Predicted protein targets (top 20)
| gene | UniProt | supporting neighbours | confidence | |
|---|---|---|---|---|
| ▸ | ALDH1A1 | P00352 | 7/20 | 0.50 |
| ▸ | LMNA | P02545 | 2/20 | 0.46 |
| ▸ | HSD17B10 | Q99714 | 1/20 | 0.46 |
| ▸ | CHRM1 | P11229 | 3/20 | 0.43 |
| ▸ | CHRM5 | P08912 | 2/20 | 0.43 |
| ▸ | CHRM3 | P20309 | 2/20 | 0.43 |
| ▸ | SMN1; SMN2 | Q16637 | 2/20 | 0.43 |
| ▸ | TSHR | P16473 | 2/20 | 0.43 |
| ▸ | PGR | P06401 | 1/20 | 0.43 |
| ▸ | CHRM2 | P08172 | 1/20 | 0.43 |
| ▸ | CHRM4 | P08173 | 1/20 | 0.43 |
| ▸ | HTR1A | P08908 | 1/20 | 0.43 |
| ▸ | CHRNB2 | P17787 | 1/20 | 0.43 |
| ▸ | TBXA2R | P21731 | 1/20 | 0.43 |
| ▸ | CHRNB4 | P30926 | 1/20 | 0.43 |
| ▸ | CHRNA3 | P32297 | 1/20 | 0.43 |
| ▸ | CHRNA7 | P36544 | 1/20 | 0.43 |
| ▸ | CHRNA4 | P43681 | 1/20 | 0.43 |
| ▸ | CHRNA10 | Q9GZZ6 | 1/20 | 0.43 |
| ▸ | CHRNA9 | Q9UGM1 | 1/20 | 0.43 |
Click a target to see other patent compounds predicted against it — the reverse direction, in place.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| SCHEMBL6658249 | 0.86 | ALDH1A1 (0.71) | ALDH1A1LMNAHSD17B10TSHRFAAH | |
| SCHEMBL11208297 | 0.85 | ALDH1A1 (0.52) | ALDH1A1LMNAHSD17B10CHRM1CHRM5 | |
| SCHEMBL468862 | 0.85 | ALDH1A1 (0.61) | ALDH1A1LMNASMN1; SMN2TSHRFAAH | |
| SCHEMBL9889443 | 0.85 | ALDH1A1 (0.68) | ALDH1A1LMNAHSD17B10TSHRFAAH | |
| SCHEMBL23471285 | 0.83 | NAAA (0.64) | ALDH1A1LMNASMN1; SMN2TSHRFAAH | |
| SCHEMBL22721948 | 0.83 | NAAA (0.64) | ALDH1A1LMNASMN1; SMN2TSHRFAAH | |
| SCHEMBL12017720 | 0.83 | ALDH1A1 (0.57) | ALDH1A1LMNAHSD17B10CHRM1CHRM5 | |
| SCHEMBL11451557 | 0.83 | FAAH (0.44) | ALDH1A1LMNAHSD17B10CHRM1CHRM5 | |
| Acetic Acid Propyl Ester SCHEMBL23495512 | 0.82 | ALDH1A1 (0.70) | ALDH1A1LMNAHSD17B10CHRM1CHRM5 | |
| Acetic Acid Propyl Ester SCHEMBL14991 | 0.82 | — | — |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 22 patents — showing the first 20. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| CN-118221521-A | Acetate production process | 宁夏久兴环保科技有限公司 | 2024-06-21 | — | — | CN | claimed |
| WO-2023184432-A1 | DIAPHRAGM, ELECTROCHEMICAL DEVICE CONTAINING SAME, AND ELECTRONIC DEVICE | 宁德新能源科技有限公司 | 2023-10-05 | — | — | WO | claimed |
| EP-4700849-A2 | ANODE MATERIAL, ANODE SHEET AND SECONDARY BATTERY | BTR New Material Group Co., Ltd. (CN) | 2026-02-25 | — | — | EP | disclosed |
| WO-2025055985-A1 | PROTEIN TYROSINE PHOSPHATASE INHIBITOR, COMPOSITION, AND MEDICAL USE | 深圳众格生物科技有限公司 | 2025-03-20 | — | — | WO | disclosed |
| CN-118221521-A | Acetate production process | 宁夏久兴环保科技有限公司 | 2024-06-21 | — | — | CN | disclosed |
| CN-220530707-U | Condensing equipment is used in production of acetic acid normal propyl ester | 泰兴金江化学工业有限公司 | 2024-02-27 | — | — | CN | disclosed |
| WO-2023208006-A1 | RESIN DISPERSION OF MODIFIED NANO-SILICA PARTICLES AND PREPARATION METHOD FOR AND APPLICATION OF RESIN DISPERSION | 华为技术有限公司 | 2023-11-02 | — | — | WO | disclosed |
