SCHEMBL12936764

SCHEMBL12936764

OCCC1CCC(CN2CCSCC2)CC1

nearest known ligand 0.38

Predicted protein targets (top 16)

geneUniProtsupporting neighboursconfidence
CHRM5 P08912 1/20 0.38
ADRA2C P18825 1/20 0.38
ALDH1A1 P00352 1/20 0.35
ESR2 Q92731 1/20 0.33
LMNA P02545 1/20 0.33
ACHE P22303 1/20 0.33
NPC1 O15118 1/20 0.33
GBA1 P04062 1/20 0.32
MEN1 O00255 1/20 0.32
KMT2A Q03164 1/20 0.32
SIGMAR1 Q99720 4/20 0.31
SMN1; SMN2 Q16637 1/20 0.31
DRD2 P14416 1/20 0.30
HTR2A P28223 1/20 0.30
HTR2C P28335 1/20 0.30
HTR2B P41595 1/20 0.30

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL12936784 0.85 ESR2 (0.33) ESR2LMNAACHEDRD2HTR2A
SCHEMBL12936765 0.84 CHRM5 (0.40) CHRM5ADRA2CALDH1A1ACHEGBA1
SCHEMBL4666495 0.81 ACHE (0.39) CHRM5ADRA2CALDH1A1ESR2LMNA
SCHEMBL12936759 0.80 CHRM5 (0.40) CHRM5ADRA2CALDH1A1ACHESIGMAR1
SCHEMBL4666494 0.78 ACHE (0.43) CHRM5ADRA2CACHEMEN1KMT2A
SCHEMBL12014351 0.77 ALDH1A1 (0.44) CHRM5ADRA2CALDH1A1GBA1MEN1
SCHEMBL7321282 0.74 CHRM5 (0.59) CHRM5ADRA2CACHEGBA1SIGMAR1
SCHEMBL13013453 0.74
SCHEMBL12936775 0.73 CACNA1I (0.33) DRD2HTR2A
SCHEMBL2616313 0.72 NCF1 (0.45) CHRM5ADRA2CALDH1A1ACHESIGMAR1

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 4 patents. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
US-8846294-B2 Photoresist composition SUMITOMO CHEMICAL COMPANY, LIMITED (JP) 2014-09-30 US disclosed
US-8846294-B2 Photoresist composition SUMITOMO CHEMICAL COMPANY, LIMITED (JP) 2014-09-30 US disclosed
US-20120251946-A1 PHOTORESIST COMPOSITION SUMITOMO CHEMICAL COMPANY, LIMITED (JP) 2012-10-04 US disclosed
US-20120251946-A1 PHOTORESIST COMPOSITION SUMITOMO CHEMICAL COMPANY, LIMITED (JP) 2012-10-04 US disclosed