SCHEMBL13027431

SCHEMBL13027431

COc1ccc(C)cc1CC[Si](OC)(OC)OC

nearest known ligand 0.56

Predicted protein targets (top 20)

geneUniProtsupporting neighboursconfidence
▸ ACHE P22303 1/20 0.48
▸ SLC13A5 Q86YT5 1/20 0.47
▸ ALDH1A1 P00352 2/20 0.44
▸ CYP3A4 P08684 1/20 0.44
▸ ADRA1A P35348 1/20 0.42
▸ TAAR1 Q96RJ0 1/20 0.42
▸ L3MBTL1 Q9Y468 3/20 0.41
▸ LMNA P02545 2/20 0.41
▸ TSHR P16473 2/20 0.41
▸ MAPT P10636 2/20 0.41
▸ MAPK1 P28482 2/20 0.41
▸ GAA P10253 2/20 0.41
▸ TDP1 Q9NUW8 1/20 0.41
▸ MEN1 O00255 1/20 0.39
▸ USP2 O75604 1/20 0.39
▸ POLB P06746 1/20 0.39
▸ CYP2C9 P11712 1/20 0.39
▸ HPGD P15428 1/20 0.39
▸ ALOX12 P18054 1/20 0.39
▸ CYP2C19 P33261 1/20 0.39

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL15672332 0.87 ACHE (0.43) ACHESLC13A5ALDH1A1CYP3A4ADRA1A
SCHEMBL13027429 0.86 ACHE (0.48) ACHEALDH1A1CYP3A4L3MBTL1LMNA
SCHEMBL13027548 0.84 SLC13A5 (0.41) ACHESLC13A5ALDH1A1CYP3A4ADRA1A
SCHEMBL13027390 0.84 TAAR1 (0.53) ACHEALDH1A1TAAR1LMNAMAPT
SCHEMBL13027250 0.84 ACHE (0.50) ACHESLC13A5ALDH1A1CYP3A4L3MBTL1
SCHEMBL13027466 0.82 ADRA1A (0.64) ADRA1ATAAR1
SCHEMBL13027393 0.80 ALDH1A1 (0.41) ACHEALDH1A1TAAR1LMNAMAPT
SCHEMBL3620118 0.79 ACHE (0.54) ACHESLC13A5ALDH1A1CYP3A4ADRA1A
SCHEMBL13027662 0.79 ADRA1A (0.40) ADRA1ATAAR1
SCHEMBL13027646 0.79 ACHE (0.33) ACHESLC13A5ALDH1A1CYP3A4TAAR1

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 2 patents. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
US-8697330-B2 Composition for forming a silicon-containing antireflection film, substrate having the silicon-containing antireflection film from the composition and patterning process using the same SHIN-ETSU CHEMICAL CO., LTD. (JP) 2014-04-15 — — US disclosed
US-20100285407-A1 Composition for forming a silicon-containing antireflection film, substrate having the silicon-containing antireflection film from the composition and patterning process using the same SHIN-ETSU CHEMICAL CO., LTD. (JP) 2010-11-11 — — US disclosed
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