Predicted protein targets (top 12)
| gene | UniProt | supporting neighbours | confidence | |
|---|---|---|---|---|
| ▸ | NPC1 | O15118 | 2/20 | 0.38 |
| ▸ | RAB9A | P51151 | 2/20 | 0.38 |
| ▸ | CNR2 | P34972 | 2/20 | 0.35 |
| ▸ | LMNA | P02545 | 1/20 | 0.35 |
| ▸ | POLB | P06746 | 1/20 | 0.35 |
| ▸ | PTGS2 | P35354 | 4/20 | 0.35 |
| ▸ | CYP3A4 | P08684 | 1/20 | 0.35 |
| ▸ | HSD11B1 | P28845 | 1/20 | 0.33 |
| ▸ | TRPV1 | Q8NER1 | 2/20 | 0.33 |
| ▸ | CNR1 | P21554 | 1/20 | 0.33 |
| ▸ | MAPT | P10636 | 1/20 | 0.32 |
| ▸ | TDP1 | Q9NUW8 | 1/20 | 0.32 |
Click a target to see other patent compounds predicted against it — the reverse direction, in place.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| SCHEMBL4824480 | 0.99 | NPC1 (0.38) | NPC1RAB9ACNR2LMNAPOLB | |
| SCHEMBL8861271 | 0.99 | NPC1 (0.38) | NPC1RAB9ACNR2LMNAPOLB | |
| SCHEMBL8861274 | 0.99 | NPC1 (0.38) | NPC1RAB9ACNR2LMNAPOLB | |
| SCHEMBL2638154 | 0.89 | TRPV1 (0.38) | CNR2LMNAPTGS2HSD11B1TRPV1 | |
| SCHEMBL5873319 | 0.89 | TRPV1 (0.38) | CNR2LMNAPTGS2HSD11B1TRPV1 | |
| SCHEMBL8773778 | 0.87 | NPC1 (0.40) | NPC1RAB9ACNR2LMNAPOLB | |
| SCHEMBL30485788 | 0.87 | NPC1 (0.40) | NPC1RAB9ACNR2LMNAPOLB | |
| SCHEMBL2464472 | 0.87 | NPC1 (0.40) | NPC1RAB9ACNR2LMNAPOLB | |
| SCHEMBL16425822 | 0.87 | NPC1 (0.42) | NPC1RAB9ALMNAPOLBCYP3A4 | |
| SCHEMBL10385263 | 0.86 | KAT8 (0.34) | MAPTTDP1 |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 1 patent. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| EP-2264527-A1 | METHOD FOR PROCESSING WORK HAVING PHOTORESIST LAYER | FUJIFILM Corporation (JP) | 2010-12-22 | — | — | EP | disclosed |