.79 LTA4H (0.38) ALDH1A1ACHEGAA
SCHEMBL4375233 0.76 HRH3 (0.40) CHRM5ACHEDRD2SIGMAR1
SCHEMBL12014357 0.75 GBA1 (0.45) CHRM5ADRA2CALDH1A1ACHEGBA1
SCHEMBL2616313 0.75 NCF1 (0.45) CHRM5ADRA2CALDH1A1ACHESIGMAR1
SCHEMBL10216692 0.75 CHRM5 (0.36) CHRM5ADRA2CALDH1A1ACHEGAA

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 4 patents. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
US-8846294-B2 Photoresist composition SUMITOMO CHEMICAL COMPANY, LIMITED (JP) 2014-09-30 US disclosed
US-8846294-B2 Photoresist composition SUMITOMO CHEMICAL COMPANY, LIMITED (JP) 2014-09-30 US disclosed
US-20120251946-A1 PHOTORESIST COMPOSITION SUMITOMO CHEMICAL COMPANY, LIMITED (JP) 2012-10-04 US disclosed
US-20120251946-A1 PHOTORESIST COMPOSITION SUMITOMO CHEMICAL COMPANY, LIMITED (JP) 2012-10-04 US disclosed