SCHEMBL13027473

SCHEMBL13027473

COc1cc(C)cc(OC)c1CC[Si](OC)(OC)OC

nearest known ligand 0.47

Predicted protein targets (top 20)

geneUniProtsupporting neighboursconfidence
▸ ACHE P22303 2/20 0.45
▸ ERN1 O75460 1/20 0.34
▸ ALDH1A1 P00352 4/20 0.33
▸ SMN1; SMN2 Q16637 2/20 0.33
▸ POLB P06746 2/20 0.32
▸ MAPT P10636 2/20 0.32
▸ MEN1 O00255 1/20 0.32
▸ USP2 O75604 1/20 0.32
▸ CYP2C9 P11712 1/20 0.32
▸ HPGD P15428 1/20 0.32
▸ ALOX12 P18054 1/20 0.32
▸ MAPK1 P28482 1/20 0.32
▸ CYP2C19 P33261 1/20 0.32
▸ KMT2A Q03164 1/20 0.32
▸ NPSR1 Q6W5P4 1/20 0.32
▸ L3MBTL1 Q9Y468 1/20 0.32
▸ TAAR1 Q96RJ0 2/20 0.32
▸ CYP3A4 P08684 1/20 0.31
▸ SYK P43405 1/20 0.31
▸ ALOX5 P09917 1/20 0.31

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL13027411 0.91 ACHE (0.41) ACHEERN1ALDH1A1SMN1; SMN2MAPT
SCHEMBL15672360 0.85 ACHE (0.39) ACHEERN1ALDH1A1SMN1; SMN2ALOX5
SCHEMBL13027456 0.84 CYP1A2 (0.41) ALDH1A1SMN1; SMN2USP2MAPK1TAAR1
SCHEMBL13027414 0.83 ACHE (0.41) ACHEERN1ALDH1A1SMN1; SMN2MAPT
SCHEMBL13027644 0.83 ACHE (0.37) ACHE
SCHEMBL15672326 0.82 ACHE (0.53) ACHEMAPTKMT2ACYP3A4ALOX5
SCHEMBL13027285 0.82 ACHE (0.46) ACHEERN1ALDH1A1SMN1; SMN2POLB
SCHEMBL13027379 0.82 HRH3 (0.40) ACHEALDH1A1MAPTMEN1MAPK1
SCHEMBL13027429 0.79 ACHE (0.48) ACHEALDH1A1POLBMAPTMEN1
SCHEMBL15672343 0.78 CYP1A2 (0.37) ALDH1A1HPGDTAAR1

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 2 patents. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
US-8697330-B2 Composition for forming a silicon-containing antireflection film, substrate having the silicon-containing antireflection film from the composition and patterning process using the same SHIN-ETSU CHEMICAL CO., LTD. (JP) 2014-04-15 — — US disclosed
US-20100285407-A1 Composition for forming a silicon-containing antireflection film, substrate having the silicon-containing antireflection film from the composition and patterning process using the same SHIN-ETSU CHEMICAL CO., LTD. (JP) 2010-11-11 — — US disclosed
Send feedback