Predicted protein targets (top 20)
| gene | UniProt | supporting neighbours | confidence | |
|---|---|---|---|---|
| ▸ | CA2 | P00918 | 3/20 | 0.66 |
| ▸ | ALDH1A1 | P00352 | 3/20 | 0.58 |
| ▸ | ESR1 | P03372 | 2/20 | 0.58 |
| ▸ | ADRA2A | P08913 | 2/20 | 0.58 |
| ▸ | ADORA3 | P0DMS8 | 2/20 | 0.58 |
| ▸ | TACR2 | P21452 | 2/20 | 0.58 |
| ▸ | SLC6A2 | P23975 | 2/20 | 0.58 |
| ▸ | SLC6A4 | P31645 | 2/20 | 0.58 |
| ▸ | SLC6A3 | Q01959 | 2/20 | 0.58 |
| ▸ | KDM4E | B2RXH2 | 1/20 | 0.58 |
| ▸ | LMNA | P02545 | 1/20 | 0.58 |
| ▸ | SHBG | P04278 | 1/20 | 0.58 |
| ▸ | TP53 | P04637 | 1/20 | 0.58 |
| ▸ | CYP3A4 | P08684 | 1/20 | 0.58 |
| ▸ | HSPD1 | P10809 | 1/20 | 0.58 |
| ▸ | ADRB3 | P13945 | 1/20 | 0.58 |
| ▸ | HTR2C | P28335 | 1/20 | 0.58 |
| ▸ | HSPE1 | P61604 | 1/20 | 0.58 |
| ▸ | HIF1A | Q16665 | 1/20 | 0.58 |
| ▸ | TST | Q16762 | 1/20 | 0.58 |
Click a target to see other patent compounds predicted against it — the reverse direction, in place.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| SCHEMBL4532142 | 1.00 | CA2 (0.66) | CA2ALDH1A1ESR1ADRA2AADORA3 | |
| SCHEMBL4203952 | 1.00 | CA2 (0.66) | CA2ALDH1A1ESR1ADRA2AADORA3 | |
| SCHEMBL1301381 | 1.00 | CA2 (0.66) | CA2ALDH1A1ESR1ADRA2AADORA3 | |
| SCHEMBL4534627 | 1.00 | CA2 (0.66) | CA2ALDH1A1ESR1ADRA2AADORA3 | |
| SCHEMBL195157 | 1.00 | CA2 (0.66) | CA2ALDH1A1ESR1ADRA2AADORA3 | |
| SCHEMBL974537 | 1.00 | CA2 (0.66) | CA2ALDH1A1ESR1ADRA2AADORA3 | |
| SCHEMBL2733171 | 1.00 | CA2 (0.66) | CA2ALDH1A1ESR1ADRA2AADORA3 | |
| SCHEMBL4532942 | 1.00 | CA2 (0.66) | CA2ALDH1A1ESR1ADRA2AADORA3 | |
| SCHEMBL4528217 | 1.00 | CA2 (0.66) | CA2ALDH1A1ESR1ADRA2AADORA3 | |
| SCHEMBL197275 | 1.00 | CA2 (0.66) | CA2ALDH1A1ESR1ADRA2AADORA3 |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 19 patents. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| CN-102471721-A | Hydrodynamic disk drive spindle motor with hydro bearing having lubricant containing conductivity inducing agent | SEAGATE TECHNOLOGY LLC | 2012-05-23 | — | — | CN | claimed |
| US-8637632-B2 | Method for producing binder resin, particulate resin dispersion and method for producing same, electrostatic image development toner and method for producing same, electrostatic image developer, and image forming method | FUJI XEROX CO., LTD. (JP) | 2014-01-28 | — | — | US | disclosed |
| CN-102471721-A | Hydrodynamic disk drive spindle motor with hydro bearing having lubricant containing conductivity inducing agent | SEAGATE TECHNOLOGY LLC | 2012-05-23 | — | — | CN | disclosed |
| US-7534554-B2 | Chemically amplified resist composition and manufacturing method of semiconductor integrated circuit device with such chemically amplified resist composition | NEC ELECTRONICS CORPORATION (JP) | 2009-05-19 | — | — | US | disclosed |
| US-20080233518-A1 | CHEMICALLY AMPLIFIED RESIST COMPOSITION AND MANUFACTURING METHOD OF SEMICONDUCTOR INTEGRATED CIRCUIT DEVICE WITH SUCH CHEMICALLY AMPLIFIED RESIST COMPOSITION | NEC ELECTRONICS CORPORATION (JP) | 2008-09-25 | — | — | US | disclosed |
| US-7396633-B2 | Damascene process; forming connectors; exposure; development; using acid generator, quencher and buffer | NEC ELECTRONICS CORPORATION (JP) | 2008-07-08 | — | — | US | disclosed |
| US-20070122730-A1 | Method for producing binder resin, particulate resin dispersion and method for producing same, electrostatic image development toner and method for producing same, electrostatic image developer, and image forming method | FUJI XEROX CO., LTD. (JP) | 2007-05-31 | — | — | US | disclosed |
| US-20040259029-A1 | Chemically amplified resist composition and manufacturing method of semiconductor integrated circuit device with such chemically amplified resist composition | NEC ELECTRONICS CORPORATION (JP) | 2004-12-23 | — | — | US | disclosed |
| US-20040226476-A1 | PHASE CHANGE INKS WITH IMPROVED IMAGE PERMANENCE | XEROX CORPORATION | 2004-11-18 | — | — | US | disclosed |
| US-6811596-B1 | Phase change inks with improved image permanence | XEROX CORPORATION | 2004-11-02 | — | — | US | disclosed |
| EP-0738138-A1 | QUATERNARY SALTS OF PARA-DIALKYLAMINO BENZAMIDE DERIVATIVES | ISP Van Dyk Inc. (US) | 1996-10-23 | — | — | EP | disclosed |
| EP-0738138-A4 | QUATERNARY SALTS OF PARA-DIALKYLAMINO BENZAMIDE DERIVATIVES | ISP VAN DYK INC (US) | 1996-07-08 | — | — | EP | disclosed |
| US-5451394-A | Quaternary salts of para-dialkylamino benzamide derivatives | ISP VAN DYK INC. (US) | 1995-09-19 | — | — | US | disclosed |
| US-5427773-A | Sunscreen agents | ISP VAN DYK INC. (US) | 1995-06-27 | — | — | US | disclosed |
| WO-1995005797-A1 | QUATERNARY SALTS OF PARA-DIALKYLAMINO BENZAMIDE DERIVATIVES | ISP VAN DYK INC. (US) | 1995-03-02 | — | — | WO | disclosed |
| EP-0410976-A4 | HEAT STABLE QUATERNIZED LACTAMS HAVING OXYLATED SULFUR ANIONS | — | 1991-10-16 | — | — | EP | disclosed |
| EP-0410976-A1 | HEAT STABLE QUATERNIZED LACTAMS HAVING OXYLATED SULFUR ANIONS | GAF CHEMICALS CORPORATION (US) | 1991-02-06 | — | — | EP | disclosed |
| US-4885158-A | Heat stable quaternized lactams having oxylated sulfur anions | GAF CORPORATION (US) | 1989-12-05 | — | — | US | disclosed |
| WO-1989010358-A1 | HEAT STABLE QUATERNIZED LACTAMS HAVING OXYLATED SULFUR ANIONS | GAF CHEMICALS CORPORATION (US) | 1989-11-02 | — | — | WO | disclosed |