| US-20230314941-A1 | CARBOXYLATE, CARBOXYLIC ACID GENERATOR, RESIN, RESIST COMPOSITION AND METHOD FOR PRODUCING RESIST PATTERN | SUMITOMO CHEMICAL COMPANY, LIMITED (JP) | 2023-10-05 | — | — | US | disclosed |
| WO-2020069353-A1 | COMPOUNDS AND COMPOSITIONS FOR OCULAR DELIVERY | Graybug Vision, Inc. (US) | 2020-04-02 | — | — | WO | disclosed |
| CN-207591823-U | A kind of n-propyl acetate falling film reactor | 南京诺奥新材料有限公司 | 2018-07-10 | — | — | CN | disclosed |
| US-9429841-B2 | Resist composition and method for producing resist pattern | SUMITOMO CHEMICAL COMPANY, LIMITED (JP) | 2016-08-30 | — | — | US | disclosed |
| US-20140023971-A1 | PHOTORESIST COMPOSITION AND METHOD FOR PRODUCING PHOTORESIST PATTERN | SUMITOMO CHEMICAL COMPANY, LIMITED (JP) | 2014-01-23 | — | — | US | disclosed |
| US-20130095425-A1 | PHOTORESIST COMPOSITION | SUMITOMO CHEMICAL COMPANY, LIMITED (JP) | 2013-04-18 | — | — | US | disclosed |
| CN-101333408-B | Water-based primer composition and coating method using same | KANSAI PAINT CO LTD | 2013-02-27 | — | — | CN | disclosed |
| US-20130022925-A1 | RESIST COMPOSITION AND METHOD FOR PRODUCING RESIST PATTERN | SUMITOMO CHEMICAL COMPANY, LIMITED (JP) | 2013-01-24 | — | — | US | disclosed |
| US-20130022917-A1 | RESIST COMPOSITION AND METHOD FOR PRODUCING RESIST PATTERN | SUMITOMO CHEMICAL COMPANY, LIMITED (JP) | 2013-01-24 | — | — | US | disclosed |
| US-8318404-B2 | Salt and photoresist composition containing the same | SUMITOMO CHEMICAL COMPANY, LIMITED (JP) | 2012-11-27 | — | — | US | disclosed |
| US-8318404-B2 | Salt and photoresist composition containing the same | SUMITOMO CHEMICAL COMPANY, LIMITED (JP) | 2012-11-27 | — | — | US | disclosed |
| US-20100316952-A1 | SALT AND PHOTORESIST COMPOSITION CONTAINING THE SAME | SUMITOMO CHEMICAL COMPANY, LIMITED (JP) | 2010-12-16 | — | — | US | disclosed |
| US-20100316952-A1 | SALT AND PHOTORESIST COMPOSITION CONTAINING THE SAME | SUMITOMO CHEMICAL COMPANY, LIMITED (JP) | 2010-12-16 | — | — | US | disclosed |
Patent text — is the patent's own abstract consistent with the prediction?
For each of this compound's patents that has machine-readable text (1 of them — usually the abstract, not the full specification), we ask MedCPT which protein the text reads most about, and where the chemistry-predicted target lands among 4885 human targets. A high rank means the patent's own wording is consistent with the prediction — a weak, independent signal, not proof of activity.
| Patent | Title | Text reads most about | Predicted target · text-rank |
|---|---|---|---|
| US-20100316952-A1 | SALT AND PHOTORESIST COMPOSITION CONTAINING THE SAME | AFF1, AFF2, AFF4 | ALDH1A1 1746/4885LMNA 1377/4885HSD17B10 1731/4885 |
“Text reads most about” is the patent abstract's nearest protein in MedCPT space (background-debiased). Only ~1.4% of patents have machine-readable text, so most compounds won't have this panel.