SCHEMBL13027414

SCHEMBL13027414

COc1cc(C)cc(CC[Si](OC)(OC)OC)c1C

nearest known ligand 0.41

Predicted protein targets (top 13)

geneUniProtsupporting neighboursconfidence
▸ ACHE P22303 2/20 0.41
▸ MEN1 O00255 1/20 0.34
▸ KMT2A Q03164 1/20 0.34
▸ RXFP1 Q9HBX9 1/20 0.34
▸ TAAR1 Q96RJ0 2/20 0.33
▸ SMN1; SMN2 Q16637 2/20 0.32
▸ MAPT P10636 1/20 0.32
▸ ERN1 O75460 1/20 0.32
▸ ALDH1A1 P00352 1/20 0.31
▸ CRHR1 P34998 3/20 0.31
▸ PDCD1 Q15116 1/20 0.30
▸ CD274 Q9NZQ7 1/20 0.30
▸ CNR2 P34972 1/20 0.30

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL15672403 0.87 ACHE (0.36) ACHEMEN1KMT2ARXFP1TAAR1
SCHEMBL13027531 0.84 ACHE (0.34) ACHESMN1; SMN2MAPT
SCHEMBL15672326 0.84 ACHE (0.53) ACHEKMT2AMAPT
SCHEMBL15672395 0.84 CYP1A2 (0.44) MEN1KMT2ARXFP1TAAR1ALDH1A1
SCHEMBL13027378 0.84 TAAR1 (0.30) TAAR1
SCHEMBL13027240 0.84 ACHE (0.42) ACHEMEN1KMT2ARXFP1TAAR1
SCHEMBL13027473 0.83 ACHE (0.45) ACHEMEN1KMT2ATAAR1SMN1; SMN2
SCHEMBL13027431 0.79 ACHE (0.48) ACHEMEN1KMT2ATAAR1MAPT
SCHEMBL13027429 0.79 ACHE (0.48) ACHEMEN1KMT2AMAPTALDH1A1
SCHEMBL13027411 0.79 ACHE (0.41) ACHEMEN1KMT2ATAAR1SMN1; SMN2

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 2 patents. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
US-8697330-B2 Composition for forming a silicon-containing antireflection film, substrate having the silicon-containing antireflection film from the composition and patterning process using the same SHIN-ETSU CHEMICAL CO., LTD. (JP) 2014-04-15 — — US disclosed
US-20100285407-A1 Composition for forming a silicon-containing antireflection film, substrate having the silicon-containing antireflection film from the composition and patterning process using the same SHIN-ETSU CHEMICAL CO., LTD. (JP) 2010-11-11 — — US disclosed
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