SCHEMBL1301381

SCHEMBL1301381

CCCCCCCCCCc1ccc(S(=O)(=O)O)cc1

nearest known ligand 0.66

Predicted protein targets (top 20)

geneUniProtsupporting neighboursconfidence
CA2 P00918 3/20 0.66
ALDH1A1 P00352 3/20 0.58
ESR1 P03372 2/20 0.58
ADRA2A P08913 2/20 0.58
ADORA3 P0DMS8 2/20 0.58
TACR2 P21452 2/20 0.58
SLC6A2 P23975 2/20 0.58
SLC6A4 P31645 2/20 0.58
SLC6A3 Q01959 2/20 0.58
KDM4E B2RXH2 1/20 0.58
LMNA P02545 1/20 0.58
SHBG P04278 1/20 0.58
TP53 P04637 1/20 0.58
CYP3A4 P08684 1/20 0.58
HSPD1 P10809 1/20 0.58
ADRB3 P13945 1/20 0.58
HTR2C P28335 1/20 0.58
HSPE1 P61604 1/20 0.58
HIF1A Q16665 1/20 0.58
TST Q16762 1/20 0.58

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL4532142 1.00 CA2 (0.66) CA2ALDH1A1ESR1ADRA2AADORA3
SCHEMBL4527877 1.00 CA2 (0.66) CA2ALDH1A1ESR1ADRA2AADORA3
SCHEMBL4203952 1.00 CA2 (0.66) CA2ALDH1A1ESR1ADRA2AADORA3
SCHEMBL4534627 1.00 CA2 (0.66) CA2ALDH1A1ESR1ADRA2AADORA3
SCHEMBL195157 1.00 CA2 (0.66) CA2ALDH1A1ESR1ADRA2AADORA3
SCHEMBL974537 1.00 CA2 (0.66) CA2ALDH1A1ESR1ADRA2AADORA3
SCHEMBL2733171 1.00 CA2 (0.66) CA2ALDH1A1ESR1ADRA2AADORA3
SCHEMBL4532942 1.00 CA2 (0.66) CA2ALDH1A1ESR1ADRA2AADORA3
SCHEMBL4528217 1.00 CA2 (0.66) CA2ALDH1A1ESR1ADRA2AADORA3
SCHEMBL197275 1.00 CA2 (0.66) CA2ALDH1A1ESR1ADRA2AADORA3

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 205 patents — showing the first 20. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
CN-113785243-B Composition for resist pattern metallization process 日产化学株式会社 2025-05-02 CN claimed
EP-3730539-B1 METHOD FOR PREPARING SUPERABSORBENT POLYMER LG CHEMICAL LTD (KR) 2023-07-05 EP claimed
CN-110557949-B Method for preparing superabsorbent polymer 株式会社LG化学 2022-06-24 CN claimed
US-11161942-B2 Method for preparing superabsorbent polymer LG CHEM, LTD. 2021-11-02 US claimed
EP-3730539-A1 METHOD FOR PREPARING SUPER ABSORBENT POLYMER LG Chem, Ltd. (KR) 2020-10-28 EP claimed
US-20200247960-A1 Method for Preparing Superabsorbent Polymer LG CHEM, LTD. (KR) 2020-08-06 US claimed
CN-110557949-A Method for preparing superabsorbent polymer LG CHEMICAL LTD 2019-12-10 CN claimed
US-9149782-B2 Method for the fast formation of a gas hydrate STX OFFSHORE & SHIPBUILDING CO., LTD. (KR) 2015-10-06 US claimed
EP-2356182-B1 RADIATION CURABLE COATING MATERIALS BASF SE (DE) 2015-05-06 EP claimed
US-20140017141-A1 SUCCESSIVE GAS HYDRATE MANUFACTURING DEVICE STX OFFSHORE & SHIPBUILDING CO., LTD. (KR) 2014-01-16 US claimed
US-20100126386-A1 RADIATION-CURABLE COATING SUBSTANCES BASF AKTIENGESELLSCHAFT (DE) 2010-05-27 US claimed
WO-2010055050-A1 RADIATION CURABLE COATING MATERIALS BASF SE (DE) 2010-05-20 WO claimed
US-20030162671-A1 NOVEL WATER SOLUBLE METAL WORKING FLUIDS SOLUTIA INC. 2003-08-28 US claimed
JP-2001507724-A 2001-06-12 JP claimed
EP-0979266-A2 NOVEL WATER SOLUBLE METAL WORKING FLUIDS Solutia Inc. (US) 2000-02-16 EP claimed
US-5965062-A Electrically-conductive polymer and production method thereof, and solid-electrolytic capacitor NEC CORPORATION (JP) 1999-10-12 US claimed
CN-1228803-A Novel water soluble metal working fluids MONSANTO CO (US) 1999-09-15 CN claimed
WO-1998008919-A9 NOVEL WATER SOLUBLE METAL WORKING FLUIDS 1998-05-28 WO claimed
WO-1998008919-A2 NOVEL WATER SOLUBLE METAL WORKING FLUIDS SOLUTIA INC. (US) 1998-03-05 WO claimed
EP-0825618-A2 Electrically-conductive polymer and production method thereof, and solid-electrolytic capacitor NEC CORPORATION (JP) 1998-02-25 EP claimed